KR19990077861A - 중합성 조성물 - Google Patents
중합성 조성물 Download PDFInfo
- Publication number
- KR19990077861A KR19990077861A KR1019990008527A KR19990008527A KR19990077861A KR 19990077861 A KR19990077861 A KR 19990077861A KR 1019990008527 A KR1019990008527 A KR 1019990008527A KR 19990008527 A KR19990008527 A KR 19990008527A KR 19990077861 A KR19990077861 A KR 19990077861A
- Authority
- KR
- South Korea
- Prior art keywords
- compound
- thio
- groups
- epoxy compound
- bis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 74
- 150000001875 compounds Chemical class 0.000 claims abstract description 194
- 229920005989 resin Polymers 0.000 claims abstract description 98
- 239000011347 resin Substances 0.000 claims abstract description 98
- 239000004593 Epoxy Substances 0.000 claims abstract description 59
- 125000000446 sulfanediyl group Chemical group *S* 0.000 claims abstract description 54
- 230000003287 optical effect Effects 0.000 claims abstract description 28
- 239000003112 inhibitor Substances 0.000 claims abstract description 20
- 238000004383 yellowing Methods 0.000 claims abstract description 19
- 125000005068 thioepoxy group Chemical group S(O*)* 0.000 claims abstract description 16
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 10
- -1 2,3-epithiopropyl groups Chemical group 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 38
- 239000004033 plastic Substances 0.000 claims description 13
- 229920003023 plastic Polymers 0.000 claims description 13
- 229910052717 sulfur Inorganic materials 0.000 claims description 12
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 11
- 239000011593 sulfur Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 238000005266 casting Methods 0.000 claims 1
- 150000001412 amines Chemical class 0.000 abstract description 8
- 150000003335 secondary amines Chemical class 0.000 abstract description 8
- 150000003141 primary amines Chemical class 0.000 abstract description 7
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 57
- 230000000704 physical effect Effects 0.000 description 41
- 239000003054 catalyst Substances 0.000 description 29
- 238000006116 polymerization reaction Methods 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 14
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 9
- SVYKKECYCPFKGB-UHFFFAOYSA-N N,N-dimethylcyclohexylamine Chemical compound CN(C)C1CCCCC1 SVYKKECYCPFKGB-UHFFFAOYSA-N 0.000 description 8
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 8
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 8
- 239000002685 polymerization catalyst Substances 0.000 description 8
- 239000003607 modifier Substances 0.000 description 7
- 238000000746 purification Methods 0.000 description 7
- 238000010526 radical polymerization reaction Methods 0.000 description 7
- 239000011541 reaction mixture Substances 0.000 description 7
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 6
- 239000007983 Tris buffer Substances 0.000 description 6
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 6
- 230000005484 gravity Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 5
- 239000001294 propane Substances 0.000 description 5
- 125000004055 thiomethyl group Chemical group [H]SC([H])([H])* 0.000 description 5
