JPS6480038A - Manufacture of semiconductor integrated circuit device - Google Patents

Manufacture of semiconductor integrated circuit device

Info

Publication number
JPS6480038A
JPS6480038A JP62235907A JP23590787A JPS6480038A JP S6480038 A JPS6480038 A JP S6480038A JP 62235907 A JP62235907 A JP 62235907A JP 23590787 A JP23590787 A JP 23590787A JP S6480038 A JPS6480038 A JP S6480038A
Authority
JP
Japan
Prior art keywords
etching
redundant fuse
passivation film
manufacture
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62235907A
Other languages
English (en)
Inventor
Osamu Tsuchiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62235907A priority Critical patent/JPS6480038A/ja
Publication of JPS6480038A publication Critical patent/JPS6480038A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Design And Manufacture Of Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
  • For Increasing The Reliability Of Semiconductor Memories (AREA)
  • Techniques For Improving Reliability Of Storages (AREA)
JP62235907A 1987-09-19 1987-09-19 Manufacture of semiconductor integrated circuit device Pending JPS6480038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62235907A JPS6480038A (en) 1987-09-19 1987-09-19 Manufacture of semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62235907A JPS6480038A (en) 1987-09-19 1987-09-19 Manufacture of semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
JPS6480038A true JPS6480038A (en) 1989-03-24

Family

ID=16993004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62235907A Pending JPS6480038A (en) 1987-09-19 1987-09-19 Manufacture of semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPS6480038A (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6452243U (ja) * 1987-09-28 1989-03-31
US5242851A (en) * 1991-07-16 1993-09-07 Samsung Semiconductor, Inc. Programmable interconnect device and method of manufacturing same
JPH06104397A (ja) * 1992-04-17 1994-04-15 Hyundai Electron Ind Co Ltd ダイナミック・ランダム・アクセス・メモリーセル及びその製造方法
JPH06216255A (ja) * 1992-12-17 1994-08-05 Samsung Electron Co Ltd リダンダンシ回路を備えた半導体装置のウェーハ検査方法
KR100232976B1 (ko) * 1995-11-30 1999-12-01 다니구찌 이찌로오 반도체 장치의 제조 방법
KR100235585B1 (ko) * 1995-08-07 1999-12-15 모리 가즈히로 반도체장치 및 제조방법
JP2000150655A (ja) * 1998-11-05 2000-05-30 Siemens Ag ヒュ―ズ構造体およびその製造方法
EP0981161A3 (en) * 1998-06-26 2002-06-12 International Business Machines Corporation Semiconductor structure including a conductive fuse and process for fabrication thereof
JP2003051542A (ja) * 2001-08-08 2003-02-21 Sony Corp 半導体装置及びその製造方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6452243U (ja) * 1987-09-28 1989-03-31
US5242851A (en) * 1991-07-16 1993-09-07 Samsung Semiconductor, Inc. Programmable interconnect device and method of manufacturing same
JPH06104397A (ja) * 1992-04-17 1994-04-15 Hyundai Electron Ind Co Ltd ダイナミック・ランダム・アクセス・メモリーセル及びその製造方法
JPH06216255A (ja) * 1992-12-17 1994-08-05 Samsung Electron Co Ltd リダンダンシ回路を備えた半導体装置のウェーハ検査方法
KR100235585B1 (ko) * 1995-08-07 1999-12-15 모리 가즈히로 반도체장치 및 제조방법
KR100232976B1 (ko) * 1995-11-30 1999-12-01 다니구찌 이찌로오 반도체 장치의 제조 방법
EP0981161A3 (en) * 1998-06-26 2002-06-12 International Business Machines Corporation Semiconductor structure including a conductive fuse and process for fabrication thereof
JP2000150655A (ja) * 1998-11-05 2000-05-30 Siemens Ag ヒュ―ズ構造体およびその製造方法
JP2003051542A (ja) * 2001-08-08 2003-02-21 Sony Corp 半導体装置及びその製造方法

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