JPH0434400A - Soft x-rays multilayer film reflecting mirror - Google Patents

Soft x-rays multilayer film reflecting mirror

Info

Publication number
JPH0434400A
JPH0434400A JP14224590A JP14224590A JPH0434400A JP H0434400 A JPH0434400 A JP H0434400A JP 14224590 A JP14224590 A JP 14224590A JP 14224590 A JP14224590 A JP 14224590A JP H0434400 A JPH0434400 A JP H0434400A
Authority
JP
Japan
Prior art keywords
multilayer film
refractive index
soft
rays
lif
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14224590A
Other languages
Japanese (ja)
Inventor
Kazuhiko Ito
和彦 伊藤
Kazuyuki Eto
江藤 和幸
Hisao Sekiguchi
関口 久夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Aviation Electronics Industry Ltd
Original Assignee
Japan Aviation Electronics Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Aviation Electronics Industry Ltd filed Critical Japan Aviation Electronics Industry Ltd
Priority to JP14224590A priority Critical patent/JPH0434400A/en
Publication of JPH0434400A publication Critical patent/JPH0434400A/en
Pending legal-status Critical Current

Links

Landscapes

  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)

Abstract

PURPOSE:To obtain a soft X-rays multilayer film reflecting mirror, which is superior in endurance to a Li group/Ni multilayer film reflecting mirror and obtains a higher reflection factor than the multilayer film reflecting mirror of Be/Ni and SiO2/Ni. CONSTITUTION:LiF(lithium fluoride) is used as a material exhibiting higher refractive index among two materials forming a multilayer film, and since Ni(nickel) is used as a material exhibiting low refractive index, the refractive index of a LiF/Ni multilayer film composed of LiF and Ni is higher than those of the conventional SiO2/Ni multilayer film and Be/Ni multilayer film to soft X-rays of a wave length range of 23Angstrom -44Angstrom . In addition, since LiF is inactive and does not chemically react with moisture in the air, the film composed of LiF is chemically stable.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、生体用X線顕微鏡などに用いられる軟X線多
NWj1反射鏡に関し、特に、生体の蛋白質の観察に有
用な23人〜44人の波長領域の軟X線に対し高い反射
率を示す軟X線多層膜反射鏡に関する。
Detailed Description of the Invention (Industrial Field of Application) The present invention relates to a soft X-ray multi-NWj1 reflector used in biological X-ray microscopes, etc. The present invention relates to a soft X-ray multilayer reflector that exhibits high reflectivity for soft X-rays in the human wavelength range.

(従来の技術) 生体の蛋白質を観察するためのX線頚徴鏡には水力X線
に対する吸収率と蛋白質のX線に対する吸収率との差を
利用して像の濃淡が得られるように23人〜44人の波
長領域の軟X線が用いられている。軟X線の23人〜4
4人の波長領域における蛋白質の軟X線に対する吸収率
は、第3図に示すように、水の軟X線に対する吸収率と
異なる。
(Prior art) An X-ray neck mirror for observing proteins in a living body uses the difference between the absorption rate of hydro-power X-rays and the absorption rate of proteins for X-rays to obtain shading of the image23. Soft X-rays in the wavelength range of human to 44 people are used. Soft X-ray 23 people ~ 4
As shown in FIG. 3, the absorption rate of protein for soft X-rays in the wavelength range of four people is different from the absorption rate of water for soft X-rays.

本図から明らかなように、ポリイミド、プロティンなど
の蛋白質の軟X線に対する吸収率が水の軟X線に対する
吸収率の10倍程度の値であることがわかる。
As is clear from this figure, the absorption rate of proteins such as polyimide and protein for soft X-rays is about 10 times the absorption rate of water for soft X-rays.

しかし、全ての物質は23人〜44人の波長領域の軟X
線に対し1に近い屈折率を示すから、軟X線に対して高
い反射率を示す反射鏡を単一の物質で構成することはで
きない。よって、軟X線に対して比較的高い反射率を得
るために、X線に対し互いに興なる屈折率を示す2つの
物質が交互に積層されている多層膜を有する多層膜反射
鏡が提案されている。多層膜反射鏡の多層膜における前
記物質の内の高い屈折率を示す物質からなる高屈折率層
の厚さと低い屈折率を示す物質からなる低屈折率層の厚
さとは前記高屈折率層と前記低屈折率層との境界で反射
されるX@が互いに強め合う値に設定されていることに
より、前記高屈折sFwと前記低屈折率層との境界で反
射されるXwAの位相は互いに一致されるから、比較的
高い反射率を得ることができる。
However, all substances are soft X in the wavelength range of 23 to 44 people.
Since it has a refractive index close to 1 for soft X-rays, a reflecting mirror that exhibits a high reflectance for soft X-rays cannot be constructed of a single material. Therefore, in order to obtain a relatively high reflectance for soft X-rays, a multilayer reflector has been proposed that has a multilayer film in which two materials exhibiting mutually different refractive indexes for X-rays are laminated alternately. ing. The thickness of the high refractive index layer made of a substance exhibiting a high refractive index among the above substances and the thickness of the low refractive index layer consisting of a substance exhibiting a low refractive index in the multilayer film of the multilayer reflector are the same as the high refractive index layer. Since the X@ reflected at the boundary with the low refractive index layer is set to a value that strengthens each other, the phases of the XwA reflected at the boundary between the high refractive index sFw and the low refractive index layer match each other. Therefore, a relatively high reflectance can be obtained.

