JPS6472101A - Drawing device for concentric pattern - Google Patents

Drawing device for concentric pattern

Info

Publication number
JPS6472101A
JPS6472101A JP62229323A JP22932387A JPS6472101A JP S6472101 A JPS6472101 A JP S6472101A JP 62229323 A JP62229323 A JP 62229323A JP 22932387 A JP22932387 A JP 22932387A JP S6472101 A JPS6472101 A JP S6472101A
Authority
JP
Japan
Prior art keywords
angle
deciding means
coincidence
rotational frequency
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62229323A
Other languages
Japanese (ja)
Inventor
Kazuto Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Omron Tateisi Electronics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omron Tateisi Electronics Co filed Critical Omron Tateisi Electronics Co
Priority to JP62229323A priority Critical patent/JPS6472101A/en
Publication of JPS6472101A publication Critical patent/JPS6472101A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To prevent a Fresnel lens, etc., from deteriorating optical characteristics when the concentric pattern is drawn by distributing drawing start positions uniformly over the entire periphery of a material. CONSTITUTION:A control means 6 sets drawing start/stop angles in an angle coincidence deciding means 4 for each radius of rotation previously and a rotational frequency signal is set in a rotational frequency coincidence deciding means 5. Then when the angle coincidence deciding means 4 sends out a coincidence signal, blanking is stopped and drawing is started; when a specific rotational frequency is reached and a specific angle of rotation is reached, the blanking is performed again and the radius of a concentric circle drawn by a linear driving means 2 is varied, thereby drawing the concentric pattern similarly in order thereafter. The angle of rotation supplied to the angle coincidence deciding means 4 is varied for each concentric circle to prevent mismatching parts from being concentrated on a specific part. Consequently, deterioration in optical characteristics are precluded.
JP62229323A 1987-09-11 1987-09-11 Drawing device for concentric pattern Pending JPS6472101A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62229323A JPS6472101A (en) 1987-09-11 1987-09-11 Drawing device for concentric pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62229323A JPS6472101A (en) 1987-09-11 1987-09-11 Drawing device for concentric pattern

Publications (1)

Publication Number Publication Date
JPS6472101A true JPS6472101A (en) 1989-03-17

Family

ID=16890347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62229323A Pending JPS6472101A (en) 1987-09-11 1987-09-11 Drawing device for concentric pattern

Country Status (1)

Country Link
JP (1) JPS6472101A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6221541B1 (en) 1997-06-27 2001-04-24 Canon Kabushiki Kaisha Device manufacturing method and apparatus utilizing concentric fan-shaped pattern mask
US6235562B1 (en) 1993-10-06 2001-05-22 Micron Technology, Inc. Method of making field effect transistors
JP2010194564A (en) * 2009-02-24 2010-09-09 Pulstec Industrial Co Ltd Laser beam machining apparatus, and laser beam driving pulse signal outputting method in the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6376287B1 (en) * 1993-05-12 2002-04-23 Micron Technology, Inc. Method of making field effect
US6235562B1 (en) 1993-10-06 2001-05-22 Micron Technology, Inc. Method of making field effect transistors
US6251714B1 (en) 1993-10-06 2001-06-26 Micron Technology, Inc. Method of making thin film field effect transistors
US6221541B1 (en) 1997-06-27 2001-04-24 Canon Kabushiki Kaisha Device manufacturing method and apparatus utilizing concentric fan-shaped pattern mask
JP2010194564A (en) * 2009-02-24 2010-09-09 Pulstec Industrial Co Ltd Laser beam machining apparatus, and laser beam driving pulse signal outputting method in the same

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