KR102000954B1 - 회로 모듈의 제조 방법 및 성막 장치 - Google Patents

회로 모듈의 제조 방법 및 성막 장치 Download PDF

Info

Publication number
KR102000954B1
KR102000954B1 KR1020170067434A KR20170067434A KR102000954B1 KR 102000954 B1 KR102000954 B1 KR 102000954B1 KR 1020170067434 A KR1020170067434 A KR 1020170067434A KR 20170067434 A KR20170067434 A KR 20170067434A KR 102000954 B1 KR102000954 B1 KR 102000954B1
Authority
KR
South Korea
Prior art keywords
circuit module
material layer
covering material
metal film
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020170067434A
Other languages
English (en)
Korean (ko)
Other versions
KR20180007662A (ko
Inventor
타다시 노무라
히데키 신카이
히데오 나카고시
마사히로 이노우에
Original Assignee
가부시키가이샤 무라타 세이사쿠쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 무라타 세이사쿠쇼 filed Critical 가부시키가이샤 무라타 세이사쿠쇼
Publication of KR20180007662A publication Critical patent/KR20180007662A/ko
Application granted granted Critical
Publication of KR102000954B1 publication Critical patent/KR102000954B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H01L23/485
    • H01L21/2855
    • H01L24/27
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/42Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a gas or vapour
    • H10P14/44Physical vapour deposition [PVD]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/013Manufacture or treatment of die-attach connectors

Landscapes

  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
KR1020170067434A 2016-07-13 2017-05-31 회로 모듈의 제조 방법 및 성막 장치 Active KR102000954B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2016-138634 2016-07-13
JP2016138634A JP2018010964A (ja) 2016-07-13 2016-07-13 回路モジュールの製造方法および成膜装置

Publications (2)

Publication Number Publication Date
KR20180007662A KR20180007662A (ko) 2018-01-23
KR102000954B1 true KR102000954B1 (ko) 2019-07-17

Family

ID=60995784

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170067434A Active KR102000954B1 (ko) 2016-07-13 2017-05-31 회로 모듈의 제조 방법 및 성막 장치

Country Status (3)

Country Link
JP (1) JP2018010964A (ja)
KR (1) KR102000954B1 (ja)
CN (1) CN207266393U (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018159590A1 (ja) 2017-02-28 2018-09-07 三菱マテリアル株式会社 銅/セラミックス接合体、絶縁回路基板、及び、銅/セラミックス接合体の製造方法、絶縁回路基板の製造方法
CN113195223A (zh) * 2018-12-20 2021-07-30 琳得科株式会社 端子保护用双面胶带及带电磁波屏蔽膜的半导体装置的制造方法
JP7447493B2 (ja) * 2020-01-07 2024-03-12 株式会社レゾナック 仮固定用の樹脂組成物と樹脂フィルム及び半導体装置の製造方法
US11434561B2 (en) * 2020-03-27 2022-09-06 STATS ChipPAC Pte. Ltd. Cooling device and process for cooling double-sided SiP devices during sputtering

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011151372A (ja) * 2009-12-25 2011-08-04 Murata Mfg Co Ltd 電子部品モジュールの製造方法及び電子部品モジュール
JP2012033636A (ja) * 2010-07-29 2012-02-16 Nitto Denko Corp 加熱剥離シート一体型半導体裏面用フィルム、半導体素子の回収方法、及び半導体装置の製造方法
KR101590593B1 (ko) * 2015-12-03 2016-02-02 제너셈(주) 반도체패키지의 스퍼터링 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014041923A (ja) 2012-08-22 2014-03-06 Ps4 Luxco S A R L 半導体装置の製造方法及び製造装置
KR101704164B1 (ko) * 2014-09-23 2017-02-07 명지대학교 산학협력단 승강 부재, 이를 이용하는 전자파 차단 차폐막 형성 방법 및 그 장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011151372A (ja) * 2009-12-25 2011-08-04 Murata Mfg Co Ltd 電子部品モジュールの製造方法及び電子部品モジュール
JP2012033636A (ja) * 2010-07-29 2012-02-16 Nitto Denko Corp 加熱剥離シート一体型半導体裏面用フィルム、半導体素子の回収方法、及び半導体装置の製造方法
KR101590593B1 (ko) * 2015-12-03 2016-02-02 제너셈(주) 반도체패키지의 스퍼터링 방법

Also Published As

Publication number Publication date
JP2018010964A (ja) 2018-01-18
KR20180007662A (ko) 2018-01-23
CN207266393U (zh) 2018-04-20

Similar Documents

Publication Publication Date Title
JP6527640B2 (ja) キャリア超薄型基板
KR102000954B1 (ko) 회로 모듈의 제조 방법 및 성막 장치
JP7334169B2 (ja) システムインパッケージアセンブリの電磁干渉からのシールド方法
CN110010587B (zh) 半导体装置的制造方法及半导体装置
US20150016066A1 (en) Circuit module and method of producing the same
TW201017835A (en) Chip package and manufacturing method thereof
US20160111375A1 (en) Temporary bonding of packages to carrier for depositing metal layer for shielding
JP5951863B2 (ja) 電子部品モジュール及びその製造方法
CA1210520A (en) Process for manufacturing printed circuits with an individual rigid conductive metallic support
JP2011151372A (ja) 電子部品モジュールの製造方法及び電子部品モジュール
JP6815880B2 (ja) 半導体パッケージの製造方法
US20160268213A1 (en) On Package Floating Metal/Stiffener Grounding to Mitigate RFI and SI Risks
CN102387656A (zh) 具有接地屏蔽结构的电路板及其制作方法
US10051740B2 (en) Wiring substrate and method for manufacturing same
JP6887326B2 (ja) 半導体パッケージの形成方法
CN207820325U (zh) 电路模块的制造装置以及成膜装置
JP2007123506A (ja) 回路モジュールの製造方法
CN113471175A (zh) 共形屏蔽结构及其制备方法
KR20210093490A (ko) 반도체 패키지 스퍼터링용 쉴딩필름 제조방법, 쉴딩필름 제조방법에 의해 제조된 쉴딩필름 및 이를 이용한 반도체 패키지 스퍼터링 방법
JP2016207761A (ja) 実装用基板およびその製造方法
KR20140102144A (ko) 다층배선기판 제조용의 지지기판, 다층배선기판의 제조방법
WO2018123932A1 (ja) 配線基板の個片化方法及びパッケージ用基板
KR102044235B1 (ko) 전자부품의 제조 방법 및 성막 장치
JP6890008B2 (ja) 多数個取り配線基板
CN114899110B (zh) 芯片上屏蔽膜的设置方法和设置结构

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0901 Re-examination

St.27 status event code: A-2-3-E10-E12-rex-PX0901

PX0701 Decision of registration after re-examination

St.27 status event code: A-3-4-F10-F13-rex-PX0701

X701 Decision to grant (after re-examination)
GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000