MA46443A - Appareil et procédé de dépôt par évaporation sous vide - Google Patents

Appareil et procédé de dépôt par évaporation sous vide

Info

Publication number: MA46443A
Authority: MA; Morocco
Prior art keywords: deposit; vacuum evaporation; evaporation; vacuum
Prior art date: 2016-07-27

Application number

MA046443A

Other languages

English (en)

Other versions

MA46443B1 (fr

Inventor

Rémy Bonnemann

Lucie Gaouyat

Sergio Pace

Eric Silberberg

Dimitri Wilders

Original Assignee

Arcelormittal

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2016-07-27

Filing date

2017-07-27

Publication date

2019-08-14

2017-07-27 Application filed by Arcelormittal filed Critical Arcelormittal

2019-08-14 Publication of MA46443A publication Critical patent/MA46443A/fr

2024-05-31 Publication of MA46443B1 publication Critical patent/MA46443B1/fr

Links

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)

MA46443A 2016-07-27 2017-07-27 Appareil et procédé de dépôt sous vide MA46443B1 (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
PCT/IB2016/054477 WO2018020296A1 (fr)	2016-07-27	2016-07-27	Appareil et procédé de dépôt par évaporation sous vide
PCT/IB2017/000876 WO2018020311A1 (fr)	2016-07-27	2017-07-27	Appareil et procédé de dépôt par évaporation sous vide

Publications (2)

Publication Number	Publication Date
MA46443A true MA46443A (fr)	2019-08-14
MA46443B1 MA46443B1 (fr)	2024-05-31

Family

ID=56609882

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
MA46443A MA46443B1 (fr)	2016-07-27	2017-07-27	Appareil et procédé de dépôt sous vide

Country Status (17)

Country	Link
US (2)	US11319626B2 (fr)
EP (1)	EP3523456B1 (fr)
JP (1)	JP6937364B2 (fr)
KR (3)	KR102535908B1 (fr)
CN (2)	CN109496240A (fr)
AU (1)	AU2017303961B2 (fr)
CA (1)	CA3027481C (fr)
ES (1)	ES2985071T3 (fr)
FI (1)	FI3523456T3 (fr)
HU (1)	HUE066966T2 (fr)
MA (1)	MA46443B1 (fr)
MX (1)	MX2019000961A (fr)
PL (1)	PL3523456T3 (fr)
RU (1)	RU2706830C1 (fr)
UA (1)	UA122540C2 (fr)
WO (2)	WO2018020296A1 (fr)
ZA (1)	ZA201808211B (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2019239192A1 (fr) *	2018-06-15	2019-12-19	Arcelormittal	Installation de dépôt sous vide et procédé de revêtement d'un substrat
CN110004411B (zh) *	2019-03-29	2021-05-11	北京钢研新冶工程设计有限公司	一种合金镀膜方法
CN112553577A (zh)	2019-09-26	2021-03-26	宝山钢铁股份有限公司	一种提高真空镀膜收得率的真空镀膜装置
CN112553578B (zh)	2019-09-26	2022-01-14	宝山钢铁股份有限公司	一种具有抑流式喷嘴的真空镀膜装置
CN112575308B (zh)	2019-09-29	2023-03-24	宝山钢铁股份有限公司	一种能在真空下带钢高效镀膜的真空镀膜装置
CN113684479A (zh) *	2020-05-19	2021-11-23	宝山钢铁股份有限公司	一种利用电磁搅拌器搅拌的涂镀方法及合金真空沉积装置
JP7667803B2 (ja) *	2020-06-04	2025-04-23	アプライドマテリアルズインコーポレイテッド	気相堆積装置及び真空チャンバ内で基板をコーティングするための方法
CN113957390B (zh) *	2020-07-21	2024-03-08	宝山钢铁股份有限公司	一种具有气垫缓冲腔的真空镀膜装置
CN113957392B (zh)	2020-07-21	2022-09-20	宝山钢铁股份有限公司	一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置
CN113957388B (zh)	2020-07-21	2022-08-16	宝山钢铁股份有限公司	一种采用导流板式结构均匀分配金属蒸汽的真空镀膜装置
CN113957391B (zh) *	2020-07-21	2023-09-12	宝山钢铁股份有限公司	一种采用芯棒加热结构均匀分配金属蒸汽的真空镀膜装置
WO2023062410A1 (fr) *	2021-10-14	2023-04-20	Arcelormittal	Buse à vapeur pour dépôt physique en phase vapeur (pvd)

