JPS647004A - Production of color filter - Google Patents

Production of color filter

Info

Publication number
JPS647004A
JPS647004A JP16434387A JP16434387A JPS647004A JP S647004 A JPS647004 A JP S647004A JP 16434387 A JP16434387 A JP 16434387A JP 16434387 A JP16434387 A JP 16434387A JP S647004 A JPS647004 A JP S647004A
Authority
JP
Japan
Prior art keywords
dyed
pattern
layer
color filter
filter patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16434387A
Other languages
Japanese (ja)
Inventor
Hikari Kawashima
Shoji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP16434387A priority Critical patent/JPS647004A/en
Publication of JPS647004A publication Critical patent/JPS647004A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Color Television Image Signal Generators (AREA)
  • Optical Filters (AREA)

Abstract

PURPOSE:To easily form fine color filter patterns having high definition and large throughput by forming a photoresist having a high resolution as a photomask directly on a layer of a material to be dyed. CONSTITUTION:A water soluble polymer which is the material 2 to be treated and has photosensitivity is coated on a glass substrate 1. The part where the filter patterns is to be formed is then irradiated by using a chromium mask and is treated by a solvent, then the exposed part is dissolved and removed and the mask pattern 3a of a main chain decomposition type polymer is formed. With this pattern as a photomask, the layer of the material 2 to be dyed is exposed and the mask pattern 3a is stripped by an org. solvent. The layer of the material 2 to be dyed is developed by warm water and the prescribed pattern 2a to be dyed is thus formed. After the pattern 2a is dyed, a protective layer is formed. The multi-color filters are formed by repeating the above- mentioned stages. The definition equiv. to the definition obtainable by contact exposing is thereby obtd. and the fine color filter patterns are formed with the large throughput.
JP16434387A 1987-06-30 1987-06-30 Production of color filter Pending JPS647004A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16434387A JPS647004A (en) 1987-06-30 1987-06-30 Production of color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16434387A JPS647004A (en) 1987-06-30 1987-06-30 Production of color filter

Publications (1)

Publication Number Publication Date
JPS647004A true JPS647004A (en) 1989-01-11

Family

ID=15791366

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16434387A Pending JPS647004A (en) 1987-06-30 1987-06-30 Production of color filter

Country Status (1)

Country Link
JP (1) JPS647004A (en)

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