KR100856105B1 - 다층 자성 안료 및 박 - Google Patents
다층 자성 안료 및 박 Download PDFInfo
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- KR100856105B1 KR100856105B1 KR1020077024998A KR20077024998A KR100856105B1 KR 100856105 B1 KR100856105 B1 KR 100856105B1 KR 1020077024998 A KR1020077024998 A KR 1020077024998A KR 20077024998 A KR20077024998 A KR 20077024998A KR 100856105 B1 KR100856105 B1 KR 100856105B1
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- South Korea
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Images
Classifications
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- C09C2220/00—Methods of preparing the interference pigments
- C09C2220/20—PVD, CVD methods or coating in a gas-phase using a fluidized bed
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- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
Description
Claims (10)
- 제1 및 제2 표면(surface)을 갖는 자성층(22), 및상기 자성층(22)의 제1 표면 위의 제1 반사층(24)을 포함하는 물품으로서,상기 물품은 흡수층이 없으며,상기 제1 반사층(24) 위에 다른 굴절률을 갖는 2개의 유전층을 포함하는 제1 유전성 광학 스택(44)을 포함하는 것을 특징으로 하는 물품.
- 제1항에 있어서, 상기 제1 유전성 광학 스택(44)은1.65 이하의 굴절률을 갖는 2개의 저굴절률 재료층을 포함하는 유전성 광학 스택,1.65 초과의 굴절률을 갖는 2개의 고굴절률 재료층을 포함하는 유전성 광학 스택,1.65 이하의 굴절률을 갖는 저굴절률 재료층 및 1.65 초과의 굴절률을 갖는 고굴절률 재료층의 혼합을 갖는 유전성 광학 스택,1.65 이하의 굴절률을 갖는 저굴절률(L) 재료층 및 1.65 초과의 굴절률을 갖는 고굴절률(H) 재료층의 교번층들(alternating layers)을 갖는 유전성 광학 스택,LH 유전성 광학 스택,HL 유전성 광학 스택,HLHL 유전성 광학 스택,LHLH 유전성 광학 스택,(LHL)n 유전성 광학 스택,(HLH)n 유전성 광학 스택,이들의 배수 및 조합으로 이루어진 군에서 선택된 어느 하나인 것을 특징으로 하는 물품:여기서 n은 1 이상 100 이하의 정수이다.
- 제1항에 있어서, 상기 제1 유전성 광학 스택(44)은굴절률 구배(gradient index of refraction)를 갖도록 형성된 유전성 광학 스택,1.65 이하의 저굴절률에서 1.65 초과의 고굴절률로의 굴절률 구배를 갖는 층들로 형성된 유전성 광학 스택,1.65 초과의 고굴절률에서 1.65 이하의 저굴절률로의 굴절률 구배를 갖는 층들로 형성된 유전성 광학 스택,[1.65 이하의 저굴절률~1.65 초과의 고굴절률~1.65 이하의 저굴절률]n 의 굴절률 구배를 갖는 층들로 형성된 유전성 광학 스택,[1.65 초과의 고굴절률~1.65 이하의 저굴절률~1.65 초과의 고굴절률]n 의 굴절률 구배를 갖는 층들로 형성된 유전성 광학 스택,이들의 반복 및 조합으로 이루어진 군에서 선택된 어느 하나인 것을 특징으로 하는 물품:여기서 n은 1 이상 100 이하의 정수이다.
- 제1항에 있어서, 상기 자성층(22)의 제2 표면 위의 제2 반사층(26) 및상기 제2 반사층(26) 위에 다른 굴절률을 갖는 2개의 유전층을 포함하는 제2 유전성 광학 스택(46)을 더 포함하는 것을 특징으로 하는 물품.
- 제4항에 있어서, 상기 제2 유전성 광학 스택(46)은1.65 이하의 굴절률을 갖는 2개의 저굴절률 재료층을 포함하는 유전성 광학 스택,1.65 초과의 굴절률을 갖는 2개의 고굴절률 재료층을 포함하는 유전성 광학 스택,1.65 이하의 굴절률을 갖는 저굴절률 재료층 및 1.65 초과의 굴절률을 갖는 고굴절률 재료층의 혼합을 갖는 유전성 광학 스택,1.65 이하의 굴절률을 갖는 저굴절률(L) 재료층 및 1.65 초과의 굴절률을 갖는 고굴절률(H) 재료층의 교번층들(alternating layers)을 갖는 유전성 광학 스택,LH 유전성 광학 스택,HL 유전성 광학 스택,HLHL 유전성 광학 스택,LHLH 유전성 광학 스택,(LHL)n 유전성 광학 스택,(HLH)n 유전성 광학 스택,이들의 배수 및 조합으로 이루어진 군에서 선택된 어느 하나인 것을 특징으로 하는 물품:여기서 n은 1 이상 100 이하의 정수이다.