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2665229A (en) *	1951-11-05	1954-01-05	Nat Res Corp	Method of coating by vapor deposition
US5002837A (en) *	1988-07-06	1991-03-26	Kabushiki Kaisha Kobe Seiko Sho	Zn-Mg alloy vapor deposition plated metals of high corrosion resistance, as well as method of producing them
JPH02138462A (ja) *	1988-11-16	1990-05-28	Matsushita Electric Ind Co Ltd	薄膜製造装置
DE69012667T2 (de) *	1989-06-19	1995-05-04	Matsushita Electric Ind Co Ltd	Verfahren zum Zuleiten von Vakuumverdampfungsgut und Vorrichtung zu dessen Durchführung.
US5077090A (en) *	1990-03-02	1991-12-31	General Electric Company	Method of forming dual alloy disks
DE4105420A1 (de)	1990-03-02	1991-09-05	Gen Electric	Verfahren zum herstellen eines gegenstandes mit einer veraenderlichen legierungszusammensetzung
US5195651A (en) *	1991-06-26	1993-03-23	The United States Of America As Represented By The United States Department Of Energy	Ball feeder for replenishing evaporator feed
ES2110094T3 (es) *	1992-05-11	1998-02-01	Sumitomo Electric Industries	Material de deposicion en forma de vapor y metodo para la produccion del mismo.
JPH06306583A (ja) *	1993-04-16	1994-11-01	Sumitomo Electric Ind Ltd	蒸着用材料及びその製造方法
BE1010351A6 (fr)	1996-06-13	1998-06-02	Centre Rech Metallurgique	Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique.
US6251233B1 (en) *	1998-08-03	2001-06-26	The Coca-Cola Company	Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
US7891315B2 (en) *	2005-09-09	2011-02-22	Sulzer Metco Ag	Powder supply system
US20070098891A1 (en) *	2005-10-31	2007-05-03	Eastman Kodak Company	Vapor deposition apparatus and method
US20070141233A1 (en) *	2005-12-21	2007-06-21	United Technologies Corporation	EB-PVD system with automatic melt pool height control
EP1972699A1 (fr) *	2007-03-20	2008-09-24	ArcelorMittal France	Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
JP4331791B2 (ja)	2007-10-09	2009-09-16	パナソニック株式会社	成膜方法および成膜装置
EP2199425A1 (fr)	2008-12-18	2010-06-23	ArcelorMittal France	Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II)
KR101172275B1 (ko) *	2009-12-31	2012-08-08	에스엔유 프리시젼 주식회사	기화 장치 및 이의 제어 방법
US8252117B2 (en) *	2010-01-07	2012-08-28	Primestar Solar, Inc.	Automatic feed system and related process for introducing source material to a thin film vapor deposition system
JP6046051B2 (ja)	2011-01-14	2016-12-14	アルセロールミタルインベスティガシオンイデサローロ，エス．エル．	工業用金属蒸気発生器のための自動供給装置
MX348482B (es)	2012-03-23	2017-06-14	Aleksandrovich Kulakovsky Aleksandr	Unidad para aplicar recubrimientos sobre productos alargados.
ES2566607T3 (es) *	2012-03-30	2016-04-14	Tata Steel Nederland Technology B.V.	Método y aparato para cargar metal líquido en un dispositivo evaporador
KR101461738B1 (ko)	2012-12-21	2014-11-14	주식회사 포스코	가열장치 및 이를 포함하는 코팅 시스템
US10131983B2 (en) *	2013-11-05	2018-11-20	Tata Steel Nederland Technology B.V.	Method and apparatus for controlling the composition of liquid metal in an evaporator device
KR102098452B1 (ko) *	2017-09-11	2020-04-07	주식회사 포스코	건식 도금 장치 및 건식 도금 방법
CN112538604B (zh) *	2019-09-23	2022-09-16	宝山钢铁股份有限公司	一种真空镀膜补液和稳定金属蒸汽供应量的装置及其方法

2016
- 2016-07-27 WO PCT/IB2016/054477 patent/WO2018020296A1/fr not_active Ceased
2017
- 2017-07-27 WO PCT/IB2017/000876 patent/WO2018020311A1/fr not_active Ceased
- 2017-07-27 MA MA46443A patent/MA46443B1/fr unknown
- 2017-07-27 KR KR1020217005918A patent/KR102535908B1/ko active Active
- 2017-07-27 JP JP2019504124A patent/JP6937364B2/ja active Active
- 2017-07-27 US US16/318,563 patent/US11319626B2/en active Active
- 2017-07-27 RU RU2019105474A patent/RU2706830C1/ru active
- 2017-07-27 CA CA3027481A patent/CA3027481C/fr active Active
- 2017-07-27 EP EP17752165.5A patent/EP3523456B1/fr active Active
- 2017-07-27 CN CN201780046572.5A patent/CN109496240A/zh active Pending
- 2017-07-27 FI FIEP17752165.5T patent/FI3523456T3/fi active
- 2017-07-27 CN CN202511546772.XA patent/CN121472784A/zh active Pending
- 2017-07-27 HU HUE17752165A patent/HUE066966T2/hu unknown
- 2017-07-27 ES ES17752165T patent/ES2985071T3/es active Active
- 2017-07-27 KR KR1020237016624A patent/KR102686074B1/ko active Active
- 2017-07-27 KR KR1020197001836A patent/KR20190020103A/ko not_active Ceased
- 2017-07-27 AU AU2017303961A patent/AU2017303961B2/en active Active
- 2017-07-27 MX MX2019000961A patent/MX2019000961A/es unknown
- 2017-07-27 PL PL17752165.5T patent/PL3523456T3/pl unknown
- 2017-07-27 UA UAA201901930A patent/UA122540C2/uk unknown
2018
- 2018-12-05 ZA ZA2018/08211A patent/ZA201808211B/en unknown
2022
- 2022-04-01 US US17/711,260 patent/US11781213B2/en active Active