多層膜反射鏡のX線に対する反射率は多層膜を形成する
高い屈折率を示す物質と低い屈折率を示す物質との組合
せによって決定され、比教的高い反射率を得ることがで
きる物質の組合せがいくつか提案されている。
The reflectivity of a multilayer mirror for X-rays is determined by the combination of a material with a high refractive index and a material with a low refractive index that form the multilayer film, and is a combination of materials that can obtain an extremely high reflectance. Several have been proposed.

物質の組合せの1つとして、X線に対し高い屈折率を示
す物質としてBe、X線に対し低い屈折率を示す物質と
してNiをそれぞれ用いるものがあり、該組合せによる
B e / N i多層膜反射鏡は広く利用されている
One of the combinations of materials is to use Be as a material that exhibits a high refractive index with respect to X-rays and Ni as a material that exhibits a low refractive index with respect to X-rays, and a Be/Ni multilayer film using this combination is used. Reflectors are widely used.

他の物質の組合せとして、高い屈折率を示す5i02と
低い屈折率を示すNiとからなるものがあり、該組合せ
によって得られるSiO2/Ni多層WA反射鏡がある
(特願昭63−125024号)。
Another material combination is 5i02, which has a high refractive index, and Ni, which has a low refractive index, and there is a SiO2/Ni multilayer WA reflector obtained by this combination (Japanese Patent Application No. 125024/1982). .

さらに他の物質の組合せとして、高い屈折率を示すLi
、LiHまたはLi2Oと低い屈折率を示すNiとから
なるものがあり、該組合せによって得られるLi系/ 
N i多層膜反射鏡がある(特願昭63−192158
号)。
Furthermore, as a combination of other materials, Li exhibiting a high refractive index
, LiH or Li2O, and Ni which exhibits a low refractive index, and the Li-based/
There is a Ni multilayer film reflector (Patent application No. 63-192158)
issue).

(発明が解決しようとする課題) 上記各種物質の組合せによる多層膜反射鏡の内でLi系
/ N i多層膜反射鏡は、23人〜44人の波長領域
の軟X線に対してB e / N を多層膜反射鏡およ
びSiO,/Ni多層膜反射鏡の反射率より高い反射率
を示す、ところが、Li、LiHおよびLiz Oなど
のLi系の物質は活性に富むから、Li系の物質が空気
中の水分を吸収するなどの化学変化によってLi系物質
が他の物質に変化され易く、Li系/ N i多層膜反
射鏡の反射性能は時間の経過とともに低下する。その結
果、Li系/ N i多層膜反射鏡の耐久性は他の多層
膜反射鏡の耐久性より劣る。
(Problems to be Solved by the Invention) Among the multilayer reflectors made of a combination of the various materials mentioned above, the Li-based/Ni multilayer reflector has a B e /N has a higher reflectance than that of the multilayer reflector and the SiO,/Ni multilayer reflector.However, since Li-based substances such as Li, LiH, and LizO are rich in activity, Li-based substances The Li-based substance is easily converted into other substances due to chemical changes such as absorption of moisture in the air, and the reflective performance of the Li-based/Ni multilayer reflector deteriorates over time. As a result, the durability of the Li-based/Ni multilayer reflector is inferior to that of other multilayer reflectors.

本発明の目的は、Li系/ N i多層膜反射鏡より耐
久性に優れ、しかもB e / N iおよびSiO、
/Niの多層膜反射鏡より高い反射率を得ることができ
る軟X線多層膜反射鏡を提供することにある。
The purpose of the present invention is to provide a reflector that is superior in durability to a Li-based/Ni multilayer film reflector, and that is also made of Be/Ni and SiO,
An object of the present invention is to provide a soft X-ray multilayer film reflector that can obtain a higher reflectance than a /Ni multilayer film reflector.

(課題を解決するための手段) 本発明は、X線に対し互いに異なる屈折率を示す2つの
物質が交互に積層されている多層膜を有し、前記2つの
物質の内の高い屈折率を示す物質からなる高屈折率層の
厚さと低い屈折率を示す物質からなる低屈折率層の厚さ
とは前記高屈折率層と前記低屈折率層との境界で反射さ
れるX線が互いに強め合う値に設定されている軟X線多
層膜反射鏡であって、前記高屈折率層の物質がLiFで
あり、前記低屈折率層の物質がNiであることを特徴と
する。
(Means for Solving the Problems) The present invention has a multilayer film in which two substances exhibiting mutually different refractive indexes with respect to X-rays are laminated alternately. The thickness of the high refractive index layer made of a substance with a low refractive index and the thickness of a low refractive index layer made of a substance with a low refractive index are such that X-rays reflected at the boundary between the high refractive index layer and the low refractive index layer mutually strengthen each other. The soft X-ray multilayer film reflecting mirror is set to a value that matches the above, and is characterized in that the material of the high refractive index layer is LiF, and the material of the low refractive index layer is Ni.

(作用) 多層膜を形成する2つの物質の内の高い屈折率を示す物
質としてLiF(s化すチウム)が用いられ、低い屈折
率を示す物質としてNiにッケル)が用いられているか
ら、LiFとNiとの組合せからなるL i F / 
N i多層膜は23人〜44人の波長領域の軟X線に対
して従来のSiO□/Ni多層膜およびB e / N
 i多層膜の反射率よりも高い反射率を示す、また、L
fFは不活性であることにより、L jFと空気中の水
分などとは化学的に反応しないから、LiFからなる膜
は化学的に安定である。
(Function) Of the two substances that form the multilayer film, LiF (sulfur oxide) is used as the substance that exhibits a high refractive index, and Ni (nickel) is used as the substance that exhibits a low refractive index. L i F / consisting of a combination of and Ni
The Ni multilayer film is superior to the conventional SiO□/Ni multilayer film and Be/N for soft X-rays in the 23-44 wavelength range.
It shows a reflectance higher than that of the i multilayer film, and L
Since fF is inert, L jF does not chemically react with moisture in the air, so a film made of LiF is chemically stable.

(実施例) 第1図は本発明の軟X線多層膜反射鏡の一実施例を示す
断面図、第2図は第1図の軟X線多層膜反射鏡および従
来のX線多層膜反射鏡の反射率と波長との関係を示す図
である。
(Example) Fig. 1 is a sectional view showing an embodiment of the soft X-ray multilayer film reflector of the present invention, and Fig. 2 is a sectional view showing the soft X-ray multilayer film reflector of Fig. 1 and the conventional X-ray multilayer film reflector. FIG. 3 is a diagram showing the relationship between reflectance of a mirror and wavelength.

軟X線多層膜反射鏡10は、第1図に示すように、基板
12と、基板12に投けられている多層膜14とを有す
る。多層M14には、NiからなるN1層16とLiF
からなるLiF層1層上8交互に積層されている。Nt
l’l16およびLiF層1層上8パッタリングによっ
て形成され、多層膜14の積層数は99である。
The soft X-ray multilayer film reflecting mirror 10 has a substrate 12 and a multilayer film 14 disposed on the substrate 12, as shown in FIG. The multilayer M14 includes an N1 layer 16 made of Ni and a LiF
Eight LiF layers are alternately stacked on one layer. Nt
The multilayer film 14 is formed by puttering 8 putters on one layer of l'l16 and one LiF layer, and the number of laminated layers of the multilayer film 14 is 99.

LiP層18は23,3人〜44人の波長停域の軟X線
に対してN1層16の屈折率より高い屈折率を示し、L
iF層1層上8折率とN1層16の屈折率との差は小さ
い、LiFjl18とN1層16との僅かな屈折率の差
によって軟X*4.tLiF層18とN1層16との境
界のそれぞれで僅かに反射される。N1層16とLiF
層1層上8厚さは、各層の境界で反射される軟X線の位
相が揃いかつそれら反射波が互いに強め合う値に設定さ
れている。なお、第1図に示されるN1層16の厚さ方
向の寸法およびLiF層1層上8さ方向の寸法は横方向
の寸法より拡大されている。
The LiP layer 18 exhibits a refractive index higher than that of the N1 layer 16 for soft X-rays with a wavelength stop of 23.3 to 44, and
The difference between the refractive index of the first iF layer 8 and the refractive index of the N1 layer 16 is small, and the slight difference in refractive index between the LiFjl 18 and the N1 layer 16 causes soft It is slightly reflected at each boundary between the tLiF layer 18 and the N1 layer 16. N1 layer 16 and LiF
The thickness of layer 1 and upper layer 8 is set to such a value that the phases of the soft X-rays reflected at the boundaries of each layer are aligned and the reflected waves strengthen each other. Note that the dimension in the thickness direction of the N1 layer 16 and the dimension in the lateral direction of the first LiF layer shown in FIG. 1 are larger than the dimension in the lateral direction.