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 4
- KSJBMDCFYZKAFH-UHFFFAOYSA-N 2-(2-sulfanylethylsulfanyl)ethanethiol Chemical compound SCCSCCS KSJBMDCFYZKAFH-UHFFFAOYSA-N 0.000 description 4
- ZXACHZITICPUKS-UHFFFAOYSA-N 2-[(oxiran-2-ylmethyldisulfanyl)methyl]oxirane Chemical compound C1OC1CSSCC1CO1 ZXACHZITICPUKS-UHFFFAOYSA-N 0.000 description 4
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical class C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 4
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 4
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 125000004386 diacrylate group Chemical group 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 235000005985 organic acids Nutrition 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- CJAAPVQEZPAQNI-UHFFFAOYSA-N (2-methylphenyl)methanamine Chemical compound CC1=CC=CC=C1CN CJAAPVQEZPAQNI-UHFFFAOYSA-N 0.000 description 3
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 3
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 3
- ASUDFOJKTJLAIK-UHFFFAOYSA-N 2-methoxyethanamine Chemical compound COCCN ASUDFOJKTJLAIK-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 3
- 239000002841 Lewis acid Substances 0.000 description 3
- OJGMBLNIHDZDGS-UHFFFAOYSA-N N-Ethylaniline Chemical compound CCNC1=CC=CC=C1 OJGMBLNIHDZDGS-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 3
- 239000001273 butane Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 3
- 238000004043 dyeing Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 3
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920001021 polysulfide Polymers 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- ZNZJJSYHZBXQSM-UHFFFAOYSA-N propane-2,2-diamine Chemical compound CC(C)(N)N ZNZJJSYHZBXQSM-UHFFFAOYSA-N 0.000 description 3
- BHRZNVHARXXAHW-UHFFFAOYSA-N sec-butylamine Chemical compound CCC(C)N BHRZNVHARXXAHW-UHFFFAOYSA-N 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 3
- 150000003573 thiols Chemical class 0.000 description 3
- UGCMFUQMPWJOON-UHFFFAOYSA-N (1-cycloheptylcycloheptyl)methanediamine Chemical compound C1CCCCCC1C1(C(N)N)CCCCCC1 UGCMFUQMPWJOON-UHFFFAOYSA-N 0.000 description 2
- KEJJRKANNZHYOB-UHFFFAOYSA-N 1,3-bis(aminomethyl)cyclohexan-1-amine Chemical compound NCC1CCCC(N)(CN)C1 KEJJRKANNZHYOB-UHFFFAOYSA-N 0.000 description 2
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 description 2
- YULRCQASNYOJHG-UHFFFAOYSA-N 1-hydroxypropyl thiohypochlorite Chemical compound CCC(O)SCl YULRCQASNYOJHG-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- JRKRMWWBDZSDMT-UHFFFAOYSA-N 2-[(thiiran-2-ylmethyldisulfanyl)methyl]thiirane Chemical compound C1SC1CSSCC1CS1 JRKRMWWBDZSDMT-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- SCVJRXQHFJXZFZ-KVQBGUIXSA-N 2-amino-9-[(2r,4s,5r)-4-hydroxy-5-(hydroxymethyl)oxolan-2-yl]-3h-purine-6-thione Chemical compound C1=2NC(N)=NC(=S)C=2N=CN1[C@H]1C[C@H](O)[C@@H](CO)O1 SCVJRXQHFJXZFZ-KVQBGUIXSA-N 0.000 description 2
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- YCLSOMLVSHPPFV-UHFFFAOYSA-N 3-(2-carboxyethyldisulfanyl)propanoic acid Chemical compound OC(=O)CCSSCCC(O)=O YCLSOMLVSHPPFV-UHFFFAOYSA-N 0.000 description 2
