JPS6473720A - Manufacture of mask for x-ray exposure - Google Patents

Manufacture of mask for x-ray exposure

Info

Publication number
JPS6473720A
JPS6473720A JP23180587A JP23180587A JPS6473720A JP S6473720 A JPS6473720 A JP S6473720A JP 23180587 A JP23180587 A JP 23180587A JP 23180587 A JP23180587 A JP 23180587A JP S6473720 A JPS6473720 A JP S6473720A
Authority
JP
Japan
Prior art keywords
main plate
quartz substrate
ray
manufacture
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23180587A
Other languages
Japanese (ja)
Inventor
Kenji Sugishima
Masao Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP23180587A priority Critical patent/JPS6473720A/en
Publication of JPS6473720A publication Critical patent/JPS6473720A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To manufacture a stable main plate by using a quartz substrate of a small thermal expansion coefficient as a substrate for X-ray exposing mask by a method wherein the main plate is grown on the quartz substrate; the quartz substrate in the exposure region is removed; and patterns comprising X-ray absorbing body are formed on the main plate. CONSTITUTION:A diamond film 12 as a main plate is grown on a quartz substrate 11 by vapor growing process. The frames 11A, 11B of the quartz substrate 11 are formed by etching away the central part of the quartz substrate 11 leaving the exposure region 4. Besides, X-ray absorbing patterns 3 made of gold etc. are formed on the surface of the diamond film 12 while the frames 11A, 11B are respectively fitted with reinforcement frames 7 to complete the title X-ray exposing mask. Furthermore, alignment masks are made on the diamond film 12 as a main plate so that the manufacture of stable main plate and the X-ray exposure mask may be assured.
JP23180587A 1987-09-16 1987-09-16 Manufacture of mask for x-ray exposure Pending JPS6473720A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23180587A JPS6473720A (en) 1987-09-16 1987-09-16 Manufacture of mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23180587A JPS6473720A (en) 1987-09-16 1987-09-16 Manufacture of mask for x-ray exposure

Publications (1)

Publication Number Publication Date
JPS6473720A true JPS6473720A (en) 1989-03-20

Family

ID=16929296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23180587A Pending JPS6473720A (en) 1987-09-16 1987-09-16 Manufacture of mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS6473720A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242711A (en) * 1988-04-18 1990-02-13 Canon Inc Lithography mask structure
JPH0294422A (en) * 1988-09-30 1990-04-05 Canon Inc Mask structure for lithography
US6509124B1 (en) 1999-11-10 2003-01-21 Shin-Etsu Chemical Co., Ltd. Method of producing diamond film for lithography
WO2003075309A3 (en) * 2002-03-07 2004-11-11 Philips Intellectual Property Light source

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242711A (en) * 1988-04-18 1990-02-13 Canon Inc Lithography mask structure
JPH0294422A (en) * 1988-09-30 1990-04-05 Canon Inc Mask structure for lithography
US6509124B1 (en) 1999-11-10 2003-01-21 Shin-Etsu Chemical Co., Ltd. Method of producing diamond film for lithography
WO2003075309A3 (en) * 2002-03-07 2004-11-11 Philips Intellectual Property Light source

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