JPS6487786A - Production of shadow mask - Google Patents

Production of shadow mask

Info

Publication number
JPS6487786A
JPS6487786A JP62244229A JP24422987A JPS6487786A JP S6487786 A JPS6487786 A JP S6487786A JP 62244229 A JP62244229 A JP 62244229A JP 24422987 A JP24422987 A JP 24422987A JP S6487786 A JPS6487786 A JP S6487786A
Authority
JP
Japan
Prior art keywords
film
release
soln
shadow mask
sprayed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62244229A
Other languages
Japanese (ja)
Inventor
Seiji Sago
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP62244229A priority Critical patent/JPS6487786A/en
Publication of JPS6487786A publication Critical patent/JPS6487786A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To prevent the infiltration of a release soln. into a film and to prolong the service life of the release soln. by weakening the adhesion of the film by the release soln. contg. NaOH, and then spraying water to release the film at the time of releasing the film used for the etching of the title shadow mask. CONSTITUTION:Photoresist films 11 and 12 are formed on both sides of a thin metallic sheet 10, and then bored to expose the metal surfaces 13 and 14. A protective film 16 is stuck on one metal surface 14, and a liq. etchant 17 is sprayed on only the other metal surface 13 to form a recess 18. The release soln. contg. NaOH is sprayed on the recess 18 to weaken the adhesion of the film 11, and then water is sprayed to release the film 11. The other metal surface 14 is etched in the same way as before to obtain the opening 21 of the shadow mask, and the film 12 is released in the same way.
JP62244229A 1987-09-30 1987-09-30 Production of shadow mask Pending JPS6487786A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62244229A JPS6487786A (en) 1987-09-30 1987-09-30 Production of shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62244229A JPS6487786A (en) 1987-09-30 1987-09-30 Production of shadow mask

Publications (1)

Publication Number Publication Date
JPS6487786A true JPS6487786A (en) 1989-03-31

Family

ID=17115661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62244229A Pending JPS6487786A (en) 1987-09-30 1987-09-30 Production of shadow mask

Country Status (1)

Country Link
JP (1) JPS6487786A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007028208A1 (en) * 2005-09-08 2007-03-15 Millennium Synfuels, Llc Hybrid energy system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59193275A (en) * 1983-04-15 1984-11-01 Toshiba Corp Manufacture of shadow mask
JPS6070185A (en) * 1983-09-26 1985-04-20 Toshiba Corp Production of shadow mask
JPS6275437A (en) * 1985-09-28 1987-04-07 Nitto Electric Ind Co Ltd Image forming material
JPS63286588A (en) * 1987-05-19 1988-11-24 Toshiba Corp Production of shadow mask

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59193275A (en) * 1983-04-15 1984-11-01 Toshiba Corp Manufacture of shadow mask
JPS6070185A (en) * 1983-09-26 1985-04-20 Toshiba Corp Production of shadow mask
JPS6275437A (en) * 1985-09-28 1987-04-07 Nitto Electric Ind Co Ltd Image forming material
JPS63286588A (en) * 1987-05-19 1988-11-24 Toshiba Corp Production of shadow mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007028208A1 (en) * 2005-09-08 2007-03-15 Millennium Synfuels, Llc Hybrid energy system

Similar Documents

Publication Publication Date Title
EP0784216A3 (en) Method of manufacturing an optical device with a groove accurately formed
KR950000658B1 (en) Forming method of contact hole in semiconductor devices
JPS5669835A (en) Method for forming thin film pattern
JPS5715121A (en) Dynamic pressure type fluid bearing
JPS6483685A (en) Masking method for minute working
JPS5361639A (en) Prevention of adhesion of unvulcanized rubber
JPS6486524A (en) Patterning method for chromium film
JPS5368578A (en) Photo mask
KR19980069952A (en) Manufacturing method of high discrimination aluminum ablation mask
JPS56138941A (en) Forming method of wiring layer
EP0382944A3 (en) Method and structure for preventing wet etchant penetration at the interface between a resist mask and an underlying metal layer
JPS52104063A (en) Production of surface protection film in electronic parts
EP0402482A4 (en) Method of forming pattern
JPS574122A (en) Formation of contact hole
JPS5694647A (en) Forming method for oxidized film
JPS5534661A (en) Manufacture of etching plate
JPS5591977A (en) Dry etching method
JPS6436097A (en) Formation of wiring
Coggins et al. Aluminum Lithium Etchant
JPS5787134A (en) Local etching method
JPS54162460A (en) Electrode forming method
JPS55161545A (en) Mold for lead storage battery grid
JPS574116A (en) Manufacture of semiconductor substrate
JPS54149583A (en) Pattering method for wafer
JPS5655950A (en) Photographic etching method