JPS6475680A - Plasma cvd device - Google Patents

Plasma cvd device

Info

Publication number
JPS6475680A
JPS6475680A JP23112087A JP23112087A JPS6475680A JP S6475680 A JPS6475680 A JP S6475680A JP 23112087 A JP23112087 A JP 23112087A JP 23112087 A JP23112087 A JP 23112087A JP S6475680 A JPS6475680 A JP S6475680A
Authority
JP
Japan
Prior art keywords
substrate
electric field
mask
electrode
cvd device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23112087A
Other languages
Japanese (ja)
Other versions
JPH0653928B2 (en
Inventor
Takayuki Ishizaki
Kenji Nakatani
Hiroshi Okaniwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP23112087A priority Critical patent/JPH0653928B2/en
Publication of JPS6475680A publication Critical patent/JPS6475680A/en
Publication of JPH0653928B2 publication Critical patent/JPH0653928B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

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Abstract

PURPOSE:To make an electric field on the surface of a substrate moving under a mask nearly uniform in a CVD device, by fitting an electric field regulating member to the opening in the mask positioned between the substrate and an electrode for electric discharge. CONSTITUTION:A mask 3 is positioned between a substrate 2 and an electrode 5 for electric discharge in a plasma CVD device, the substrate 2 is traveled in the arrow direction and plasma is generated between a substrate side electrode 1 and the electrode 5 to form a thin film on the substrate 2. At this time, an electric field regulating member 7 made of a wire extending in the transverse direction of the substrate 2 is fitted to the central part of the opening 3a in the mask 3 in the transfer direction of the substrate 2 so as to regulate the distribution of an electric field in the opening 3a. The electric field on the surface of the moving substrate is made nearly uniform and a thin film having uniform characteristics is formed on the substrate.
JP23112087A 1987-09-17 1987-09-17 Plasma CVD equipment Expired - Fee Related JPH0653928B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23112087A JPH0653928B2 (en) 1987-09-17 1987-09-17 Plasma CVD equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23112087A JPH0653928B2 (en) 1987-09-17 1987-09-17 Plasma CVD equipment

Publications (2)

Publication Number Publication Date
JPS6475680A true JPS6475680A (en) 1989-03-22
JPH0653928B2 JPH0653928B2 (en) 1994-07-20

Family

ID=16918599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23112087A Expired - Fee Related JPH0653928B2 (en) 1987-09-17 1987-09-17 Plasma CVD equipment

Country Status (1)

Country Link
JP (1) JPH0653928B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006121068A1 (en) * 2005-05-10 2006-11-16 Ulvac, Inc. Winding plasma cvd apparatus
JP2007308758A (en) * 2006-05-18 2007-11-29 Denso Corp Film forming apparatus and film forming method
JP2008057020A (en) * 2006-09-01 2008-03-13 Ulvac Japan Ltd Winding type plasma CVD equipment
JP2010121156A (en) * 2008-11-18 2010-06-03 Fuji Electric Holdings Co Ltd Capacitance-coupling type plasma cvd apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006121068A1 (en) * 2005-05-10 2006-11-16 Ulvac, Inc. Winding plasma cvd apparatus
US7896968B2 (en) 2005-05-10 2011-03-01 Ulvac, Inc. Winding type plasma CVD apparatus
JP5234911B2 (en) * 2005-05-10 2013-07-10 株式会社アルバック Winding type plasma CVD equipment
JP2007308758A (en) * 2006-05-18 2007-11-29 Denso Corp Film forming apparatus and film forming method
JP2008057020A (en) * 2006-09-01 2008-03-13 Ulvac Japan Ltd Winding type plasma CVD equipment
JP2010121156A (en) * 2008-11-18 2010-06-03 Fuji Electric Holdings Co Ltd Capacitance-coupling type plasma cvd apparatus

Also Published As

Publication number Publication date
JPH0653928B2 (en) 1994-07-20

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Legal Events

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