JPS6480036A - Device for fixing material to be treated - Google Patents

Device for fixing material to be treated

Info

Publication number
JPS6480036A
JPS6480036A JP62236915A JP23691587A JPS6480036A JP S6480036 A JPS6480036 A JP S6480036A JP 62236915 A JP62236915 A JP 62236915A JP 23691587 A JP23691587 A JP 23691587A JP S6480036 A JPS6480036 A JP S6480036A
Authority
JP
Japan
Prior art keywords
reference piece
treated
movable reference
treating stage
sticking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62236915A
Other languages
English (en)
Other versions
JP2554894B2 (ja
Inventor
Akira Iwase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP62236915A priority Critical patent/JP2554894B2/ja
Publication of JPS6480036A publication Critical patent/JPS6480036A/ja
Application granted granted Critical
Publication of JP2554894B2 publication Critical patent/JP2554894B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP62236915A 1987-09-21 1987-09-21 被処理材の固定装置 Expired - Fee Related JP2554894B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62236915A JP2554894B2 (ja) 1987-09-21 1987-09-21 被処理材の固定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62236915A JP2554894B2 (ja) 1987-09-21 1987-09-21 被処理材の固定装置

Publications (2)

Publication Number Publication Date
JPS6480036A true JPS6480036A (en) 1989-03-24
JP2554894B2 JP2554894B2 (ja) 1996-11-20

Family

ID=17007637

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62236915A Expired - Fee Related JP2554894B2 (ja) 1987-09-21 1987-09-21 被処理材の固定装置

Country Status (1)

Country Link
JP (1) JP2554894B2 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001196303A (ja) * 1999-12-03 2001-07-19 Asm Lithography Bv リトグラフ投影装置
JP2008142797A (ja) * 2006-12-06 2008-06-26 Shinko Electric Ind Co Ltd ワークの位置決め装置
CN111722475A (zh) * 2019-03-22 2020-09-29 上海微电子装备（集团）股份有限公司 一种调节组件及微调装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63186442A (ja) * 1987-01-29 1988-08-02 Toshiba Corp ワ−ク搬送用治具

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63186442A (ja) * 1987-01-29 1988-08-02 Toshiba Corp ワ−ク搬送用治具

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001196303A (ja) * 1999-12-03 2001-07-19 Asm Lithography Bv リトグラフ投影装置
USRE41307E1 (en) 1999-12-03 2010-05-04 Asml Netherlands B.V. Mask for clamping apparatus, e.g. for a lithographic apparatus
JP2008142797A (ja) * 2006-12-06 2008-06-26 Shinko Electric Ind Co Ltd ワークの位置決め装置
CN111722475A (zh) * 2019-03-22 2020-09-29 上海微电子装备（集团）股份有限公司 一种调节组件及微调装置
CN111722475B (zh) * 2019-03-22 2021-11-23 上海微电子装备（集团）股份有限公司 一种调节组件及微调装置

Also Published As

Publication number Publication date
JP2554894B2 (ja) 1996-11-20

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Legal Events

Date Code Title Description
S111 Request for change of ownership or part of ownership

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R350 Written notification of registration of transfer

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LAPS Cancellation because of no payment of annual fees