KR950032012A - 실리카 유리 코팅 세라믹 기판 및 이의 제조방법 - Google Patents
실리카 유리 코팅 세라믹 기판 및 이의 제조방법 Download PDFInfo
- Publication number
- KR950032012A KR950032012A KR1019950011751A KR19950011751A KR950032012A KR 950032012 A KR950032012 A KR 950032012A KR 1019950011751 A KR1019950011751 A KR 1019950011751A KR 19950011751 A KR19950011751 A KR 19950011751A KR 950032012 A KR950032012 A KR 950032012A
- Authority
- KR
- South Korea
- Prior art keywords
- ceramic
- silica glass
- fused silica
- generally flat
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6322—Formation by thermal treatments
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5022—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with vitreous materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/6903—Inorganic materials containing silicon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/69—Insulating materials thereof
- H10W70/692—Ceramics or glasses
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00241—Physical properties of the materials not provided for elsewhere in C04B2111/00
- C04B2111/00336—Materials with a smooth surface, e.g. obtained by using glass-surfaced moulds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
Claims (5)
- (a)전반적으로 편평한 표면을 가지며, 표면상에 구멍이 있는, 질화 알루미늄, 산화 알루미늄, 질화붕소, 질화 규소, 사이알론, 및 질화 알루미늄과 질화 붕소의 콤포지트로 구성된 군으로부터 선택된 세라믹 물질로부터 제조된 세라믹 판; 및 (b)전반적으로 편평한 세라믹 핀의 적어도 한쪽 표면을 피복하고 표면상의 구멍을 충진하며, 표면 조도 Ra는 0.3㎛ 이하인 합성 융합 실리카 유리의 코팅층을 포함하는 일체형의 융합 실리카 유리 코팅 세라믹 기판.
- 제1항에 있어서, 합성 융합 실리카 유리의 코팅층이 0.1내지1000㎛ 의 두께를 갖는 융합 실리카 코팅세라믹 기판.
- (a)질화 알루미늄, 산화 알루미늄, 질화 붕소, 질화 규소, 사이알론, 및 질화 알루미늄과 질화 붕소의 콤포지트로 구성된 군으로부터 선택된 세라믹 물질 판의 적어도 한쪽 표면을 전반적으로 편평하나 구멍이 있는 표면으로 연마하고;(b)산수소 불꽃중에서 기화성 규소 화합물을 불꽃 가수분해하여 제조된 실리카 미립을 전반적으로 편평한 세라믹 판의 표면에 침착시켜서 세라믹 판상 표면의 구멍을 실리카 미립으로 충진하고;(c)세라믹 판의 표면에 침착되어 있으며 구멍을 충진하는 실리카 입자를 가열하여 유리화시켜서 세라믹 판과 일체인 융합 실리카 유리의 층을 형성하고;(d)융합 실리카 유리층의 표면을 표면 조도Ra가 0.3㎛이하이도록 연마하는 것으로 구성되는 융합 실리카 유리 코팅 세라믹 기판의 제조방법.
- 제3항에 있어서, 단계(c)의 가열온도가1200 내지 1600℃인 융합 실리카 유리코팅 세라믹 기판의 제조방법.
- 제3항에 있어서, 단계(d)에서 융합 실리카 유리 층의 표면 염마가 세라믹 물질 판의 표면이 적어도 부분적으로 노출되도록 수행되는 융합 실리카 유리 코팅 세라믹 기판의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6099653A JPH07304133A (ja) | 1994-05-13 | 1994-05-13 | セラミックス基板およびその製造方法 |
| JP94-99653 | 1994-05-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR950032012A true KR950032012A (ko) | 1995-12-20 |
Family
ID=14253020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950011751A Withdrawn KR950032012A (ko) | 1994-05-13 | 1995-05-12 | 실리카 유리 코팅 세라믹 기판 및 이의 제조방법 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH07304133A (ko) |
| KR (1) | KR950032012A (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60324625D1 (de) * | 2002-04-04 | 2008-12-24 | Tosoh Corp | Thermisch-gespritzte Quarzglasteile und Herstellungsverfahren |
| WO2007020872A1 (ja) * | 2005-08-19 | 2007-02-22 | Tokyo Electron Limited | 載置台構造、載置台構造の製造方法及び熱処理装置 |
| US10020218B2 (en) * | 2015-11-17 | 2018-07-10 | Applied Materials, Inc. | Substrate support assembly with deposited surface features |
-
1994
- 1994-05-13 JP JP6099653A patent/JPH07304133A/ja active Pending
-
1995
- 1995-05-12 KR KR1019950011751A patent/KR950032012A/ko not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07304133A (ja) | 1995-11-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PC1203 | Withdrawal of no request for examination |
St.27 status event code: N-1-6-B10-B12-nap-PC1203 |
|
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid | ||
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |