JPS6480470A - Coating device - Google Patents

Coating device

Info

Publication number
JPS6480470A
JPS6480470A JP62234810A JP23481087A JPS6480470A JP S6480470 A JPS6480470 A JP S6480470A JP 62234810 A JP62234810 A JP 62234810A JP 23481087 A JP23481087 A JP 23481087A JP S6480470 A JPS6480470 A JP S6480470A
Authority
JP
Japan
Prior art keywords
filter
outside
discharge space
resist liquid
resticking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62234810A
Other languages
Japanese (ja)
Inventor
Tadahide Chiba
Kazunori Nemoto
Hiroyuki Tsukamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62234810A priority Critical patent/JPS6480470A/en
Publication of JPS6480470A publication Critical patent/JPS6480470A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the resticking of splashed paint to an object to be coated by providing a filter to the circumference in the rotating direction of a spin head to which the object to be coated is supported in a treatment space and further, providing a low-pressure force discharge space by the outside peripheral face side thereof. CONSTITUTION:A resist liquid 13a splashed toward the outside of the rotating circumference from the surface of a wafer 2 by the centrifugal force generated when the spin head 7 rotates is brought into collision against the porous filter 14. The filter 14 is kept under the negative pressure on the discharge space 5 side which is the surface on the side opposite to the surface to collide against the resist liquid 13a and, therefore, the resist liquid 13a colliding against the same is sucked into the filter 14 and the resticking thereof to the wafer 2 is effectively prevented. Since the splashing liquid sucked into the filter 14 is removed to the outside through the force discharge space 5 on the outside peripheral face side of the filter, the clogging of the filter 14 is prevented. The coating with the high reliability over a long period of time is thus executed.
JP62234810A 1987-09-21 1987-09-21 Coating device Pending JPS6480470A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62234810A JPS6480470A (en) 1987-09-21 1987-09-21 Coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62234810A JPS6480470A (en) 1987-09-21 1987-09-21 Coating device

Publications (1)

Publication Number Publication Date
JPS6480470A true JPS6480470A (en) 1989-03-27

Family

ID=16976746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62234810A Pending JPS6480470A (en) 1987-09-21 1987-09-21 Coating device

Country Status (1)

Country Link
JP (1) JPS6480470A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017094240A (en) * 2015-11-19 2017-06-01 日清エンジニアリング株式会社 Mixer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017094240A (en) * 2015-11-19 2017-06-01 日清エンジニアリング株式会社 Mixer

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