JPS64725A - Plasma treatment method and device therefor - Google Patents

Plasma treatment method and device therefor

Info

Publication number: JPS64725A
Authority: JP; Japan
Prior art keywords: tube; outer tube; silica; gas; space
Prior art date: 1987-03-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP62073611A

Other languages

English (en)

Other versions

JPH01725A (ja

Inventor

Toshimitsu Kariya

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-03-20

Filing date

1987-03-27

Publication date

1989-01-05

1987-03-27 Application filed by Canon Inc filed Critical Canon Inc

1987-03-27 Priority to JP62-73611A priority Critical patent/JPH01725A/ja

1987-03-27 Priority claimed from JP62-73611A external-priority patent/JPH01725A/ja

1989-01-05 Publication of JPS64725A publication Critical patent/JPS64725A/ja

1989-01-05 Publication of JPH01725A publication Critical patent/JPH01725A/ja

Status Pending legal-status Critical Current

Links

238000000034 method Methods 0.000 title 1
238000009832 plasma treatment Methods 0.000 title 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 8
239000007789 gas Substances 0.000 abstract 5
239000000377 silicon dioxide Substances 0.000 abstract 4
230000015572 biosynthetic process Effects 0.000 abstract 2
239000000758 substrate Substances 0.000 abstract 2
238000005530 etching Methods 0.000 abstract 1
239000002994 raw material Substances 0.000 abstract 1

Landscapes

Light Receiving Elements (AREA)

JP62-73611A 1987-03-20 1987-03-27 プラズマ処理方法及びその装置 Pending JPH01725A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP62-73611A JPH01725A (ja)	1987-03-20	1987-03-27	プラズマ処理方法及びその装置

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP62-66521		1987-03-20
JP6652187		1987-03-20
JP62-73611A JPH01725A (ja)	1987-03-20	1987-03-27	プラズマ処理方法及びその装置

Publications (2)

Publication Number	Publication Date
JPS64725A true JPS64725A (en)	1989-01-05
JPH01725A JPH01725A (ja)	1989-01-05

Family

ID=

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0726593A1 (en) *	1995-02-13	1996-08-14	Applied Materials, Inc.	A high power, plasma-based, reactive species generator
US5895548A (en) *	1996-03-29	1999-04-20	Applied Komatsu Technology, Inc.	High power microwave plasma applicator
KR19990068381A (ko) *	1999-05-11	1999-09-06	허방욱	마이크로웨이브플라즈마버너
US6692209B1 (en) *	1999-11-19	2004-02-17	Litton Systems, Inc.	Method and system for manufacturing a photocathode

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0726593A1 (en) *	1995-02-13	1996-08-14	Applied Materials, Inc.	A high power, plasma-based, reactive species generator
US5892328A (en) *	1995-02-13	1999-04-06	Applied Komatsu Technology Inc.	High-power, plasma-based, reactive species generator
US5895548A (en) *	1996-03-29	1999-04-20	Applied Komatsu Technology, Inc.	High power microwave plasma applicator
KR19990068381A (ko) *	1999-05-11	1999-09-06	허방욱	마이크로웨이브플라즈마버너
US6692209B1 (en) *	1999-11-19	2004-02-17	Litton Systems, Inc.	Method and system for manufacturing a photocathode

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