JPS6481908A - Spectral element - Google Patents

Spectral element

Info

Publication number
JPS6481908A
JPS6481908A JP24008587A JP24008587A JPS6481908A JP S6481908 A JPS6481908 A JP S6481908A JP 24008587 A JP24008587 A JP 24008587A JP 24008587 A JP24008587 A JP 24008587A JP S6481908 A JPS6481908 A JP S6481908A
Authority
JP
Japan
Prior art keywords
spectral element
lif
molybdenum
lithium fluoride
attains
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24008587A
Other languages
Japanese (ja)
Inventor
Junichi Fujita
Atsushi Kamijo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP24008587A priority Critical patent/JPS6481908A/en
Publication of JPS6481908A publication Critical patent/JPS6481908A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain a spectral element which has high strength and adequate resolving power and does not require intricate optical systems by alternately laminating molybdenum and lithium fluoride at respectively specific film thicknesses in such a manner that the film thickness ratio of the molybdenum and the lithium fluoride attains 0.1-10. CONSTITUTION:This spectral element is the artificial multi-layered film which is provided with periodic structures by alternately laminating the molybdenum (Mo) 2 and the lithium fluoride (Lif) 3 respectively to >=1atom. and <=400Angstrom film thicknesses on a substrate 1 in such a manner that the film thickness ratio of the Mo 2 and the LiF 3 attains 0.1-10. Glass, silicon, sapphire, etc., having optically flat surfaces are used for the substrate 1. A vacuum deposition method or neutralized ion beam sputtering method, high-frequency sputtering method, etc., are used for the alternate lamination of the Mo 2 and the LiF 3. The spectral element which has the high strength and the adequate resolving power and does not require the intricate optical systems is thereby obtd.
JP24008587A 1987-09-24 1987-09-24 Spectral element Pending JPS6481908A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24008587A JPS6481908A (en) 1987-09-24 1987-09-24 Spectral element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24008587A JPS6481908A (en) 1987-09-24 1987-09-24 Spectral element

Publications (1)

Publication Number Publication Date
JPS6481908A true JPS6481908A (en) 1989-03-28

Family

ID=17054260

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24008587A Pending JPS6481908A (en) 1987-09-24 1987-09-24 Spectral element

Country Status (1)

Country Link
JP (1) JPS6481908A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242399A (en) * 1988-08-02 1990-02-13 Agency Of Ind Science & Technol Multilayered film reflecting mirror for soft x ray
JPH0434400A (en) * 1990-05-31 1992-02-05 Japan Aviation Electron Ind Ltd Soft x-rays multilayer film reflecting mirror

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242399A (en) * 1988-08-02 1990-02-13 Agency Of Ind Science & Technol Multilayered film reflecting mirror for soft x ray
JPH0434400A (en) * 1990-05-31 1992-02-05 Japan Aviation Electron Ind Ltd Soft x-rays multilayer film reflecting mirror

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