LT2020542A - Vario paviršiaus cheminio nikeliavimo būdas, nenaudojant aktyvavimo paladžiu - Google Patents
Vario paviršiaus cheminio nikeliavimo būdas, nenaudojant aktyvavimo paladžiuInfo
- Publication number
- LT2020542A LT2020542A LT2020542A LT2020542A LT2020542A LT 2020542 A LT2020542 A LT 2020542A LT 2020542 A LT2020542 A LT 2020542A LT 2020542 A LT2020542 A LT 2020542A LT 2020542 A LT2020542 A LT 2020542A
- Authority
- LT
- Lithuania
- Prior art keywords
- copper
- nickel
- reducing agent
- copper surface
- baths
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1637—Composition of the substrate metallic substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
- C23C18/1837—Multistep pretreatment
- C23C18/1844—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1848—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by electrochemical pretreatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/34—Anodisation of metals or alloys not provided for in groups C25D11/04 - C25D11/32
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Išradimas siejamas su selektyviu nikelio sluoksnio nusodinimu ant vario paviršiaus. Išradimas gali būti panaudotas, gaminant elektrai laidžias sritis elektronikos grandynams. Vario paviršiaus cheminio nikeliavimo būdas, apima gaminio, kurio vario paviršius dengiamas nikeliu, panardinimą į vieną arba daugiau tirpalų, iš kurių bent viename iš minėtų tirpalų yra reduktorius ir iš kurių bent vienas tirpalas yra pritaikytas cheminiam nikelio padengimui. Siekiant išplėsti jo panaudojimo sritį, bei gauti, praktiškai grynas nikelio dangas, minėtas reduktorius, yra boro arba fosforo junginiai, apimantys morfolino boraną (C4H9BNO) arba dimetilamino boraną (C2H7BN), arba natrio tetrahidroboratą (NaBH4), arba natrio hipofosfitą (NaH2PO2), kur minėtas reduktorius tiesiogiai arba netiesiogiai redukuoja netirpius vario(I) ir vario(II) junginius vario paviršiuje.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LT2020542A LT6899B (lt) | 2020-08-27 | 2020-08-27 | Vario paviršiaus cheminio nikeliavimo būdas, nenaudojant aktyvavimo paladžiu |
| US17/122,269 US20220064801A1 (en) | 2020-08-27 | 2020-12-15 | Method for electroless nickel deposition onto copper without activation with palladium |
| PCT/IB2021/057786 WO2022043889A1 (en) | 2020-08-27 | 2021-08-25 | Method for electroless nickel deposition onto copper without activation with palladium |
| JP2023513700A JP2023538951A (ja) | 2020-08-27 | 2021-08-25 | パラジウムで活性化することなく銅上に無電解ニッケルを析出させる方法 |
| CN202180053197.3A CN116324032A (zh) | 2020-08-27 | 2021-08-25 | 在不用钯活化的情况下在铜上无电镀镍沉积的方法 |
| KR1020237010227A KR20230056751A (ko) | 2020-08-27 | 2021-08-25 | 팔라듐에 의한 활성화가 없는 구리 상에서 무전해 니켈 증착 방법 |
| EP21759163.5A EP4204599A1 (en) | 2020-08-27 | 2021-08-25 | Method for electroless nickel deposition onto copper without activation with palladium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LT2020542A LT6899B (lt) | 2020-08-27 | 2020-08-27 | Vario paviršiaus cheminio nikeliavimo būdas, nenaudojant aktyvavimo paladžiu |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| LT2020542A true LT2020542A (lt) | 2022-03-10 |
| LT6899B LT6899B (lt) | 2022-04-11 |
Family
ID=73455773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| LT2020542A LT6899B (lt) | 2020-08-27 | 2020-08-27 | Vario paviršiaus cheminio nikeliavimo būdas, nenaudojant aktyvavimo paladžiu |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20220064801A1 (lt) |
| EP (1) | EP4204599A1 (lt) |
| JP (1) | JP2023538951A (lt) |
| KR (1) | KR20230056751A (lt) |
| CN (1) | CN116324032A (lt) |
| LT (1) | LT6899B (lt) |
| WO (1) | WO2022043889A1 (lt) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116713635A (zh) * | 2023-08-08 | 2023-09-08 | 江西兆驰半导体有限公司 | 一种锡膏制备方法、锡膏及其在led芯片封装中的应用 |
Family Cites Families (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4002778A (en) | 1973-08-15 | 1977-01-11 | E. I. Du Pont De Nemours And Company | Chemical plating process |
| BE818613A (fr) * | 1973-08-15 | 1975-02-10 | Procede chimique de nickelage et de cobaltage | |
| US4136216A (en) * | 1975-08-26 | 1979-01-23 | Surface Technology, Inc. | Non-precious metal colloidal dispersions for electroless metal deposition |
| US4355083A (en) * | 1977-06-06 | 1982-10-19 | Nathan Feldstein | Electrolessly metallized silver coated article |
