MA46443A - Appareil et procédé de dépôt par évaporation sous vide - Google Patents

Appareil et procédé de dépôt par évaporation sous vide

Info

Publication number
MA46443A
MA46443A MA046443A MA46443A MA46443A MA 46443 A MA46443 A MA 46443A MA 046443 A MA046443 A MA 046443A MA 46443 A MA46443 A MA 46443A MA 46443 A MA46443 A MA 46443A
Authority
MA
Morocco
Prior art keywords
deposit
vacuum evaporation
evaporation
vacuum
Prior art date
Application number
MA046443A
Other languages
English (en)
Other versions
MA46443B1 (fr
Inventor
Rémy Bonnemann
Lucie Gaouyat
Sergio Pace
Eric Silberberg
Dimitri Wilders
Original Assignee
Arcelormittal
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arcelormittal filed Critical Arcelormittal
Publication of MA46443A publication Critical patent/MA46443A/fr
Publication of MA46443B1 publication Critical patent/MA46443B1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
MA46443A 2016-07-27 2017-07-27 Appareil et procédé de dépôt sous vide MA46443B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/IB2016/054477 WO2018020296A1 (fr) 2016-07-27 2016-07-27 Appareil et procédé de dépôt par évaporation sous vide
PCT/IB2017/000876 WO2018020311A1 (fr) 2016-07-27 2017-07-27 Appareil et procédé de dépôt par évaporation sous vide

Publications (2)

Publication Number Publication Date
MA46443A true MA46443A (fr) 2019-08-14
MA46443B1 MA46443B1 (fr) 2024-05-31

Family

ID=56609882

Family Applications (1)

Application Number Title Priority Date Filing Date
MA46443A MA46443B1 (fr) 2016-07-27 2017-07-27 Appareil et procédé de dépôt sous vide

Country Status (17)

Country Link
US (2) US11319626B2 (fr)
EP (1) EP3523456B1 (fr)
JP (1) JP6937364B2 (fr)
KR (3) KR102686074B1 (fr)
CN (2) CN109496240A (fr)
AU (1) AU2017303961B2 (fr)
CA (1) CA3027481C (fr)
ES (1) ES2985071T3 (fr)
FI (1) FI3523456T3 (fr)
HU (1) HUE066966T2 (fr)
MA (1) MA46443B1 (fr)
MX (1) MX2019000961A (fr)
PL (1) PL3523456T3 (fr)
RU (1) RU2706830C1 (fr)
UA (1) UA122540C2 (fr)
WO (2) WO2018020296A1 (fr)
ZA (1) ZA201808211B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019239192A1 (fr) * 2018-06-15 2019-12-19 Arcelormittal Installation de dépôt sous vide et procédé de revêtement d'un substrat
CN110004411B (zh) * 2019-03-29 2021-05-11 北京钢研新冶工程设计有限公司 一种合金镀膜方法
CN112553577A (zh) 2019-09-26 2021-03-26 宝山钢铁股份有限公司 一种提高真空镀膜收得率的真空镀膜装置
CN112553578B (zh) 2019-09-26 2022-01-14 宝山钢铁股份有限公司 一种具有抑流式喷嘴的真空镀膜装置
CN112575308B (zh) 2019-09-29 2023-03-24 宝山钢铁股份有限公司 一种能在真空下带钢高效镀膜的真空镀膜装置
CN113684479A (zh) * 2020-05-19 2021-11-23 宝山钢铁股份有限公司 一种利用电磁搅拌器搅拌的涂镀方法及合金真空沉积装置
WO2021247382A1 (fr) * 2020-06-04 2021-12-09 Applied Materials, Inc. Appareil de dépôt en phase vapeur et procédé de revêtement d'un substrat dans une chambre sous vide
CN113957392B (zh) 2020-07-21 2022-09-20 宝山钢铁股份有限公司 一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置
CN113957388B (zh) 2020-07-21 2022-08-16 宝山钢铁股份有限公司 一种采用导流板式结构均匀分配金属蒸汽的真空镀膜装置
CN113957390B (zh) * 2020-07-21 2024-03-08 宝山钢铁股份有限公司 一种具有气垫缓冲腔的真空镀膜装置
CN113957391B (zh) * 2020-07-21 2023-09-12 宝山钢铁股份有限公司 一种采用芯棒加热结构均匀分配金属蒸汽的真空镀膜装置
CN113528859B (zh) * 2020-11-30 2024-10-18 深圳市研一新材料有限责任公司 一种超薄金属锂箔的制备方法和制备设备
WO2023062410A1 (fr) * 2021-10-14 2023-04-20 Arcelormittal Buse à vapeur pour dépôt physique en phase vapeur (pvd)

