KR970077111A - Projection exposure apparatus - Google Patents

Projection exposure apparatus Download PDF

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Publication number
KR970077111A
KR970077111A KR1019970015201A KR19970015201A KR970077111A KR 970077111 A KR970077111 A KR 970077111A KR 1019970015201 A KR1019970015201 A KR 1019970015201A KR 19970015201 A KR19970015201 A KR 19970015201A KR 970077111 A KR970077111 A KR 970077111A
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KR
South Korea
Prior art keywords
substrate
exposure apparatus
reference member
projection exposure
detection region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019970015201A
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Korean (ko)
Inventor
마사이찌 무라까미
히로시 시라스
도모히데 하마다
Original Assignee
고노 시게오
니콘 코포레이션
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Publication date
Application filed by 고노 시게오, 니콘 코포레이션 filed Critical 고노 시게오
Publication of KR970077111A publication Critical patent/KR970077111A/en
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

오프·악세스 방식의 기판 얼라인먼트계를 구비하는 투영 노광 장치에 있어서, 얼라인먼트 시간을 단축해서 스루풋(throughput)를 증대하고, 또한 기판 스테이지의 스토로크를 길게하는 일 없이 큰 사이즈의 감광 기판을 노광하는 일이 가능토록한 투영 노광 장치를 제공코자 하는 것으로, 그 구성은 기판 스테이지31 위의 다른 위치에 기준 마크를 갖는 기준 부재 FPa, FPb를 복수개 배치하고, 또 그들 복수의 기준 마크를 관찰할 수 있는 오프·악세스 방식의 기판 얼라인먼트계60a, 60b를 복수 설치하여 이뤄진다.In the projection exposure apparatus provided with the substrate alignment system of the off-access system WHEREIN: Exposing a large photosensitive board | substrate without shortening alignment time, increasing throughput, and lengthening the stroke of a board | substrate stage. In order to provide this possible projection exposure apparatus, the configuration is such that the plurality of reference members FPa and FPb having reference marks at different positions on the substrate stage 31 can be arranged and the plurality of reference marks can be observed. A plurality of substrate alignment systems 60a and 60b of an access method are provided.

Description

투영 노광 장치Projection exposure apparatus

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명에 따른 투영 노광 장치의 개략 설명도이다.1 is a schematic explanatory diagram of a projection exposure apparatus according to the present invention.

Claims (5)

