JPS648657A - Supplementary semiconductor integrated circuit device - Google Patents
Supplementary semiconductor integrated circuit deviceInfo
- Publication number
- JPS648657A JPS648657A JP62164324A JP16432487A JPS648657A JP S648657 A JPS648657 A JP S648657A JP 62164324 A JP62164324 A JP 62164324A JP 16432487 A JP16432487 A JP 16432487A JP S648657 A JPS648657 A JP S648657A
- Authority
- JP
- Japan
- Prior art keywords
- power supply
- gnd
- wiring
- polysilicon
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/003—Modifications for increasing the reliability for protection
- H03K19/00346—Modifications for eliminating interference or parasitic voltages or currents
- H03K19/00361—Modifications for eliminating interference or parasitic voltages or currents in field effect transistor circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62164324A JPS648657A (en) | 1987-06-30 | 1987-06-30 | Supplementary semiconductor integrated circuit device |
| US07/213,105 US4868627A (en) | 1987-06-30 | 1988-06-28 | Complementary semiconductor integrated circuit device capable of absorbing noise |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62164324A JPS648657A (en) | 1987-06-30 | 1987-06-30 | Supplementary semiconductor integrated circuit device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS648657A true JPS648657A (en) | 1989-01-12 |
Family
ID=15790997
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62164324A Pending JPS648657A (en) | 1987-06-30 | 1987-06-30 | Supplementary semiconductor integrated circuit device |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4868627A (ja) |
| JP (1) | JPS648657A (ja) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2685203B2 (ja) * | 1988-02-22 | 1997-12-03 | 富士通株式会社 | 遅延回路 |
| JPH03283564A (ja) * | 1990-03-30 | 1991-12-13 | Nec Corp | 相補型半導体集積回路装置 |
| JP2621612B2 (ja) * | 1990-08-11 | 1997-06-18 | 日本電気株式会社 | 半導体集積回路 |
| US5041741A (en) * | 1990-09-14 | 1991-08-20 | Ncr Corporation | Transient immune input buffer |
| JP3160586B2 (ja) * | 1999-04-27 | 2001-04-25 | 松下電子工業株式会社 | Cmosインバータ及びそれを用いたスタンダードセル |
| US6674108B2 (en) * | 2000-12-20 | 2004-01-06 | Honeywell International Inc. | Gate length control for semiconductor chip design |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60161655A (ja) * | 1984-02-01 | 1985-08-23 | Hitachi Ltd | 半導体装置 |
| JPS61283157A (ja) * | 1985-06-07 | 1986-12-13 | Nec Corp | Cmos半導体集積回路装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4168442A (en) * | 1975-07-18 | 1979-09-18 | Tokyo Shibaura Electric Co., Ltd. | CMOS FET device with abnormal current flow prevention |
| JPS6153765A (ja) * | 1984-08-23 | 1986-03-17 | Fuji Photo Film Co Ltd | 固体撮像デバイス |
-
1987
- 1987-06-30 JP JP62164324A patent/JPS648657A/ja active Pending
-
1988
- 1988-06-28 US US07/213,105 patent/US4868627A/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60161655A (ja) * | 1984-02-01 | 1985-08-23 | Hitachi Ltd | 半導体装置 |
| JPS61283157A (ja) * | 1985-06-07 | 1986-12-13 | Nec Corp | Cmos半導体集積回路装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4868627A (en) | 1989-09-19 |
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