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JPH02138462A (ja) * 1988-11-16 1990-05-28 Matsushita Electric Ind Co Ltd 薄膜製造装置
EP0403987B1 (fr) * 1989-06-19 1994-09-21 Matsushita Electric Industrial Co., Ltd. Procédé d'alimentation de matériau à vaporiser sous vide et appareillage pour sa réalisation
US5077090A (en) * 1990-03-02 1991-12-31 General Electric Company Method of forming dual alloy disks
CA2036810A1 (fr) * 1990-03-02 1991-09-03 Thomas F. Sawyer Methode de faconnage d'articles faisant appel a des alliages de composition variable
US5195651A (en) * 1991-06-26 1993-03-23 The United States Of America As Represented By The United States Department Of Energy Ball feeder for replenishing evaporator feed
JPH06306583A (ja) * 1993-04-16 1994-11-01 Sumitomo Electric Ind Ltd 蒸着用材料及びその製造方法
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BE1010351A6 (fr) 1996-06-13 1998-06-02 Centre Rech Metallurgique Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique.
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US20070098891A1 (en) * 2005-10-31 2007-05-03 Eastman Kodak Company Vapor deposition apparatus and method
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EP1972699A1 (fr) * 2007-03-20 2008-09-24 ArcelorMittal France Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
JP4331791B2 (ja) 2007-10-09 2009-09-16 パナソニック株式会社 成膜方法および成膜装置
EP2199425A1 (fr) 2008-12-18 2010-06-23 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II)
KR101172275B1 (ko) * 2009-12-31 2012-08-08 에스엔유 프리시젼 주식회사 기화 장치 및 이의 제어 방법
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ES2538661T3 (es) 2011-01-14 2015-06-23 Arcelormittal Investigación Y Desarrollo Dispositivo de alimentación automática de un generador de vapor metálico industrial
MX348482B (es) * 2012-03-23 2017-06-14 Aleksandrovich Kulakovsky Aleksandr Unidad para aplicar recubrimientos sobre productos alargados.
ES2566607T3 (es) * 2012-03-30 2016-04-14 Tata Steel Nederland Technology B.V. Método y aparato para cargar metal líquido en un dispositivo evaporador
KR101461738B1 (ko) 2012-12-21 2014-11-14 주식회사 포스코 가열장치 및 이를 포함하는 코팅 시스템
KR102242070B1 (ko) * 2013-11-05 2021-04-20 타타 스틸 네덜란드 테크날러지 베.뷔. 증발기 디바이스 내의 액상 금속의 조성을 제어하는 방법 및 장치
KR102098452B1 (ko) * 2017-09-11 2020-04-07 주식회사 포스코 건식 도금 장치 및 건식 도금 방법
CN112538604B (zh) * 2019-09-23 2022-09-16 宝山钢铁股份有限公司 一种真空镀膜补液和稳定金属蒸汽供应量的装置及其方法

Also Published As

Publication number Publication date
KR20210024690A (ko) 2021-03-05
JP2019523345A (ja) 2019-08-22
ZA201808211B (en) 2019-07-31
WO2018020311A1 (fr) 2018-02-01
US11319626B2 (en) 2022-05-03
ES2985071T3 (es) 2024-11-04
CN109496240A (zh) 2019-03-19
UA122540C2 (uk) 2020-11-25
AU2017303961A1 (en) 2019-01-03
CA3027481C (fr) 2021-07-06
PL3523456T3 (pl) 2024-06-24
BR112018076292A2 (pt) 2019-03-26
KR102535908B1 (ko) 2023-05-26
US20190242006A1 (en) 2019-08-08
US20220228252A1 (en) 2022-07-21
WO2018020296A1 (fr) 2018-02-01
KR20230075522A (ko) 2023-05-31
EP3523456B1 (fr) 2024-04-17
MA46443B1 (fr) 2024-05-31
MX2019000961A (es) 2019-08-01
CA3027481A1 (fr) 2018-02-01
HUE066966T2 (hu) 2024-09-28
KR20190020103A (ko) 2019-02-27
EP3523456A1 (fr) 2019-08-14
RU2706830C1 (ru) 2019-11-21
FI3523456T3 (fi) 2024-05-15
CN121472784A (zh) 2026-02-06
KR102686074B1 (ko) 2024-07-17
JP6937364B2 (ja) 2021-09-22
AU2017303961B2 (en) 2020-04-16
US11781213B2 (en) 2023-10-10

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