감광 기판을 재치(載置)하여 2차원 방향으로 이동 가능한 기판 스테이지와; 마스크 패턴을 상기 감광기판 위에 투영하는 투영 광학계와; 상기 투영 광학계의 광측으로부터 떨어진 위치에 제1검출 영역을 가지고, 상기 감광 기판 위의 얼라인먼트 마크를 검출하는 제1기판 얼라인먼트계와; 상기 투영 광학계의 광측으로부터 떨어진 상기 제1검출 영역과 다른 위치에 제2검출 영역을 가지고, 상기 감광 기판 위의 얼라인먼트 마크를 검출하는 제2기판 얼라인먼트계와; 상기 제1기판 얼라인먼트계에서 검출할 수 있는 기준 마크를 가지고, 상기 기판 스테이지 위에 설치되는, 상기 제1기판 얼라인먼트계용의 제1기준 부재와; 상기 제2기판 얼라인먼트계에서 검출할 수 있는 기준 마크를 가지고, 상기 기판 스테이지 위에서 상기 제1기준 부재와는 다른 위치에 설치되는, 상기 제2기판 얼라인먼트계용 제2기준 부재;를 구비한 것을 특징으로 하는 투영 노광 장치.A substrate stage on which the photosensitive substrate is placed and movable in a two-dimensional direction; A projection optical system for projecting a mask pattern onto the photosensitive substrate; A first substrate alignment system having a first detection region at a position away from the light side of the projection optical system and detecting an alignment mark on the photosensitive substrate; A second substrate alignment system having a second detection region at a position different from the first detection region away from the light side of the projection optical system, and detecting an alignment mark on the photosensitive substrate; A first reference member for the first substrate alignment system having a reference mark detectable by the first substrate alignment system and provided on the substrate stage; And a second reference member for the second substrate alignment system, having a reference mark that can be detected by the second substrate alignment system, and installed at a position different from the first reference member on the substrate stage. Projection exposure apparatus. 제1항에 있어서, 상기 기판 스테이지에서의 상기 제1기준 부재 및 상기 제2기준 부재의 간격은, 상기 제1검출 영역 및 상기 제2검출 영역의 간격에 맞추어 결정되는 것을 특징으로 하는 투영 노광 장치.The projection exposure apparatus according to claim 1, wherein an interval between the first reference member and the second reference member in the substrate stage is determined according to an interval between the first detection region and the second detection region. . 제1항 또는 제2항에 있어서, 상기 기판 스테이지 위에서의 제1기준 부재 및 제2기준 부재의 간격은, 상기 제1검출 영역 및 상기 제2검출 영역의 간격보다 짧은 것을 특징으로 하는 투영 노광 장치.The projection exposure apparatus according to claim 1 or 2, wherein an interval between the first reference member and the second reference member on the substrate stage is shorter than an interval between the first detection region and the second detection region. . 제1항, 제2항 또는 제3항에 있어서, 상기 제1검출 영역 및 제2검출 영역은, 각각 상기 투영 광학계의 투영 시야의 외측으로 설정되는 것을 특징으로 하는 투영 노광 장치.The projection exposure apparatus according to claim 1, 2 or 3, wherein the first detection area and the second detection area are respectively set outside of the projection field of view of the projection optical system. 제1항 내지 제4항 중 어느 한 항에 있어서, 상기 기준 부재는, 상기 기판 스테이지에 대해 승강 가능하도록 설치되는 것을 특징으로 하는 투영 노광 장치.The projection exposure apparatus according to any one of claims 1 to 4, wherein the reference member is provided so as to be elevated relative to the substrate stage. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019970015201A 1996-05-10 1997-04-23 Projection exposure apparatus Withdrawn KR970077111A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP116249/1996 1996-05-10
JP8116249A JPH09306802A (en) 1996-05-10 1996-05-10 Projection exposure device

Publications (1)

Publication Number Publication Date
KR970077111A true KR970077111A (en) 1997-12-12

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ID=14682467

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Application Number Title Priority Date Filing Date
KR1019970015201A Withdrawn KR970077111A (en) 1996-05-10 1997-04-23 Projection exposure apparatus

Country Status (2)

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JP (1) JPH09306802A (en)
KR (1) KR970077111A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101318037B1 (en) * 2004-11-01 2013-10-14 가부시키가이샤 니콘 Exposure apparatus and device producing method
KR101323967B1 (en) * 2004-06-09 2013-10-31 가부시키가이샤 니콘 Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
KR101331631B1 (en) * 2004-10-15 2013-11-20 가부시키가이샤 니콘 Exposure apparatus and device manufacturing method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9760028B2 (en) * 2012-03-08 2017-09-12 Mapper Lithography Ip B.V. Lithography system and method for processing a target, such as a wafer
JP6462993B2 (en) * 2014-04-02 2019-01-30 キヤノン株式会社 Exposure apparatus and article manufacturing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101323967B1 (en) * 2004-06-09 2013-10-31 가부시키가이샤 니콘 Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
KR101331631B1 (en) * 2004-10-15 2013-11-20 가부시키가이샤 니콘 Exposure apparatus and device manufacturing method
KR101364347B1 (en) * 2004-10-15 2014-02-18 가부시키가이샤 니콘 Exposure apparatus and device manufacturing method
KR101318037B1 (en) * 2004-11-01 2013-10-14 가부시키가이샤 니콘 Exposure apparatus and device producing method

Also Published As

Publication number Publication date
JPH09306802A (en) 1997-11-28

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