JPS64725A - Plasma treatment method and device therefor - Google Patents
Plasma treatment method and device thereforInfo
- Publication number
- JPS64725A JPS64725A JP62073611A JP7361187A JPS64725A JP S64725 A JPS64725 A JP S64725A JP 62073611 A JP62073611 A JP 62073611A JP 7361187 A JP7361187 A JP 7361187A JP S64725 A JPS64725 A JP S64725A
- Authority
- JP
- Japan
- Prior art keywords
- tube
- outer tube
- silica
- gas
- space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title 1
- 238000009832 plasma treatment Methods 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 8
- 239000007789 gas Substances 0.000 abstract 5
- 239000000377 silicon dioxide Substances 0.000 abstract 4
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
Landscapes
- Light Receiving Elements (AREA)
Abstract
PURPOSE: To remove a deposit adhering on a transport tube, and to eliminate the need for the etching treatment of the gas transport tube after film formation by forming a film while the gas transport tube is reciprocated to a cavity resonator.
CONSTITUTION: Raw material gases A and B are introduced respectively into an silica inner tube 31 and an silica outer tube 32, and excited in gas exciting space 33. Film formation space 34 is shaped on the discharge port sides of the silica inner tube 31 and outer tube 32, and a substrate 35, a deposit surface of which is directed toward a discharge port on the inside, is fixed to a substrate holder 36. The gas exciting space 33 is surrounded by a cavity resonator 37 installed at the terminal of a waveguide 38, and microwaves generated from a magnetron 39 are introduced. A stainless bellows tube 40 connects the reciprocating outer tube 32 and a plasma treating chamber 41, and keeps a vacuum in the chamber 41. A drive 42 is composed of a rack pinion and a motor, and reciprocates the silica inner tube and outer tube.
COPYRIGHT: (C)1989,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-73611A JPH01725A (en) | 1987-03-20 | 1987-03-27 | Plasma treatment method and device |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-66521 | 1987-03-20 | ||
| JP6652187 | 1987-03-20 | ||
| JP62-73611A JPH01725A (en) | 1987-03-20 | 1987-03-27 | Plasma treatment method and device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS64725A true JPS64725A (en) | 1989-01-05 |
| JPH01725A JPH01725A (en) | 1989-01-05 |
Family
ID=
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0726593A1 (en) * | 1995-02-13 | 1996-08-14 | Applied Materials, Inc. | A high power, plasma-based, reactive species generator |
| US5895548A (en) * | 1996-03-29 | 1999-04-20 | Applied Komatsu Technology, Inc. | High power microwave plasma applicator |
| KR19990068381A (en) * | 1999-05-11 | 1999-09-06 | 허방욱 | microwave plasma burner |
| US6692209B1 (en) * | 1999-11-19 | 2004-02-17 | Litton Systems, Inc. | Method and system for manufacturing a photocathode |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0726593A1 (en) * | 1995-02-13 | 1996-08-14 | Applied Materials, Inc. | A high power, plasma-based, reactive species generator |
| US5892328A (en) * | 1995-02-13 | 1999-04-06 | Applied Komatsu Technology Inc. | High-power, plasma-based, reactive species generator |
| US5895548A (en) * | 1996-03-29 | 1999-04-20 | Applied Komatsu Technology, Inc. | High power microwave plasma applicator |
| KR19990068381A (en) * | 1999-05-11 | 1999-09-06 | 허방욱 | microwave plasma burner |
| US6692209B1 (en) * | 1999-11-19 | 2004-02-17 | Litton Systems, Inc. | Method and system for manufacturing a photocathode |
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