KR20170106321A - 성막 장치, 코팅막 부착 절삭 공구의 제조 방법 - Google Patents
성막 장치, 코팅막 부착 절삭 공구의 제조 방법 Download PDFInfo
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- KR20170106321A KR20170106321A KR1020177019043A KR20177019043A KR20170106321A KR 20170106321 A KR20170106321 A KR 20170106321A KR 1020177019043 A KR1020177019043 A KR 1020177019043A KR 20177019043 A KR20177019043 A KR 20177019043A KR 20170106321 A KR20170106321 A KR 20170106321A
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C14/505—Substrate holders for rotation of the substrates
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
- C23C16/4588—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically the substrate being rotated
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23C2200/00—Details of milling cutting inserts
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Abstract
Description
도 2 는, 실시형태에 관련된 성막 장치의 내부 구조를 나타내는 상면도.
도 3 은, 반송 캐리어의 구조를 나타내는 측면도.
도 4 는, 절삭 공구 (W) 의 지지 양태를 나타내는 도면.
도 5 는, 회전 기구 및 바이어스 전압 인가 기구를 설명하기 위한 성막실의 부분 단면도.
도 6 은, 회전 동작을 설명하기 위한 성막실의 상면도.
도 7 은, 실시형태의 성막 장치에 있어서의 반송 캐리어의 바이어스 전압의 변화를 나타내는 그래프.
도 8 은, 아암 부재와 바이어스 전원이 접속되어 있지 않은 구성에 있어서의 반송 캐리어의 바이어스 전압의 변화를 나타내는 그래프.
17 : 바이어스 전원,
32a, 32b : 반송 롤러,
34, 35 : 간섭 부재,
36 : 절연 부재,
38, 39 : 아암 부재,
80 : 반송 캐리어,
82 : 로드,
86 : 돌출 부재,
100 : 성막 장치,
31 : 롤러 컨베이어 (반송 장치),
D : 성막 영역,
W : 절삭 공구,
C1, C2 : 캐리어 대기 영역,
H1, H2 : 가열 영역
Claims (12)
- 피성막물에 코팅막을 형성하는 성막 영역을 갖는 성막실과, 상기 피성막물을 지지한 반송 캐리어를 반송하는 반송 장치와, 상기 반송 캐리어를 통해서 상기 피성막물에 바이어스 전압을 인가하는 바이어스 전원을 구비하고, 상기 피성막물에 바이어스 전압을 인가하면서 상기 반송 캐리어를 상기 성막 영역에 통과시킴으로써 상기 코팅막을 형성하는 성막 장치로서,
상기 반송 캐리어에는, 상기 피성막물을 지지하여 축 둘레로 회전하는 복수의 로드가 기립 자세로 캐리어 반송 방향을 따라서 배치되고,
상기 로드의 외주면에 직경 방향 외측으로 돌출되는 돌출 부재가 형성되고,
상기 성막실의 벽면에, 상기 성막실 내를 이동하는 상기 반송 캐리어의 상기 돌출 부재를 걸어 상기 로드를 축 둘레로 회전시키는 간섭 부재가 절연 부재를 개재하여 형성되고,
상기 간섭 부재와 상기 바이어스 전원은 전기적으로 접속되어 있는, 성막 장치. - 제 1 항에 있어서,
상기 반송 장치는, 상기 반송 캐리어의 반송 방향을 따라서 배치된 복수의 반송 롤러를 갖고,
상기 간섭 부재와 상기 바이어스 전원이, 1 개 또는 복수의 상기 반송 롤러를 개재하여 전기적으로 접속되어 있는, 성막 장치. - 제 1 항 또는 제 2 항에 있어서,
상기 간섭 부재는, 상기 성막 영역 내를 통과하는 상기 로드를 회전시키는 위치에 형성되어 있는, 성막 장치. - 제 3 항에 있어서,
상기 간섭 부재는, 상기 캐리어 반송 방향에 있어서의 상기 성막 영역의 중앙부에 있어서 상기 로드를 회전시키는, 성막 장치. - 제 1 항 내지 제 4 항 중 어느 한 항에 있어서,
상기 로드의 둘레 방향에 등간격으로 복수의 상기 돌출 부재가 형성되어 있는, 성막 장치. - 제 1 항 내지 제 5 항 중 어느 한 항에 있어서,
상기 성막실은, 상기 성막 영역에 대해서 캐리어 반송 방향으로 서로 이웃하여 배치되고 상기 피성막물을 상기 성막 영역에 진입하기 전에 가열하는 가열 영역과, 상기 성막 영역과 상기 성막실의 단부 사이에 상기 반송 캐리어를 수용하는 캐리어 대기 영역을 갖는, 성막 장치. - 제 6 항에 있어서,