- QGHDLJAZIIFENW-UHFFFAOYSA-N 4-[1,1,1,3,3,3-hexafluoro-2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical group C1=C(CC=C)C(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C(CC=C)=C1 QGHDLJAZIIFENW-UHFFFAOYSA-N 0.000 description 2
- DGUJJOYLOCXENZ-UHFFFAOYSA-N 4-[2-[4-(oxiran-2-ylmethoxy)phenyl]propan-2-yl]phenol Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C1=CC=C(O)C=C1 DGUJJOYLOCXENZ-UHFFFAOYSA-N 0.000 description 2
- HRXZRAXKKNUKRF-UHFFFAOYSA-N 4-ethylaniline Chemical compound CCC1=CC=C(N)C=C1 HRXZRAXKKNUKRF-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- 239000004970 Chain extender Substances 0.000 description 2
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- BHHGXPLMPWCGHP-UHFFFAOYSA-N Phenethylamine Chemical compound NCCC1=CC=CC=C1 BHHGXPLMPWCGHP-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- YOAHNDFMRWNINV-UHFFFAOYSA-N [4-[(2,3-diethoxy-4-prop-2-enoyloxyphenyl)methyl]-2,3-diethoxyphenyl] prop-2-enoate Chemical compound C1=CC(OC(=O)C=C)=C(OCC)C(OCC)=C1CC1=CC=C(OC(=O)C=C)C(OCC)=C1OCC YOAHNDFMRWNINV-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- GHWVXCQZPNWFRO-UHFFFAOYSA-N butane-2,3-diamine Chemical compound CC(N)C(C)N GHWVXCQZPNWFRO-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000010538 cationic polymerization reaction Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- WQABCVAJNWAXTE-UHFFFAOYSA-N dimercaprol Chemical compound OCC(S)CS WQABCVAJNWAXTE-UHFFFAOYSA-N 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 2
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
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- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
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- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000012258 stirred mixture Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- VOVUARRWDCVURC-UHFFFAOYSA-N thiirane Chemical compound C1CS1 VOVUARRWDCVURC-UHFFFAOYSA-N 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 235000019303 thiodipropionic acid Nutrition 0.000 description 1
- 125000004014 thioethyl group Chemical group [H]SC([H])([H])C([H])([H])* 0.000 description 1
- RSPCKAHMRANGJZ-UHFFFAOYSA-N thiohydroxylamine Chemical class SN RSPCKAHMRANGJZ-UHFFFAOYSA-N 0.000 description 1
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- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
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- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- IFXORIIYQORRMJ-UHFFFAOYSA-N tribenzylphosphane Chemical compound C=1C=CC=CC=1CP(CC=1C=CC=CC=1)CC1=CC=CC=C1 IFXORIIYQORRMJ-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- IGNTWNVBGLNYDV-UHFFFAOYSA-N triisopropylphosphine Chemical compound CC(C)P(C(C)C)C(C)C IGNTWNVBGLNYDV-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- JQPMDTQDAXRDGS-UHFFFAOYSA-N triphenylalumane Chemical compound C1=CC=CC=C1[Al](C=1C=CC=CC=1)C1=CC=CC=C1 JQPMDTQDAXRDGS-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- VYNGFCUGSYEOOZ-UHFFFAOYSA-N triphenylphosphine sulfide Chemical class C=1C=CC=CC=1P(C=1C=CC=CC=1)(=S)C1=CC=CC=C1 VYNGFCUGSYEOOZ-UHFFFAOYSA-N 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/06—Polythioethers from cyclic thioethers
- C08G75/08—Polythioethers from cyclic thioethers from thiiranes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/34—Compounds containing oxirane rings with hydrocarbon radicals, substituted by sulphur, selenium or tellurium atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D331/00—Heterocyclic compounds containing rings of less than five members, having one sulfur atom as the only ring hetero atom
- C07D331/02—Three-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
- C08G59/302—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Epoxy Resins (AREA)
Abstract
Description
| C | H | O | S | |
| 측정치(%) | 39.0 | 5.4 | 18.5 | 37.1 |
| 계산치(%) | 40.4 | 5.7 | 17.9 | 36.0 |
| C | H | S | |
| 측정치(%) | 32.6 | 4.6 | 62.8 |
| 계산치(%) | 34.2 | 4.8 | 61.0 |
| C | H | S | |
| 측정치(%) | 32.6 | 4.8 | 62.8 |
| 계산치(%) | 34.2 | 4.8 | 61.0 |
| 중합성조성물 | 굴절률(nd) | 압베수 | 비중 | Tg(℃) | |
| 실시예1 | 화합물(B)85%조성물 | 1.737 | 33 | 1.47 | 84 |
| 실시예2 | 화합물(B)94%조성물 | 1.740 | 33 | 1.47 | 95 |
| 실시예3 | 화합물(B)+(C)조성물 | 1.734 | 33 | 1.46 | 81 |
| 실시예4 | 화합물(B)+(D)조성물 | 1.736 | 33 | 1.46 | 88 |
| 실시예5 | 화합물(B)+(A)조성물 | 1.729 | 33 | 1.46 | 92 |
| 실시예6 | 화합물(B)+(E)조성물 | 1.725 | 33 | 1.46 | 78 |
| 실시예7 | 화합물(B)+(F)조성물 | 1.722 | 33 | 1.46 | 79 |
| 실시예8 | 화합물(B)+(G)조성물 | 1.728 | 32 | 1.46 | 77 |
| 비교예1 | 화합물(H)89%조성물 | 1.701 | 36 | 1.41 | 82 |
| 실시예번호 | 조성물 | 아미노/티오에폭시 | 색조변화율 | 굴절률(nd) | 압베수4(νd) | 내열성(Tg,℃) | |
| (a) | (b) | ||||||
| 9 | 화합물(B) | n-프로필아민 | 0.089 | 0.500 | 1.723 | 34 | 81 |
| 10 | 화합물(B) | 이소프로필아민 | 0.089 | 0.516 | 1.720 | 34 | 78 |
| 11 | 화합물(B) | n-부틸아민 | 0.072 | 0.500 | 1.722 | 34 | 79 |
| 12 | 화합물(B) | sec-부틸아민 | 0.072 | 0.548 | 1.722 | 34 | 79 |
| 13 | 화합물(B) | tert-부틸아민 | 0.072 | 0.500 | 1.723 | 34 | 80 |
| 14 | 화합물(B) | n-헥실아민 | 0.052 | 0.468 | 1.722 | 34 | 79 |
| 15 | 화합물(B) | n-옥틸아민 | 0.041 | 0.435 | 1.719 | 34 | 78 |
| 16 | 화합물(B) | n-라우릴아민 | 0.028 | 0.468 | 1.720 | 34 | 77 |
| 17 | 화합물(B) | 메톡시에틸아민 | 0.070 | 0.532 | 1.722 | 33 | 79 |
| 18 | 화합물(B) | 시클로헥실아민 | 0.053 | 0.532 | 1.718 | 34 | 78 |
| 19 | 화합물(B) | 2-아미노에탄올 | 0.043 | 0.468 | 1.723 | 33 | 80 |
| 20 | 화합물(B) | 벤질아민 | 0.049 | 0.484 | 1.727 | 33 | 78 |
| 21 | 화합물(B) | β-페네틸아민 | 0.043 | 0.532 | 1.727 | 33 | 79 |
| 22 | 화합물(B) | 아닐린 | 0.056 | 0.581 | 1.729 | 33 | 79 |
| 23 | 화합물(B) | o-톨루이딘 | 0.049 | 0.581 | 1.728 | 33 | 78 |
| 24 | 화합물(B) | 2-메틸벤질아민 | 0.043 | 0.565 | 1.728 | 33 | 78 |
| 25 | 화합물(B) | α-나프틸아민 | 0.037 | 0.887 | 1.725 | 33 | 78 |
| 26 | 화합물(B) | 에틸렌디아민 | 0.105 | 0.532 | 1.724 | 33 | 77 |
| 27 | 화합물(B) | 디아미노프로판 | 0.085 | 0.532 | 1.725 | 33 | 77 |
| 28 | 화합물(B) | 디아미노부탄 | 0.072 | 0.548 | 1.724 | 33 | 77 |
| 29 | 화합물(B) | 디아미노메틸-비시클로헵탄 | 0.048 | 0.500 | 1.720 | 34 | 81 |
| 30 | 화합물(B) | m-크실릴렌디아민 | 0.046 | 0.565 | 1.726 | 33 | 80 |
| 31 | 화합물(B) | 1,3-디아미노메틸-시클로헥실아민 | 0.044 | 0.484 | 1.722 | 33 | 79 |
| 32 | 화합물(B) | 나프탈렌디아민 | 0.040 | 0.935 | 1.728 | 33 | 79 |
| 33 | 화합물(B) | N,N'-디메틸에틸렌디아민 | 0.071 | 0.532 | 1.722 | 33 | 83 |
| 34 | 화합물(B) | 피페라진 | 0.073 | 0.323 | 1.732 | 33 | 96 |
| 참조예번호 | 조성물 | 작용기/티오에틸기 | 색조변화율 | 굴절률(nd) | 압베수(νd) | 내열성(Tg,℃) | ||
| (a) | 황변억제제 | 경화촉매 | ||||||
| 1 | 화합물(B) | 티오페놀 | DCA | 0.048 | 0.581 | 1.732 | 33 | 72 |
| 2 | 화합물(B) | 비스(메르캅토에틸)술피드 | DCA | 0.068 | 0.516 | 1.733 | 33 | 74 |
Claims (30)
- 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물을 함유한 것을 특징으로 하는 중합성 조성물.
