JPS6471003A - Transparent conductive film - Google Patents

Transparent conductive film

Info

Publication number
JPS6471003A
JPS6471003A JP62227144A JP22714487A JPS6471003A JP S6471003 A JPS6471003 A JP S6471003A JP 62227144 A JP62227144 A JP 62227144A JP 22714487 A JP22714487 A JP 22714487A JP S6471003 A JPS6471003 A JP S6471003A
Authority
JP
Japan
Prior art keywords
preferable
semiconductor
solvent
conductive layer
mesh structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62227144A
Other languages
Japanese (ja)
Inventor
Shunichi Kondo
Osamu Watarai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP62227144A priority Critical patent/JPS6471003A/en
Publication of JPS6471003A publication Critical patent/JPS6471003A/en
Priority to US07/675,069 priority patent/US5075171A/en
Pending legal-status Critical Current

Links

Landscapes

  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

PURPOSE:To improve transparence and the adhesion of a conductive layer by forming an undercoating layer of the three-dimensional mesh structure on a holding body, over which forming a conductive layer by spreading a solution including a semiconductor compound. CONSTITUTION:As a holding body, a body of a polyester or a polyolefine is used. The three-dimensional mesh structure which forms an undercoating layer on such a holding body is preferable to form the mesh structure after spreading. For this purpose, a bridging agent consisting of isocyanate radical is suitable as the bringing component. The degree of swelling of the undercoating to the used solvent T1/T0 (T0 is the film thickness before soaking and T1 is the film thickness after 5 minutes when the semiconductor compound is soaked in the solvent) is preferable to be in the range 1.05 to 2.5 when T0 is about 10mu. The semiconductor used for the conductive layer is preferable to be cuprous iodide and silver iodide, and a semiconductor including some other metal can be also used. As the solvent for cuprous iodide, acetonitrile is available because cuprous iodide and acetonitrile make a complex salt. The density of the semiconductor is preferable to be 0.1 to 50wt.%.
JP62227144A 1987-09-10 1987-09-10 Transparent conductive film Pending JPS6471003A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62227144A JPS6471003A (en) 1987-09-10 1987-09-10 Transparent conductive film
US07/675,069 US5075171A (en) 1987-09-10 1991-03-26 Conductive film and method for preparing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62227144A JPS6471003A (en) 1987-09-10 1987-09-10 Transparent conductive film

Publications (1)

Publication Number Publication Date
JPS6471003A true JPS6471003A (en) 1989-03-16

Family

ID=16856178

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62227144A Pending JPS6471003A (en) 1987-09-10 1987-09-10 Transparent conductive film

Country Status (1)

Country Link
JP (1) JPS6471003A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02309510A (en) * 1989-05-23 1990-12-25 Fuji Photo Film Co Ltd Forming method for transparent conductive film laminate and transparent conductive pattern

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54113897A (en) * 1978-02-24 1979-09-05 Inoue Japax Res Elastic conductor
JPS59132507A (en) * 1983-01-20 1984-07-30 旭化成株式会社 Conductive highly molecular material and method of producingsame
JPS60131238A (en) * 1983-12-20 1985-07-12 東レ株式会社 Transparent conductive film
JPS60140605A (en) * 1983-12-28 1985-07-25 松下電器産業株式会社 Transparent conductive film
JPS60203432A (en) * 1984-03-29 1985-10-15 住友ベークライト株式会社 Manufacture of transparent conductive film

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54113897A (en) * 1978-02-24 1979-09-05 Inoue Japax Res Elastic conductor
JPS59132507A (en) * 1983-01-20 1984-07-30 旭化成株式会社 Conductive highly molecular material and method of producingsame
JPS60131238A (en) * 1983-12-20 1985-07-12 東レ株式会社 Transparent conductive film
JPS60140605A (en) * 1983-12-28 1985-07-25 松下電器産業株式会社 Transparent conductive film
JPS60203432A (en) * 1984-03-29 1985-10-15 住友ベークライト株式会社 Manufacture of transparent conductive film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02309510A (en) * 1989-05-23 1990-12-25 Fuji Photo Film Co Ltd Forming method for transparent conductive film laminate and transparent conductive pattern

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