상기 캐리어 반송 방향에 있어서의 상기 성막 영역의 양측에 상기 가열 영역이 형성되어 있는, 성막 장치. - 피성막물에 코팅막을 형성하는 성막실과, 상기 피성막물을 지지한 반송 캐리어를 반송하는 반송 장치와, 상기 반송 캐리어를 통해서 상기 피성막물에 바이어스 전압을 인가하는 바이어스 전원을 구비하고, 상기 반송 캐리어에는, 상기 피성막물을 지지하여 축 둘레로 회전하는 복수의 로드가 기립 자세로 캐리어 반송 방향을 따라서 배치되고, 상기 로드의 외주면에 직경 방향 외측으로 돌출되는 돌출 부재가 형성되고, 상기 성막실의 벽면에 상기 돌출 부재를 걸어 상기 로드를 축 둘레로 회전시키는 간섭 부재가 형성된 성막 장치를 사용하는 코팅막 부착 절삭 공구의 제조 방법으로서,
상기 절삭 공구를 반송 캐리어에 탑재하는 공정과,
상기 성막실 내에서 상기 반송 캐리어를 반송하여 상기 성막 영역을 통과시키는 공정과,
상기 절삭 공구와 상기 간섭 부재에 상기 바이어스 전압을 인가한 상태에서, 상기 간섭 부재와 상기 돌출 부재를 간섭시켜, 상기 로드를 회전시키는 공정을 포함하는, 코팅막 부착 절삭 공구의 제조 방법. - 제 8 항에 있어서,
상기 성막 영역 내를 통과 중인 상기 로드를 회전시키는, 코팅막 부착 절삭 공구의 제조 방법. - 제 9 항에 있어서,
상기 캐리어 반송 방향에 있어서의 상기 성막 영역의 중앙부에 있어서 상기 로드를 회전시키는, 코팅막 부착 절삭 공구의 제조 방법. - 제 8 항 내지 제 10 항 중 어느 한 항에 있어서,
상기 성막실 내에서 상기 반송 캐리어를 반송하여, 상기 절삭 공구를 가열하는 가열 영역과 상기 성막 영역을 순차적으로 통과시키는, 코팅막 부착 절삭 공구의 제조 방법. - 제 11 항에 있어서,
상기 성막 영역에 대해서 상기 반송 캐리어의 반송 방향의 양측에 각각 상기 가열 영역을 배치하고, 복수의 상기 가열 영역과 상기 성막 영역을 포함하는 영역에 대해서 상기 반송 캐리어를 왕복 이동시킴으로써 상기 절삭 공구 상에 복수 층의 코팅막을 형성하는, 코팅막 부착 절삭 공구의 제조 방법.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2015-012602 | 2015-01-26 | ||
| JP2015012602A JP5896047B1 (ja) | 2015-01-26 | 2015-01-26 | 成膜装置、コーティング膜付き切削工具の製造方法 |
| PCT/JP2015/052763 WO2016121121A1 (ja) | 2015-01-26 | 2015-01-30 | 成膜装置、コーティング膜付き切削工具の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20170106321A true KR20170106321A (ko) | 2017-09-20 |
| KR102319219B1 KR102319219B1 (ko) | 2021-10-28 |
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| US (1) | US20180016674A1 (ko) |
| EP (1) | EP3252185B1 (ko) |
| JP (1) | JP5896047B1 (ko) |
| KR (1) | KR102319219B1 (ko) |
| CN (1) | CN107208260B (ko) |
| WO (1) | WO2016121121A1 (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200090209A (ko) * | 2017-12-27 | 2020-07-28 | 캐논 아네르바 가부시키가이샤 | 성막 방법 및 성막 장치 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119072557A (zh) * | 2022-02-15 | 2024-12-03 | 因特瓦克公司 | 用于制造厚型多层电介质膜的系统和方法 |
| CN117305792B (zh) * | 2023-10-07 | 2025-08-15 | 拓荆创益(沈阳)半导体设备有限公司 | 一种薄膜沉积装置、方法及存储介质 |
Citations (4)
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|---|---|---|---|---|
| JPS59190359A (ja) * | 1983-01-19 | 1984-10-29 | マルチ−ア−ク・バキユ−ム・システムズ・インコ−ポレ−テツド | 真空蒸着装置の基体保持装置 |
| JPH06322537A (ja) | 1993-05-14 | 1994-11-22 | Kobe Steel Ltd | 被処理物回転機構を有するイオンプレーティング装置 |