- 제4항에 있어서, 상기 제2 유전성 광학 스택(46)은굴절률 구배(gradient index of refraction)를 갖도록 형성된 유전성 광학 스택,1.65 이하의 저굴절률에서 1.65 초과의 고굴절률로의 굴절률 구배를 갖는 층들로 형성된 유전성 광학 스택,1.65 초과의 고굴절률에서 1.65 이하의 저굴절률로의 굴절률 구배를 갖는 층들로 형성된 유전성 광학 스택,[1.65 이하의 저굴절률~1.65 초과의 고굴절률~1.65 이하의 저굴절률]n 의 굴절률 구배를 갖는 층들로 형성된 유전성 광학 스택,[1.65 초과의 고굴절률~1.65 이하의 저굴절률~1.65 초과의 고굴절률]n 의 굴절률 구배를 갖는 층들로 형성된 유전성 광학 스택,이들의 반복 및 조합으로 이루어진 군에서 선택된 어느 하나인 것을 특징으로 하는 물품:여기서 n은 1 이상 100 이하의 정수이다.
- 제4항에 있어서, 상기 제1 및 제2 반사층(24, 26)은 연속적인 반사층(62)을 형성하는 것을 특징으로 하는 물품.
- 제4항에 있어서, 상기 제1 및 제2 유전성 광학 스택(44, 46)은 연속적인 유전성 광학 스택(84)을 형성하는 것을 특징으로 하는 물품.
- 제1항에 있어서, 상기 제1 유전성 광학 스택(44)은 유전층의 일부이고, 상기 유전층의 나머지 부분은 단일 재료로 형성된 것을 특징으로 하는 물품.
- 안료 매질; 및상기 안료 매질에 분산되어 있는 복수의 안료 박편을 포함하며,상기 안료 박편이 제1항의 물품과 동일한 다층 구조를 갖는 것을 특징으로 하는 안료 조성물.
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|---|---|---|---|
| US09/844,261 | 2001-04-27 | ||
| US09/844,261 US20020160194A1 (en) | 2001-04-27 | 2001-04-27 | Multi-layered magnetic pigments and foils |
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| Application Number | Title | Priority Date | Filing Date |
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| KR1020037014038A Division KR100915147B1 (ko) | 2001-04-27 | 2002-01-16 | 다층 자성 안료 및 박 |
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| KR20070110559A KR20070110559A (ko) | 2007-11-19 |
| KR100856105B1 true KR100856105B1 (ko) | 2008-09-02 |
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| KR1020077024999A Expired - Lifetime KR100856430B1 (ko) | 2001-04-27 | 2002-01-16 | 다층 자성 안료 및 박 |
| KR1020037014038A Expired - Lifetime KR100915147B1 (ko) | 2001-04-27 | 2002-01-16 | 다층 자성 안료 및 박 |
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| AT (2) | ATE557068T1 (ko) |
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| CY (1) | CY1112965T1 (ko) |
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| US7517578B2 (en) * | 2002-07-15 | 2009-04-14 | Jds Uniphase Corporation | Method and apparatus for orienting magnetic flakes |
| US6761959B1 (en) * | 1999-07-08 | 2004-07-13 | Flex Products, Inc. | Diffractive surfaces with color shifting backgrounds |
| US7047883B2 (en) | 2002-07-15 | 2006-05-23 | Jds Uniphase Corporation | Method and apparatus for orienting magnetic flakes |
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| PT1849621E (pt) * | 2000-01-21 | 2014-06-03 | Jds Uniphase Corp | Dispositivos de segurança oticamente variáveis |
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| WO2025261967A1 (en) | 2024-06-20 | 2025-12-26 | Sicpa Holding Sa | Processes for producing optical effect layers |
| WO2026052662A1 (en) | 2024-09-06 | 2026-03-12 | Sicpa Holding Sa | Magnetic devices, magnetic apparatuses and processes for producing optical effect layers comprising oriented non-spherical magnetic or magnetizable pigment particles |
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