JPS6480036A - Device for fixing material to be treated - Google Patents
Device for fixing material to be treatedInfo
- Publication number
- JPS6480036A JPS6480036A JP62236915A JP23691587A JPS6480036A JP S6480036 A JPS6480036 A JP S6480036A JP 62236915 A JP62236915 A JP 62236915A JP 23691587 A JP23691587 A JP 23691587A JP S6480036 A JPS6480036 A JP S6480036A
- Authority
- JP
- Japan
- Prior art keywords
- reference piece
- treated
- movable reference
- treating stage
- sticking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To set materials to be treated of various sizes on a treating stage, by establishing a spacing of a reference piece which holds a part nearby an edge part of each material to be treated by operating a drive device. CONSTITUTION:Both motors 15 are operated simultaneously so as to allow the position of a movable reference piece 12 to be in accord with the size of a material 5 to be treated and pole nuts 14 are moved by rotating both pole screws 13 to displace the movable reference piece 12. In such a case, as a pneumatic source is connected to slots 22 for sticking by vacuum suction at the lower face of the movable reference piece 12, the resultant action of its pneumatic force permits a fluid bearing to be formed between the movable reference piece 12 and a treating stage 1. The amount of movement of the movable reference piece 12, that is, its position is determined by an instruction value given to the motors 15 and it stops at a position determined according to the size of the material 5 to be treated. Then, the slots 22 for sticking by vacuum suction are connected to a vacuum source and then the material 5 to be treated is set out after making the movable reference piece 12 come closely into contact and also fixing to the upper face of the treating stage 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62236915A JP2554894B2 (en) | 1987-09-21 | 1987-09-21 | Fixing device for processed material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62236915A JP2554894B2 (en) | 1987-09-21 | 1987-09-21 | Fixing device for processed material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6480036A true JPS6480036A (en) | 1989-03-24 |
| JP2554894B2 JP2554894B2 (en) | 1996-11-20 |
Family
ID=17007637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62236915A Expired - Fee Related JP2554894B2 (en) | 1987-09-21 | 1987-09-21 | Fixing device for processed material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2554894B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001196303A (en) * | 1999-12-03 | 2001-07-19 | Asm Lithography Bv | Lithograph projection device |
| JP2008142797A (en) * | 2006-12-06 | 2008-06-26 | Shinko Electric Ind Co Ltd | Work positioning device |
| CN111722475A (en) * | 2019-03-22 | 2020-09-29 | 上海微电子装备(集团)股份有限公司 | Adjusting component and fine adjustment device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63186442A (en) * | 1987-01-29 | 1988-08-02 | Toshiba Corp | Jig for work transfer |
-
1987
- 1987-09-21 JP JP62236915A patent/JP2554894B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63186442A (en) * | 1987-01-29 | 1988-08-02 | Toshiba Corp | Jig for work transfer |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001196303A (en) * | 1999-12-03 | 2001-07-19 | Asm Lithography Bv | Lithograph projection device |
| USRE41307E1 (en) | 1999-12-03 | 2010-05-04 | Asml Netherlands B.V. | Mask for clamping apparatus, e.g. for a lithographic apparatus |
| JP2008142797A (en) * | 2006-12-06 | 2008-06-26 | Shinko Electric Ind Co Ltd | Work positioning device |
| CN111722475A (en) * | 2019-03-22 | 2020-09-29 | 上海微电子装备(集团)股份有限公司 | Adjusting component and fine adjustment device |
| CN111722475B (en) * | 2019-03-22 | 2021-11-23 | 上海微电子装备(集团)股份有限公司 | Adjusting component and fine adjustment device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2554894B2 (en) | 1996-11-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| LAPS | Cancellation because of no payment of annual fees |