Also Published As

Publication number	Publication date
WO2018020296A1 (fr)	2018-02-01
HUE066966T2 (hu)	2024-09-28
CA3027481C (fr)	2021-07-06
US11781213B2 (en)	2023-10-10
MX2019000961A (es)	2019-08-01
WO2018020311A1 (fr)	2018-02-01
PL3523456T3 (pl)	2024-06-24
KR20210024690A (ko)	2021-03-05
JP2019523345A (ja)	2019-08-22
KR20190020103A (ko)	2019-02-27
CN109496240A (zh)	2019-03-19
AU2017303961A1 (en)	2019-01-03
US20190242006A1 (en)	2019-08-08
KR20230075522A (ko)	2023-05-31
KR102535908B1 (ko)	2023-05-26
CA3027481A1 (fr)	2018-02-01
JP6937364B2 (ja)	2021-09-22
RU2706830C1 (ru)	2019-11-21
CN121472784A (zh)	2026-02-06
KR102686074B1 (ko)	2024-07-17
ZA201808211B (en)	2019-07-31
US20220228252A1 (en)	2022-07-21
FI3523456T3 (fi)	2024-05-15
EP3523456B1 (fr)	2024-04-17
EP3523456A1 (fr)	2019-08-14
ES2985071T3 (es)	2024-11-04
US11319626B2 (en)	2022-05-03
MA46443B1 (fr)	2024-05-31
UA122540C2 (uk)	2020-11-25
AU2017303961B2 (en)	2020-04-16
BR112018076292A2 (pt)	2019-03-26

Publication	Publication Date	Title
MA46443A (fr)	2019-08-14	Appareil et procédé de dépôt par évaporation sous vide
EP3684463A4 (fr)	2021-06-23	Procédé et appareil de neuro-activation
EP3370534A4 (fr)	2019-05-22	Appareil et procédé de séchage par pulvérisation
EP3337914A4 (fr)	2019-04-17	Procédé et appareil de co-pulvérisation cathodique de cibles multiples
EP3457867A4 (fr)	2020-03-04	Procédé et appareil de cuisson sous-vide commandé par pression
EP3488388A4 (fr)	2019-07-17	Procédé et appareil de traitement de vidéo
EP3286114A4 (fr)	2019-01-16	Procédé et appareil permettant de stocker ou de récupérer des articles
FR3038429B1 (fr)	2018-09-21	Conteneur de paiement, procede de creation, procede de traitement, dispositifs et programmes correspondants
EP3491164A4 (fr)	2020-05-27	Évaporateur, appareil de revêtement par évaporation et procédé de revêtement par évaporation
EP3286140A4 (fr)	2019-04-17	Procédé et appareil s'appliquant à la distillation membranaire sous vide perfectionnée
EP3664668A4 (fr)	2021-05-12	Procédé et appareil de thermoformage d'un article
EP3597318A4 (fr)	2021-01-06	Appareil de nettoyage par ultrasons et procédé de nettoyage par ultrasons
FR3030536B1 (fr)	2018-06-15	Organopolysiloxanes et leur procede de preparation
SG11201810530YA (en)	2018-12-28	Deposition apparatus and physical vapor deposition chamber
EP3806502A4 (fr)	2021-07-14	Procédé et appareil de positionnement
EP3448929A4 (fr)	2019-11-13	Revêtement multicouche et procédé de préparation du revêtement multicouche
EP3649828A4 (fr)	2021-02-24	Procédé et appareil
EP3678164A4 (fr)	2021-09-15	Dispositif et procédé de croissance en phase vapeur
EP3684437A4 (fr)	2021-09-08	Procédé et appareil de filtration
EP3460633A4 (fr)	2019-04-17	Appareil visiocasque et procédé de traitement associé
EP3665779A4 (fr)	2021-03-24	Procédé et appareil
EP3494356A4 (fr)	2020-03-04	Appareil et procédé de dynamitage
EP3652790A4 (fr)	2021-03-31	Appareil et procédé photovoltaïques
EP3374296A4 (fr)	2019-08-07	Appareil et procédé de suivi de bandes transporteuses
EP3547774A4 (fr)	2019-11-06	Procédé et appareil de mappage de ressources