| JPS63216976A (ja) * | 1987-03-03 | 1988-09-09 | Wakamatsu Netsuren Kk | 加熱還元法によるメツキ前処理方法 |
| JPH01201484A (ja) * | 1987-10-06 | 1989-08-14 | Hitachi Ltd | 化学ニッケルめっき液及びその使用方法 |
| US4983428A (en) * | 1988-06-09 | 1991-01-08 | United Technologies Corporation | Ethylenethiourea wear resistant electroless nickel-boron coating compositions |
| US5235139A (en) * | 1990-09-12 | 1993-08-10 | Macdermid, Incorprated | Method for fabricating printed circuits |
| JPH0665749A (ja) * | 1991-09-17 | 1994-03-08 | Hitachi Chem Co Ltd | 無電解ニッケルリンめっき液 |
| TW341022B (en) | 1995-11-29 | 1998-09-21 | Nippon Electric Co | Interconnection structures and method of making same |
| JP2828032B2 (ja) | 1996-05-20 | 1998-11-25 | 日本電気株式会社 | 多層配線構造体の製造方法 |
| US5695810A (en) | 1996-11-20 | 1997-12-09 | Cornell Research Foundation, Inc. | Use of cobalt tungsten phosphide as a barrier material for copper metallization |
| US6180523B1 (en) | 1998-10-13 | 2001-01-30 | Industrial Technology Research Institute | Copper metallization of USLI by electroless process |
| JP3174817B2 (ja) * | 1999-07-28 | 2001-06-11 | ハイパーテック株式会社 | 無電解ニッケルメッキ系型の製造方法 |
| JP3654354B2 (ja) * | 2001-05-28 | 2005-06-02 | 学校法人早稲田大学 | 超lsi配線板及びその製造方法 |
| US6794288B1 (en) | 2003-05-05 | 2004-09-21 | Blue29 Corporation | Method for electroless deposition of phosphorus-containing metal films onto copper with palladium-free activation |
| US20050194255A1 (en) * | 2004-03-04 | 2005-09-08 | Tiwari Chandra S. | Self-activated electroless metal deposition |
| US7332193B2 (en) * | 2004-10-18 | 2008-02-19 | Enthone, Inc. | Cobalt and nickel electroless plating in microelectronic devices |
| JP5344416B2 (ja) * | 2006-03-09 | 2013-11-20 | 奥野製薬工業株式会社 | 自己触媒型無電解ニッケルめっき液用耐折り曲げ性向上剤及び自己触媒型無電解ニッケルめっき液 |
| ES2601554T3 (es) * | 2006-03-16 | 2017-02-15 | Dyax Corp. | Péptidos inhibidores de calicreína plasmática para uso en el tratamiento de trastornos oftálmicos |
| JP2007302967A (ja) * | 2006-05-12 | 2007-11-22 | Mitsubishi Electric Corp | 無電解めっき方法 |
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| CN101654775B (zh) * | 2008-08-21 | 2011-03-30 | 比亚迪股份有限公司 | 化学镀材料及其制备方法 |
| ATE503037T1 (de) * | 2008-10-17 | 2011-04-15 | Atotech Deutschland Gmbh | Spannungsreduzierte ni-p/pd-stapel für waferoberfläche |
| EP2233608B1 (en) | 2009-03-23 | 2016-03-23 | ATOTECH Deutschland GmbH | Pre-treatment process for electroless nickel plating |
| JP5573429B2 (ja) | 2009-08-10 | 2014-08-20 | 住友ベークライト株式会社 | 無電解ニッケル−パラジウム−金めっき方法、めっき処理物、プリント配線板、インターポーザ、および半導体装置 |
| JP5570285B2 (ja) * | 2010-04-19 | 2014-08-13 | 株式会社日本表面処理研究所 | 無電解めっき法で用いる触媒水溶液、その触媒水溶液の調製方法及びその触媒水溶液を用いた無電解めっき法並びにその無電解めっき法を用いて形成した金属皮膜を備える金属層付被めっき物 |
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| US20150325477A1 (en) * | 2014-05-09 | 2015-11-12 | Applied Materials, Inc. | Super conformal metal plating from complexed electrolytes |
| ES2639300T3 (es) * | 2014-12-16 | 2017-10-26 | Atotech Deutschland Gmbh | Composiciones de baño de chapado para el chapado no electrolítico de metales y aleaciones metálicas |
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| JP6735981B2 (ja) * | 2016-04-08 | 2020-08-05 | 石原ケミカル株式会社 | 無電解銅メッキ方法及び当該方法を用いたプリント配線板の製造方法 |
| KR101883249B1 (ko) | 2017-03-31 | 2018-08-30 | (주)엠케이켐앤텍 | 무전해 니켈 도금용 전처리 활성화액, 이를 사용한 무전해 니켈 도금 방법 및 표면 처리 방법, 및 무전해 니켈 도금을 포함하는 인쇄회로 기판 |
| CN108559979B (zh) * | 2018-01-24 | 2020-05-08 | 永星化工(上海)有限公司 | 一种化学镀镍液及其制备方法 |
-
2020
- 2020-08-27 LT LT2020542A patent/LT6899B/lt not_active IP Right Cessation
- 2020-12-15 US US17/122,269 patent/US20220064801A1/en not_active Abandoned
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2021
- 2021-08-25 JP JP2023513700A patent/JP2023538951A/ja active Pending
- 2021-08-25 EP EP21759163.5A patent/EP4204599A1/en active Pending
- 2021-08-25 WO PCT/IB2021/057786 patent/WO2022043889A1/en not_active Ceased
- 2021-08-25 KR KR1020237010227A patent/KR20230056751A/ko not_active Withdrawn
- 2021-08-25 CN CN202180053197.3A patent/CN116324032A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022043889A1 (en) | 2022-03-03 |
| LT6899B (lt) | 2022-04-11 |
| KR20230056751A (ko) | 2023-04-27 |
| WO2022043889A4 (en) | 2022-04-21 |
| JP2023538951A (ja) | 2023-09-12 |
| US20220064801A1 (en) | 2022-03-03 |
| CN116324032A (zh) | 2023-06-23 |
| EP4204599A1 (en) | 2023-07-05 |
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