KR910013565A - 래터럴형 반도체장치 - Google Patents
래터럴형 반도체장치 Download PDFInfo
- Publication number
- KR910013565A KR910013565A KR1019900021727A KR900021727A KR910013565A KR 910013565 A KR910013565 A KR 910013565A KR 1019900021727 A KR1019900021727 A KR 1019900021727A KR 900021727 A KR900021727 A KR 900021727A KR 910013565 A KR910013565 A KR 910013565A
- Authority
- KR
- South Korea
- Prior art keywords
- insulator layer
- layer
- semiconductor
- annular
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/60—Lateral BJTs
Landscapes
- Bipolar Transistors (AREA)
- Element Separation (AREA)
- Bipolar Integrated Circuits (AREA)
Abstract
Description
Claims (1)
- 제1도전형을 나타내는 반도체기판(20)과, 이 반도체기판에 형성되는 반대도전형의 매립영역(21), 상기 반도체기판에 퇴적하는 매립영역보다 저농도인 반대도전형 반도체층(22), 이 반대도전형 반도체층을 둘러싸도록 형성하는 분리용 절연물층(23), 이 절연물층으로부터 노출되는 반대도전형 반도체층 표면을 향해 연장되며 두께가 분리용 절연물층보다 얇은 제1환상 절연물층(26), 그 내부에 노출되는 반대도전형 반도체층에 형성하며 두께가 제1환상 절연물층과 동일한 제2절연물층(27), 제1 및 제2 절연물층의 단부에 인접되게 형성하는 제1도전형의 제1 및 제2 환상 불순물영역(24,25)을 구비하여 구성된 것을 특징으로 하는 래터럴형 반도체장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1-342408 | 1989-12-28 | ||
| JP1342408A JPH03201564A (ja) | 1989-12-28 | 1989-12-28 | ラテラル型半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR910013565A true KR910013565A (ko) | 1991-08-08 |
Family
ID=18353500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019900021727A Abandoned KR910013565A (ko) | 1989-12-28 | 1990-12-26 | 래터럴형 반도체장치 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0435308A1 (ko) |
| JP (1) | JPH03201564A (ko) |
| KR (1) | KR910013565A (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10621899B2 (en) | 2016-10-12 | 2020-04-14 | Samsung Electronics Co., Ltd. | Display apparatus and method of controlling thereof |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5187109A (en) * | 1991-07-19 | 1993-02-16 | International Business Machines Corporation | Lateral bipolar transistor and method of making the same |
| JPH05343413A (ja) * | 1992-06-11 | 1993-12-24 | Fujitsu Ltd | バイポーラトランジスタとその製造方法 |
| EP0881688A1 (en) * | 1997-05-30 | 1998-12-02 | STMicroelectronics S.r.l. | PNP lateral bipolar electronic device |
| DE69714575D1 (de) | 1997-05-30 | 2002-09-12 | St Microelectronics Srl | Laterales PNP-bipolares elektronisches Bauelement und dessen Herstellungsverfahren |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4507171A (en) * | 1982-08-06 | 1985-03-26 | International Business Machines Corporation | Method for contacting a narrow width PN junction region |
| US4546536A (en) * | 1983-08-04 | 1985-10-15 | International Business Machines Corporation | Fabrication methods for high performance lateral bipolar transistors |
-
1989
- 1989-12-28 JP JP1342408A patent/JPH03201564A/ja active Pending
-
1990
- 1990-12-26 KR KR1019900021727A patent/KR910013565A/ko not_active Abandoned
- 1990-12-28 EP EP90125654A patent/EP0435308A1/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10621899B2 (en) | 2016-10-12 | 2020-04-14 | Samsung Electronics Co., Ltd. | Display apparatus and method of controlling thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0435308A1 (en) | 1991-07-03 |
| JPH03201564A (ja) | 1991-09-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
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| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
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| PC1902 | Submission of document of abandonment before decision of registration |
St.27 status event code: N-1-6-B10-B11-nap-PC1902 |
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| SUBM | Surrender of laid-open application requested | ||
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
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| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
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| P22-X000 | Classification modified |
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| P22-X000 | Classification modified |
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| R18-X000 | Changes to party contact information recorded |
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