| JP2001254171A (ja) * | 2000-03-13 | 2001-09-18 | Nissin Electric Co Ltd | アーク式イオンプレーティング装置 |
| KR20130080034A (ko) * | 2010-11-15 | 2013-07-11 | 가부시키가이샤 아루박 | 성막 장치 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4485709A (en) * | 1981-04-06 | 1984-12-04 | The Boeing Company | Apparatus for punching holes in a moving strip |
| JPS6210267A (ja) * | 1985-07-05 | 1987-01-19 | Seiko Electronic Components Ltd | イオンプレーティング装置 |
| US5961798A (en) * | 1996-02-13 | 1999-10-05 | Diamond Black Technologies, Inc. | System and method for vacuum coating of articles having precise and reproducible positioning of articles |
| JPH10140351A (ja) * | 1996-11-05 | 1998-05-26 | Kobe Steel Ltd | インライン式真空成膜装置 |
| JP4447279B2 (ja) * | 2003-10-15 | 2010-04-07 | キヤノンアネルバ株式会社 | 成膜装置 |
| JP5664814B1 (ja) * | 2014-06-24 | 2015-02-04 | 三菱マテリアル株式会社 | コーティング膜付き切削工具の成膜装置、切削工具用コーティング膜の成膜方法 |
-
2015
- 2015-01-26 JP JP2015012602A patent/JP5896047B1/ja active Active
- 2015-01-30 US US15/545,841 patent/US20180016674A1/en not_active Abandoned
- 2015-01-30 WO PCT/JP2015/052763 patent/WO2016121121A1/ja not_active Ceased
- 2015-01-30 KR KR1020177019043A patent/KR102319219B1/ko active Active
- 2015-01-30 CN CN201580074334.6A patent/CN107208260B/zh active Active
- 2015-01-30 EP EP15880017.7A patent/EP3252185B1/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59190359A (ja) * | 1983-01-19 | 1984-10-29 | マルチ−ア−ク・バキユ−ム・システムズ・インコ−ポレ−テツド | 真空蒸着装置の基体保持装置 |
| JPH06322537A (ja) | 1993-05-14 | 1994-11-22 | Kobe Steel Ltd | 被処理物回転機構を有するイオンプレーティング装置 |
| JP2001254171A (ja) * | 2000-03-13 | 2001-09-18 | Nissin Electric Co Ltd | アーク式イオンプレーティング装置 |
| KR20130080034A (ko) * | 2010-11-15 | 2013-07-11 | 가부시키가이샤 아루박 | 성막 장치 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200090209A (ko) * | 2017-12-27 | 2020-07-28 | 캐논 아네르바 가부시키가이샤 | 성막 방법 및 성막 장치 |
| US11289305B2 (en) | 2017-12-27 | 2022-03-29 | Canon Anelva Corporation | Deposition method and deposition apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107208260A (zh) | 2017-09-26 |
| JP2016138298A (ja) | 2016-08-04 |
| CN107208260B (zh) | 2019-07-19 |
| WO2016121121A1 (ja) | 2016-08-04 |
| EP3252185A1 (en) | 2017-12-06 |
| US20180016674A1 (en) | 2018-01-18 |
| EP3252185A4 (en) | 2018-10-24 |
| EP3252185B1 (en) | 2020-11-04 |
| KR102319219B1 (ko) | 2021-10-28 |
| JP5896047B1 (ja) | 2016-03-30 |
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