次に、X線が多層膜14に角度20°で入射するとき、
第2図に示すように、軟X線多層膜反射鏡10は、23
.3人〜80人の波長領域において、従来のB e /
 N i多層膜反射鏡およびSiO2/Ni多層膜反射
鏡の反射率より高い反射率を示す。なお、本図で示され
る各多層膜反射鏡のX線に対する反射率は数値計算によ
って得られた値であり、従来のB e / N i多層
膜反射鏡の反射率および5iOz/Ni多Fi!暎反射
鏡の反射率6オそれぞれの積層数を99として計算され
ている。
Next, when the X-rays are incident on the multilayer film 14 at an angle of 20°,
As shown in FIG. 2, the soft X-ray multilayer reflector 10 has 23
.. In the wavelength range of 3 to 80 people, the conventional B e /
It exhibits a higher reflectance than the Ni multilayer reflector and the SiO2/Ni multilayer reflector. The X-ray reflectance of each multilayer film reflector shown in this figure is a value obtained by numerical calculation, and is based on the reflectance of the conventional Be/Ni multilayer film reflector and the 5iOz/Ni multi-Fi! It is calculated assuming that the reflectivity of the mirror is 6 and the number of layers is 99.

LiFは不活性な物質であることにより、LiFと空気
中の水分などとは化学的に反応しないから、LtFから
なるLLFM]18は化学的に安定な層である。その結
果、LjF層1層上8 i Fi 16とからなる多1
!!A14を有する軟X線多層膜反射鏡10の耐久性は
従来のLi系/ N を多層膜反射鏡の耐久性より優れ
ている。
Since LiF is an inert substance, LiF does not chemically react with moisture in the air, so the LLFM made of LtF 18 is a chemically stable layer. As a result, a polygonal layer consisting of 8 i Fi 16 on one LjF layer is formed.
! ! The durability of the soft X-ray multilayer film reflector 10 having A14 is superior to that of the conventional Li-based/N multilayer film reflector.

(発明の効果) 本発明によれば、前記多層膜の高屈折率層がLiFから
なり、低屈折率層がNiからなるから、23人〜44人
の波長領域に対する軟X線に対する反射率を従来のB 
e / N i多層膜反射鏡およびSiO□/Ni多層
膜反射鏡の反射率より高くす葛をとができ、また、耐久
性を従来のLi系/N1多層展反射鏡の耐久性より向上
させることができる。
(Effects of the Invention) According to the present invention, since the high refractive index layer of the multilayer film is made of LiF and the low refractive index layer is made of Ni, the reflectance for soft X-rays in the wavelength range of 23 to 44 is low. Conventional B
The reflectance can be made higher than that of e/Ni multilayer reflector and SiO□/Ni multilayer reflector, and the durability is improved compared to that of conventional Li-based/N1 multilayer reflector. be able to.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の軟X線多層膜反射鏡の一実施例を示す
断面図、第2図は第1図の軟X線多層膜反射鏡および従
来のX線多層膜反射鏡の反射率と波長との関係を示す図
、第3図は各種の物質の30人前後のX線に対する吸収
率と波長との関係を示す図である。 10・・・軟X線多層膜反射鏡、14・・・多!a膜、
16・・・Ni層(低屈折率層)、18・・・LiF層
(高屈折率N)。 第1図
FIG. 1 is a sectional view showing one embodiment of the soft X-ray multilayer film reflector of the present invention, and FIG. 2 is a reflectance of the soft X-ray multilayer film reflector of FIG. 1 and the conventional X-ray multilayer film reflector. FIG. 3 is a diagram showing the relationship between wavelength and the absorption rate of various substances for X-rays of about 30 people. 10... Soft X-ray multilayer reflector, 14... Many! a membrane,
16...Ni layer (low refractive index layer), 18...LiF layer (high refractive index N). Figure 1

Claims (1)

【特許請求の範囲】[Claims] X線に対し互いに異なる屈折率を示す2つの物質が交互
に積層されている多層膜を有し、前記2つの物質の内の
高い屈折率を示す物質からなる高屈折率層の厚さと低い
屈折率を示す物質からなる低屈折率層の厚さとは前記高
屈折率層と前記低屈折率層との境界で反射されるX線が
互いに強め合う値に設定されている軟X線多層膜反射鏡
において、前記高屈折率層の物質がLiFであり、前記
低屈折率層の物質がNiであることを特徴とする軟X線
多層膜反射鏡。
It has a multilayer film in which two substances exhibiting mutually different refractive indexes with respect to X-rays are laminated alternately, and the thickness and low refraction of the high refractive index layer made of the substance exhibiting the higher refractive index of the two substances. The thickness of the low refractive index layer made of a material that exhibits a soft A soft X-ray multilayer film reflecting mirror, characterized in that the material of the high refractive index layer is LiF, and the material of the low refractive index layer is Ni.
JP14224590A 1990-05-31 1990-05-31 Soft x-rays multilayer film reflecting mirror Pending JPH0434400A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14224590A JPH0434400A (en) 1990-05-31 1990-05-31 Soft x-rays multilayer film reflecting mirror

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14224590A JPH0434400A (en) 1990-05-31 1990-05-31 Soft x-rays multilayer film reflecting mirror

Publications (1)

Publication Number Publication Date
JPH0434400A true JPH0434400A (en) 1992-02-05

Family

ID=15310821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14224590A Pending JPH0434400A (en) 1990-05-31 1990-05-31 Soft x-rays multilayer film reflecting mirror

Country Status (1)

Country Link
JP (1) JPH0434400A (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6388502A (en) * 1986-10-01 1988-04-19 Canon Inc Reflection mirror consisting of multi-layered film for soft x-ray and vacuum ultraviolet ray
JPS63273099A (en) * 1987-04-30 1988-11-10 Nec Corp Spectroscopic element
JPS6481909A (en) * 1987-09-24 1989-03-28 Nec Corp Spectral element
JPS6481907A (en) * 1987-09-24 1989-03-28 Nec Corp Spectral element
JPS6481908A (en) * 1987-09-24 1989-03-28 Nec Corp Spectral element
JPS6481910A (en) * 1987-09-24 1989-03-28 Nec Corp Spectral element
JPH0242399A (en) * 1988-08-02 1990-02-13 Agency Of Ind Science & Technol Multilayered film reflecting mirror for soft x ray

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6388502A (en) * 1986-10-01 1988-04-19 Canon Inc Reflection mirror consisting of multi-layered film for soft x-ray and vacuum ultraviolet ray
JPS63273099A (en) * 1987-04-30 1988-11-10 Nec Corp Spectroscopic element
JPS6481909A (en) * 1987-09-24 1989-03-28 Nec Corp Spectral element
JPS6481907A (en) * 1987-09-24 1989-03-28 Nec Corp Spectral element
JPS6481908A (en) * 1987-09-24 1989-03-28 Nec Corp Spectral element
JPS6481910A (en) * 1987-09-24 1989-03-28 Nec Corp Spectral element
JPH0242399A (en) * 1988-08-02 1990-02-13 Agency Of Ind Science & Technol Multilayered film reflecting mirror for soft x ray

Similar Documents

Publication Publication Date Title
US4196246A (en) Anti-reflection film for synthetic resin base
JPH02192189A (en) Ulraviolet-resistant high-reflectivity multilayer dielectric mirror
JPS57130001A (en) Low polalization achromatic beam splitter
US5619382A (en) Reflection type imaging optical system
JPH0434400A (en) Soft x-rays multilayer film reflecting mirror
JPH02287301A (en) Reflecting mirror consisting of multilayered film of dielectric material having non-dependency on incident angle and having high reflecetivity
WO2020015102A1 (en) Polarization-independent beam splitter
JPS61219004A (en) multilayer reflector
JPH0587800B2 (en)
JPS61201143A (en) Gas sensor
CN218848372U (en) Depolarization film of laser beam splitter
JPS6111701A (en) Non-polarizing beam splitter
JPH10123303A (en) Antireflection optical parts
JPH03206999A (en) Multi-layered-film reflecting mirror for soft x-ray
JPS6239801A (en) Semi-transparent mirror
JPH08146218A (en) Polarizing beam splitter
JPH0619482B2 (en) Prism beam splitter
JP2814595B2 (en) Multilayer reflector
JPS58113901A (en) Laminated optical structural body
JP3002059B2 (en) Optical filter
JP2725043B2 (en) Broadband half mirror
JPS632386A (en) Amorphous silicon solar cell
SU822122A1 (en) Optic system
JPS61201202A (en) reflective mirror
JPS61262702A (en) Antireflection film of optical member made of synthetic resin