KR970077469A - 기판반송장치 - Google Patents

기판반송장치 Download PDF

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Publication number
KR970077469A
KR970077469A KR1019970013811A KR19970013811A KR970077469A KR 970077469 A KR970077469 A KR 970077469A KR 1019970013811 A KR1019970013811 A KR 1019970013811A KR 19970013811 A KR19970013811 A KR 19970013811A KR 970077469 A KR970077469 A KR 970077469A
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KR
South Korea
Prior art keywords
substrate
support member
suppressed
processing liquid
square
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KR1019970013811A
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English (en)
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KR100274126B1 (ko
Inventor
미쯔아키 요시타미
Original Assignee
이시다 아키라
다이닛뽕스크린 세이조오 가부시키가이샤
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Publication of KR970077469A publication Critical patent/KR970077469A/ko
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Publication of KR100274126B1 publication Critical patent/KR100274126B1/ko
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3202—Mechanical details, e.g. rollers or belts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3302—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7602—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a robot blade or gripped by a gripper for conveyance

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

기판의 휘어짐을 억제함과 동시에 기판표면의 건조의 불균일을 방지한다.
각형기판(13)을 반송할 때, 자세제어용 에어 실린더(13)를 구동하여, 제1기판지지부재(12) 및 제2기판지지부재(20)와 함께 각형기판(13)전면을 수평자세에서 소정의 경사자세로 전환하기 때문에, 휘어짐 방향의 수평성분이 단축화되어 각형기판(13)의 휘어짐이 억제되고, 그 만큼, 각형기판(13)의 지나친 휘어짐에 의한 파손을 억제할 수 있다. 또한, 이와 같은 균일한 경사자세인 각형기판(13)의 상위측의 단연부를 따라 처리액공급부재(22) 배치하고, 이 처리액공급부재(22)에서 처리액을 각형기판(13)의 위쪽 단연부에 공급하기 때문에, 처리액이 도중에 괴는 것과 같은 일도 없이 경사자세의 아래쪽 단부로 배출되므로, 각형기판(13)에 처리액의 중량이 경감되어 각형기판(13)의 휘어짐이 억제되고, 그만큼, 각형기판(13)의 지나침 휘어짐에 의한 파손도 억제할 수 있다.

Description

기판반송장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 제1실시형태에 있어서 기판반송장치를 포함하는 기판건조장치의 정면도.

Claims (5)

  1. 기판을 기판지지부재로 지지하여 반송하는 기판반송장치에 있어서, 상기 기판지지부재는, 상기 기판에 마주접하여 기판전면을 경사자세로 지지하는 것을 특징으로 하는 기판반송장치.
  2. 기판을 기판지지부재로 지지하여 반송하는 기판반송장치에 있어서, 상기 기판지지부재는, 상기 기판에 마주접하여 기판전면을 경사자세로 지지함과 동시에, 상기 지지판지지부재로 경사지지된 기판의 위쪽 위치 측 단연을 따라, 기판의 표면에 처리액을 공급하는 처리액공급부재를 구비한 것을 특징으로 하는 기판 반송장치.
  3. 제1항 또는 제2항에 있어서, 상기 기판지지부재는, 상기 기판을 지지하는 기판지지핸드가 경사져 기판전면을 경사자세로 하는 것을 특징으로 하는 기판반송장치.
  4. 제1항 또는 제2항에 있어서, 상기 기판지지부재는, 상기 기판에 마주접하는 부재의 지지높이가 다른 것에의해 기판을 경사지지하는 것을 특징으로 하는 기판반송장치.
  5. 제1항, 제2항 또는 제3항에 있어서, 상기 기판지지부재는, 상기 기판을 공급 또는 취입하는 경우의 기판의 수평자세와, 기판을 반송하는 경우의 경사자세를 전환하는 자세 전환수단을 가지는 것을 특징으로 하는 기판반송장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970013811A 1996-05-29 1997-04-15 기판반송장치 Expired - Fee Related KR100274126B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP96-135056 1996-05-29
JP13505696A JP3907745B2 (ja) 1996-05-29 1996-05-29 基板搬送装置

Publications (2)

Publication Number Publication Date
KR970077469A true KR970077469A (ko) 1997-12-12
KR100274126B1 KR100274126B1 (ko) 2001-01-15

Family

ID=15142881

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970013811A Expired - Fee Related KR100274126B1 (ko) 1996-05-29 1997-04-15 기판반송장치

Country Status (2)

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JP (1) JP3907745B2 (ko)
KR (1) KR100274126B1 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5993710B2 (ja) * 2012-10-26 2016-09-14 株式会社ディスコ 洗浄装置と四角板状ワークの搬送方法
JP5978937B2 (ja) * 2012-11-13 2016-08-24 旭硝子株式会社 基板搬送用ハンド及び基板搬送方法
WO2018043655A1 (ja) * 2016-09-01 2018-03-08 秋田エプソン株式会社 病理標本作製装置、病理標本作製システム
JP7180060B2 (ja) * 2016-09-01 2022-11-30 セイコーエプソン株式会社 病理標本作製装置、病理標本作製システム
CN114311094B (zh) * 2021-12-31 2023-10-20 福建晟哲自动化科技有限公司 一种液晶面板的切裂翻片机

Also Published As

Publication number Publication date
KR100274126B1 (ko) 2001-01-15
JP3907745B2 (ja) 2007-04-18
JPH09321118A (ja) 1997-12-12

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