- 제 1항에 있어서, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물은 하기 식(1)로 표시되는 것을 특징으로 하는 중합성 조성물.(식중, X 및 Y는 독립적으로 산소 또는 황이며, 동일 또는 상이해도 됨)
- 제 1항에 있어서, 상기 적어도 1개의 분자내술피드결합을 지닌 (티오)에폭시화합물은, 그 분자내에 적어도 2개의 2,3-에피티오프로필기를 지닌 화합물인 것을 특징으로 하는 중합성 조성물.
- 제 1항에 있어서, 황변억제제로서 분자당 적어도 1개의 NH2기 및/또는 적어도 1개의 NH기를 지닌 화합물군으로부터 선택된 1종이상의 화합물을, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물중의 티오에폭시기 및 에폭시기에 대한 상기 억제제중의 NH2기 및 NH기의 총몰비가 0.001 내지 0.5가 되도록 함유하는 것을 특징으로 하는 중합성 조성물.
- 제 4항에 있어서, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물은 하기 식(1)로 표시되는 것을 특징으로 하는 중합성 조성물.(식중, X 및 Y는 독립적으로 산소 또는 황이며, 동일 또는 상이해도 됨)
- 제 4항에 있어서, 상기 적어도 1개의 분자내술피드결합을 지닌 (티오)에폭시화합물은, 그 분자내에 적어도 2개의 2,3-에피티오프로필기를 지닌 화합물인 것을 특징으로 하는 중합성 조성물.
- 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물을 함유한 중합성 조성물을 경화시켜 제조된 것을 특징으로 하는 수지.
- 제 7항에 있어서, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물은 하기 식(1)로 표시되는 것을 특징으로 하는 수지.(식중, X 및 Y는 독립적으로 산소 또는 황이며, 동일 또는 상이해도 됨)
- 제 7항에 있어서, 상기 적어도 1개의 분자내술피드결합을 지닌 (티오)에폭시화합물은, 그 분자내에 적어도 2개의 2,3-에피티오프로필기를 지닌 화합물인 것을 특징으로 하는 수지.
- 제 7항에 있어서, 황변억제제로서 분자당 적어도 1개의 NH2기 및/또는 적어도 1개의 NH기를 지닌 화합물군으로부터 선택된 1종이상의 화합물을, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물중의 티오에폭시기 및 에폭시기에 대한 상기 억제제중의 NH2기 및 NH기의 총몰비가 0.001 내지 0.5가 되도록 함유하는 것을 특징으로 하는 수지.
- 제 10항에 있어서, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물은 하기 식(1)로 표시되는 것을 특징으로 하는 수지.(식중, X 및 Y는 독립적으로 산소 또는 황이며, 동일 또는 상이해도 됨)
- 제 10항에 있어서, 상기 적어도 1개의 분자내술피드결합을 지닌 (티오)에폭시화합물은, 그 분자내에 적어도 2개의 2,3-에피티오프로필기를 지닌 화합물인 것을 특징으로 하는 수지.
- 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물을 함유한 중합성 조성물을 경화시켜 제조된 수지로 이루어진 것을 특징으로 하는 광학소자.
- 제 13항에 있어서, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물은 하기 식(1)로 표시되는 것을 특징으로 하는 광학소자.(식중, X 및 Y는 독립적으로 산소 또는 황이며, 동일 또는 상이해도 됨)
- 제 13항에 있어서, 상기 적어도 1개의 분자내술피드결합을 지닌 (티오)에폭시화합물은, 그 분자내에 적어도 2개의 2,3-에피티오프로필기를 지닌 화합물인 것을 특징으로 하는 광학소자.
- 제 13항에 있어서, 황변억제제로서 분자당 적어도 1개의 NH2기 및/또는 적어도 1개의 NH기를 지닌 화합물군으로부터 선택된 1종이상의 화합물을, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물중의 티오에폭시기 및 에폭시기에 대한 상기 억제제중의 NH2기 및 NH기의 총몰비가 0.001 내지 0.5가 되도록 함유하는 것을 특징으로 하는 광학소자.
- 제 16항에 있어서, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물은 하기 식(1)로 표시되는 것을 특징으로 하는 광학소자.(식중, X 및 Y는 독립적으로 산소 또는 황이며, 동일 또는 상이해도 됨)
- 제 16항에 있어서, 상기 적어도 1개의 분자내술피드결합을 지닌 (티오)에폭시화합물은, 그 분자내에 적어도 2개의 2,3-에피티오프로필기를 지닌 화합물인 것을 특징으로 하는 광학소자.
- 제 13항 기재의 광학소자의 플라스틱렌즈로서의 용도.
- 제 14항 기재의 광학소자의 플라스틱렌즈로서의 용도.
- 제 15항 기재의 광학소자의 플라스틱렌즈로서의 용도.
- 제 16항 기재의 광학소자의 플라스틱렌즈로서의 용도.
- 제 17항 기재의 광학소자의 플라스틱렌즈로서의 용도.
- 제 18항 기재의 광학소자의 플라스틱렌즈로서의 용도.
- 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물을 함유한 중합성 조성물을 주형주합하는 공정을 구비한 것을 특징으로 하는 수지의 제조방법.
- 제 25항에 있어서, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물은 하기 식(1)로 표시되는 것을 특징으로 하는 수지의 제조방법.(식중, X 및 Y는 독립적으로 산소 또는 황이며, 동일 또는 상이해도 됨)
- 제 25항에 있어서, 상기 적어도 1개의 분자내술피드결합을 지닌 (티오)에폭시화합물은, 그 분자내에 적어도 2개의 2,3-에피티오프로필기를 지닌 화합물인 것을 특징으로 하는 수지의 제조방법.
- 제 25항에 있어서, 황변억제제로서 분자당 적어도 1개의 NH2기 및/또는 적어도 1개의 NH기를 지닌 화합물군으로부터 선택된 1종이상의 화합물을, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물중의 티오에폭시기 및 에폭시기에 대한 상기 억제제중의 NH2기 및 NH기의 총몰비가 0.001 내지 0.5가 되도록 함유하는 것을 특징으로 하는 수지의 제조방법.
- 제 28항에 있어서, 상기 적어도 1개의 분자내디술피드결합을 지닌 (티오)에폭시화합물은 하기 식(1)로 표시되는 것을 특징으로 하는 수지의 제조방법.(식중, X 및 Y는 독립적으로 산소 또는 황이며, 동일 또는 상이해도 됨)
- 제 28항에 있어서, 상기 적어도 1개의 분자내술피드결합을 지닌 (티오)에폭시화합물은, 그 분자내에 적어도 2개의 2,3-에피티오프로필기를 지닌 화합물인 것을 특징으로 하는 수지의 제조방법.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6340298 | 1998-03-13 | ||
| JP1998-63402 | 1998-03-13 | ||
| JP03024699A JP3373800B2 (ja) | 1999-02-08 | 1999-02-08 | 新規な光学用樹脂 |
| JP1999-30246 | 1999-02-08 |
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| KR19990077861A true KR19990077861A (ko) | 1999-10-25 |
| KR100324408B1 KR100324408B1 (ko) | 2002-02-27 |
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| US (3) | US6204311B1 (ko) |
| EP (1) | EP0942027B1 (ko) |
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- 1999-03-13 KR KR1019990008527A patent/KR100324408B1/ko not_active Expired - Lifetime
- 1999-03-15 EP EP99301965A patent/EP0942027B1/en not_active Expired - Lifetime
- 1999-03-15 DE DE69925322T patent/DE69925322T2/de not_active Expired - Lifetime
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2000
- 2000-12-26 US US09/745,448 patent/US6300464B2/en not_active Expired - Lifetime
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| Publication number | Publication date |
|---|---|
| US20020019511A1 (en) | 2002-02-14 |
| DE69925322T2 (de) | 2005-10-27 |
| US6458917B2 (en) | 2002-10-01 |
| DE69925322D1 (de) | 2005-06-23 |
| US20010002413A1 (en) | 2001-05-31 |
| EP0942027A3 (en) | 2002-02-27 |
| US6300464B2 (en) | 2001-10-09 |
| EP0942027A2 (en) | 1999-09-15 |
| KR100324408B1 (ko) | 2002-02-27 |
| EP0942027B1 (en) | 2005-05-18 |
| US6204311B1 (en) | 2001-03-20 |
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