KR20020007429A - 노즐 플레이트의 제조방법 - Google Patents
노즐 플레이트의 제조방법 Download PDFInfo
- Publication number
- KR20020007429A KR20020007429A KR1020000040090A KR20000040090A KR20020007429A KR 20020007429 A KR20020007429 A KR 20020007429A KR 1020000040090 A KR1020000040090 A KR 1020000040090A KR 20000040090 A KR20000040090 A KR 20000040090A KR 20020007429 A KR20020007429 A KR 20020007429A
- Authority
- KR
- South Korea
- Prior art keywords
- crater
- nozzle
- nozzle plate
- layer
- water repellent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000000463 material Substances 0.000 claims abstract description 35
- 239000005871 repellent Substances 0.000 claims abstract description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 230000002940 repellent Effects 0.000 claims abstract description 21
- 238000007747 plating Methods 0.000 claims abstract description 20
- 239000004642 Polyimide Substances 0.000 claims abstract description 15
- 229920001721 polyimide Polymers 0.000 claims abstract description 15
- 238000000059 patterning Methods 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 abstract description 25
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 3
- 238000000206 photolithography Methods 0.000 abstract description 3
- 230000036211 photosensitivity Effects 0.000 abstract description 3
- 239000002184 metal Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000007517 polishing process Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- -1 nickel Chemical class 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
Claims (1)
- 노즐 및 노즐 플레이트를 형성하는 단계;상기 노즐 플레이트의 하부에 폴리이미드계 물질로 된 크레이터층을 형성하는 단계;상기 크레이터층을 패터닝하는 단계;상기 패터닝된 크레이터층을 노광하여 크레이터부분의 폴리이미드계 물질을 제거함으로써 크레이터를 형성하는 단계; 및크레이터가 형성된 노즐 플레이트에 발수물질을 도금함으로써 크레이터 안쪽에만 발수처리를 하는 단계를 포함하는 노즐 플레이트의 제조방법.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020000040090A KR20020007429A (ko) | 2000-07-13 | 2000-07-13 | 노즐 플레이트의 제조방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020000040090A KR20020007429A (ko) | 2000-07-13 | 2000-07-13 | 노즐 플레이트의 제조방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20020007429A true KR20020007429A (ko) | 2002-01-29 |
Family
ID=19677747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020000040090A Ceased KR20020007429A (ko) | 2000-07-13 | 2000-07-13 | 노즐 플레이트의 제조방법 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR20020007429A (ko) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0725015A (ja) * | 1993-07-08 | 1995-01-27 | Seiko Epson Corp | インクジェットプリンター及びその製造方法 |
| JPH09156116A (ja) * | 1995-12-11 | 1997-06-17 | Seiko Epson Corp | インクジェット式記録装置 |
| JPH11115191A (ja) * | 1997-10-15 | 1999-04-27 | Seiko Epson Corp | インクジェット式記録ヘッド |
-
2000
- 2000-07-13 KR KR1020000040090A patent/KR20020007429A/ko not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0725015A (ja) * | 1993-07-08 | 1995-01-27 | Seiko Epson Corp | インクジェットプリンター及びその製造方法 |
| JPH09156116A (ja) * | 1995-12-11 | 1997-06-17 | Seiko Epson Corp | インクジェット式記録装置 |
| JPH11115191A (ja) * | 1997-10-15 | 1999-04-27 | Seiko Epson Corp | インクジェット式記録ヘッド |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20000713 |
|
| PA0201 | Request for examination | ||
| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20020130 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20020930 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20020130 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |