KR20080102425A - 마그네슘 증발용 마그네슘-구리 조성물의 용도 및 마그네슘분배기 - Google Patents
마그네슘 증발용 마그네슘-구리 조성물의 용도 및 마그네슘분배기 Download PDFInfo
- Publication number
- KR20080102425A KR20080102425A KR1020087024640A KR20087024640A KR20080102425A KR 20080102425 A KR20080102425 A KR 20080102425A KR 1020087024640 A KR1020087024640 A KR 1020087024640A KR 20087024640 A KR20087024640 A KR 20087024640A KR 20080102425 A KR20080102425 A KR 20080102425A
- Authority
- KR
- South Korea
- Prior art keywords
- magnesium
- evaporation
- copper composition
- container
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C23/00—Alloys based on magnesium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C23/00—Alloys based on magnesium
- C22C23/02—Alloys based on magnesium with aluminium as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Electroluminescent Light Sources (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
Claims (14)
- 마그네슘 증발용 마그네슘-구리 조성물의 용도로서,상기 조성물은 43.34 중량% 까지의 마그네슘을 함유하는,마그네슘 증발용 마그네슘-구리 조성물의 용도.
- 제 1 항에 있어서,상기 조성물은 적어도 10 중량%의 마그네슘을 함유하는,마그네슘 증발용 마그네슘-구리 조성물의 용도.
- 제 2 항에 있어서,상기 마그네슘-구리 조성물은 MgCu2 화합물인,마그네슘 증발용 마그네슘-구리 조성물의 용도.
- 제 2 항에 있어서,상기 마그네슘-구리 조성물은 Mg2Cu 화합물인,마그네슘 증발용 마그네슘-구리 조성물의 용도.
- 제 1 항 내지 제 4 항에 따른 조성물 또는 화합물 중 하나의 용도로서,상기 조성물은 분말 형태인,마그네슘 증발용 마그네슘-구리 조성물의 용도.
- 제 5 항에 있어서,상기 분말은 알약 형태인,마그네슘 증발용 마그네슘-구리 조성물의 용도.
- 제 5 항에 있어서,상기 분말은 1 mm 이하의 입도를 가지는,마그네슘 증발용 마그네슘-구리 조성물의 용도.
- 제 7 항에 있어서,상기 분말은 500 ㎛ 이하의 입도를 가지는,마그네슘 증발용 마그네슘-구리 조성물의 용도.
- 제 8 항에 있어서,상기 분말은 10 내지 128 ㎛ 범위의 입도를 가지는,마그네슘 증발용 마그네슘-구리 조성물의 용도.
- 컨테이너(11,12,21)로 구성되는 마그네슘 분배기로서,상기 컨테이너는 마그네슘 증기를 유출시키기 위한 구멍 또는 기공(13,13',...23)들이 제공된 벽의 적어도 일부분이 노출되며, 상기 컨테이너의 내측에는 제 1 항에 따른 용도를 위한 마그네슘-구리 조성물(14,25)들 중의 하나가 제공되는,마그네슘 분배기.
- 제 10 항에 있어서,상기 컨테이너는 금속, 금속 합금, 세라믹 또는 흑연으로 제조되는,마그네슘 분배기.
- 제 11 항에 있어서,상기 컨테이너는 몰리브덴, 탄탈, 텅스텐, 니켈 중에서 선택되는 금속, 또는 스틸과 니켈-크롬 합금 중에서 선택되는 합금으로 제조되는,마그네슘 분배기.
- 제 12 항에 있어서,상기 분배기는 마그네슘 증기의 유출을 위한 복수의 구멍(13,13',...)이 제공된 상부(11), 및 공동이 제공되어 있는 상부(12)를 접합함으로써 형성되는 컨테이너로 구성되며, 상기 공동의 중앙 영역의 내측에는 가루분 또는 알약 형태의 마그네슘-구리 조성물(14)이 수용되며, 상기 분배기에는 전기 터미널과의 연결에 적합한 두 개의 연장 단부(15,15')가 제공되는,마그네슘 분배기.
- 제 12 항에 있어서,상기 분배기는 하나 또는 그 이상의 제 1 구멍(23)을 갖는 컨테이너(21), 및 금속 차폐물(22)로 구성되며, 상기 제 1 구멍의 내측에는 상기 마그네슘-구리 조성물이 가루분 또는 알약의 형태로 존재하며, 상기 컨테이너를 에워싸고 있는 상기 차폐물은 컨테이너를 가열하기 위한 전기 단자의 통행을 위해 측면 구멍으로부터 기껏해야 이격되어 있으며 상기 제 1 구멍과 대향하는 하나 또는 그 이상의 제 2 구멍(24)을 포함하는,마그네슘 분배기.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT000444A ITMI20060444A1 (it) | 2006-03-13 | 2006-03-13 | Uso di composizioni magnesio-rame per l'evaporazione di magnesio e dispensatori di magnesio |
| ITMI2006A000444 | 2006-03-13 | ||
| PCT/IT2007/000181 WO2007105252A1 (en) | 2006-03-13 | 2007-03-12 | Use of magnesium-copper compositions for the evaporation of magnesium and magnesium dispensers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20080102425A true KR20080102425A (ko) | 2008-11-25 |
| KR101382538B1 KR101382538B1 (ko) | 2014-04-07 |
Family
ID=39877970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020087024640A Active KR101382538B1 (ko) | 2006-03-13 | 2007-03-12 | 마그네슘 증발용 마그네슘-구리 조성물 사용 방법 및 마그네슘 분배기 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US8029597B2 (ko) |
| EP (1) | EP1996743B1 (ko) |
| JP (1) | JP5118689B2 (ko) |
| KR (1) | KR101382538B1 (ko) |
| CN (1) | CN101448970B (ko) |
| AT (1) | ATE467697T1 (ko) |
| DE (1) | DE602007006443D1 (ko) |
| ES (1) | ES2343337T3 (ko) |
| IT (1) | ITMI20060444A1 (ko) |
| TW (1) | TWI397594B (ko) |
| WO (1) | WO2007105252A1 (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITMI20112051A1 (it) * | 2011-11-11 | 2013-05-12 | Getters Spa | Composizione organico-inorganica per il rilascio in fase vapore di metalli alcalini ed alcalino-terrosi |
| KR102056100B1 (ko) * | 2016-04-01 | 2019-12-17 | 주식회사 엘지화학 | 3d 프린팅 방법 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3579459A (en) * | 1966-12-13 | 1971-05-18 | Getters Spa | Metal vapor generating compositions |
| DE1945508B2 (de) * | 1968-09-13 | 1971-06-09 | Vorrichtung zum freisetzen von metalldaempfen | |
| GB1274528A (en) * | 1968-09-13 | 1972-05-17 | Getters Spa | Improvements in or relating to metal vapour generators |
| US3663121A (en) * | 1969-05-24 | 1972-05-16 | Getters Spa | Generation of metal vapors |
| US4233936A (en) * | 1979-05-08 | 1980-11-18 | Rca Corporation | Alkali metal dispenser |
| FR2611746B1 (fr) * | 1987-03-06 | 1989-06-30 | Centre Nat Etd Spatiales | Dispositif d'evaporation sous vide d'un metal en continu |
| JPH03170661A (ja) * | 1989-11-27 | 1991-07-24 | Kobe Steel Ltd | 昇華性金属の蒸発方法 |
| JPH08269696A (ja) * | 1995-03-28 | 1996-10-15 | Nisshin Steel Co Ltd | Mgの蒸発方法 |
| JPH08283942A (ja) * | 1995-04-14 | 1996-10-29 | Ishikawajima Harima Heavy Ind Co Ltd | 昇華性金属材料の蒸発方法 |
| CN1108730C (zh) * | 1996-09-04 | 2003-05-14 | 剑桥显示技术有限公司 | 改进阴极的有机光发射器件 |
| JPH10270171A (ja) * | 1997-01-27 | 1998-10-09 | Junji Kido | 有機エレクトロルミネッセント素子 |
| ITMI20010995A1 (it) | 2001-05-15 | 2002-11-15 | Getters Spa | Dispensatori di cesio e processo per il loro uso |
| US6770502B2 (en) * | 2002-04-04 | 2004-08-03 | Eastman Kodak Company | Method of manufacturing a top-emitting OLED display device with desiccant structures |
| EP1422281A1 (en) * | 2002-11-19 | 2004-05-26 | Ciba SC Holding AG | Organic electroluminescent element |
| JP4400570B2 (ja) * | 2003-10-02 | 2010-01-20 | 株式会社豊田自動織機 | 電界発光素子 |
| US7790890B2 (en) * | 2004-03-31 | 2010-09-07 | Konica Minolta Holdings, Inc. | Organic electroluminescence element material, organic electroluminescence element, display device and illumination device |
| NL1026214C2 (nl) * | 2004-05-18 | 2005-11-21 | Otb Group Bv | Werkwijze en inrichting voor opbrengen van een actieve stof op een substraat. |
| ITMI20042279A1 (it) * | 2004-11-24 | 2005-02-24 | Getters Spa | Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli |
-
2006
- 2006-03-13 IT IT000444A patent/ITMI20060444A1/it unknown
-
2007
- 2007-03-09 TW TW096108274A patent/TWI397594B/zh active
- 2007-03-12 KR KR1020087024640A patent/KR101382538B1/ko active Active
- 2007-03-12 DE DE602007006443T patent/DE602007006443D1/de active Active
- 2007-03-12 US US12/282,758 patent/US8029597B2/en active Active
- 2007-03-12 AT AT07736686T patent/ATE467697T1/de active
- 2007-03-12 JP JP2009500007A patent/JP5118689B2/ja active Active
- 2007-03-12 EP EP07736686A patent/EP1996743B1/en active Active
- 2007-03-12 WO PCT/IT2007/000181 patent/WO2007105252A1/en not_active Ceased
- 2007-03-12 ES ES07736686T patent/ES2343337T3/es active Active
- 2007-03-12 CN CN2007800088701A patent/CN101448970B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| DE602007006443D1 (de) | 2010-06-24 |
| CN101448970A (zh) | 2009-06-03 |
| ATE467697T1 (de) | 2010-05-15 |
| US8029597B2 (en) | 2011-10-04 |
| TWI397594B (zh) | 2013-06-01 |
| EP1996743A1 (en) | 2008-12-03 |
| JP2009530491A (ja) | 2009-08-27 |
| US20090266201A1 (en) | 2009-10-29 |
| TW200745358A (en) | 2007-12-16 |
| WO2007105252A1 (en) | 2007-09-20 |
| ITMI20060444A1 (it) | 2007-09-14 |
| JP5118689B2 (ja) | 2013-01-16 |
| WO2007105252A8 (en) | 2008-10-16 |
| EP1996743B1 (en) | 2010-05-12 |
| ES2343337T3 (es) | 2010-07-28 |
| CN101448970B (zh) | 2011-03-09 |
| KR101382538B1 (ko) | 2014-04-07 |
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