MA46443B1 - Appareil et procédé de dépôt sous vide - Google Patents

Appareil et procédé de dépôt sous vide

Info

Publication number
MA46443B1
MA46443B1 MA46443A MA46443A MA46443B1 MA 46443 B1 MA46443 B1 MA 46443B1 MA 46443 A MA46443 A MA 46443A MA 46443 A MA46443 A MA 46443A MA 46443 B1 MA46443 B1 MA 46443B1
Authority
MA
Morocco
Prior art keywords
additional element
supplying
evaporation crucible
installation
solid state
Prior art date
Application number
MA46443A
Other languages
English (en)
Other versions
MA46443A (fr
Inventor
Eric Silberberg
Sergio Pace
Dimitri Wilders
Rémy Bonnemann
Lucie Gaouyat
Original Assignee
Arcelormittal
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arcelormittal filed Critical Arcelormittal
Publication of MA46443A publication Critical patent/MA46443A/fr
Publication of MA46443B1 publication Critical patent/MA46443B1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Cette invention concerne une installation de dépôt par évaporation sous vide (1) destinée à déposer en continu, sur un substrat en mouvement, des revêtements faits d'alliages métalliques comprenant un élément principal et au moins un élément supplémentaire, l'installation comprenant une chambre de dépôt par évaporation sous vide (2) et des moyens de déplacement du substrat (5) à travers la chambre, l'installation comprenant en outre : •- une coucheuse à jet de vapeur (3), •- un creuset d'évaporation (4) approprié pour alimenter la coucheuse à jet de vapeur avec une vapeur comprenant l'élément principal et ledit/lesdits élément(s) supplémentaire(s), •- un four de recharge (9) apte à alimenter le creuset d'évaporation avec l'élément principal à l'état fondu et capable de maintenir un niveau constant de liquide dans le creuset d'évaporation, •- une unité d'alimentation (11) appropriée pour être alimentée en ledit/lesdits élément(s) supplémentaire(s) à l'état solide et appropriée pour alimenter le creuset d'évaporation avec ledit/lesdits élément(s) supplémentaire(s) indifféremment à l'état fondu, à l'état solide ou à l'état partiellement solide. L'invention concerne en outre un procédé de dépôt continu, sur un substrat en mouvement, de revêtements formés à partir d'alliages métalliques comprenant un élément principal et au moins un élément supplémentaire.
MA46443A 2016-07-27 2017-07-27 Appareil et procédé de dépôt sous vide MA46443B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/IB2016/054477 WO2018020296A1 (fr) 2016-07-27 2016-07-27 Appareil et procédé de dépôt par évaporation sous vide
PCT/IB2017/000876 WO2018020311A1 (fr) 2016-07-27 2017-07-27 Appareil et procédé de dépôt par évaporation sous vide

Publications (2)

Publication Number Publication Date
MA46443A MA46443A (fr) 2019-08-14
MA46443B1 true MA46443B1 (fr) 2024-05-31

Family

ID=56609882

Family Applications (1)

Application Number Title Priority Date Filing Date
MA46443A MA46443B1 (fr) 2016-07-27 2017-07-27 Appareil et procédé de dépôt sous vide

Country Status (17)

Country Link
US (2) US11319626B2 (fr)
EP (1) EP3523456B1 (fr)
JP (1) JP6937364B2 (fr)
KR (3) KR102535908B1 (fr)
CN (2) CN121472784A (fr)
AU (1) AU2017303961B2 (fr)
CA (1) CA3027481C (fr)
ES (1) ES2985071T3 (fr)
FI (1) FI3523456T3 (fr)
HU (1) HUE066966T2 (fr)
MA (1) MA46443B1 (fr)
MX (1) MX2019000961A (fr)
PL (1) PL3523456T3 (fr)
RU (1) RU2706830C1 (fr)
UA (1) UA122540C2 (fr)
WO (2) WO2018020296A1 (fr)
ZA (1) ZA201808211B (fr)

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WO2019239192A1 (fr) * 2018-06-15 2019-12-19 Arcelormittal Installation de dépôt sous vide et procédé de revêtement d'un substrat
CN110004411B (zh) * 2019-03-29 2021-05-11 北京钢研新冶工程设计有限公司 一种合金镀膜方法
CN112553577A (zh) 2019-09-26 2021-03-26 宝山钢铁股份有限公司 一种提高真空镀膜收得率的真空镀膜装置
CN112553578B (zh) 2019-09-26 2022-01-14 宝山钢铁股份有限公司 一种具有抑流式喷嘴的真空镀膜装置
CN112575308B (zh) 2019-09-29 2023-03-24 宝山钢铁股份有限公司 一种能在真空下带钢高效镀膜的真空镀膜装置
CN113684479A (zh) * 2020-05-19 2021-11-23 宝山钢铁股份有限公司 一种利用电磁搅拌器搅拌的涂镀方法及合金真空沉积装置
TWI839614B (zh) * 2020-06-04 2024-04-21 美商應用材料股份有限公司 液體材料驟蒸發坩堝、蒸氣沉積設備及用於塗覆真空腔室內的基板的方法
CN113957392B (zh) 2020-07-21 2022-09-20 宝山钢铁股份有限公司 一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置
CN113957390B (zh) * 2020-07-21 2024-03-08 宝山钢铁股份有限公司 一种具有气垫缓冲腔的真空镀膜装置
CN113957388B (zh) 2020-07-21 2022-08-16 宝山钢铁股份有限公司 一种采用导流板式结构均匀分配金属蒸汽的真空镀膜装置
CN113957391B (zh) * 2020-07-21 2023-09-12 宝山钢铁股份有限公司 一种采用芯棒加热结构均匀分配金属蒸汽的真空镀膜装置
WO2023062410A1 (fr) * 2021-10-14 2023-04-20 Arcelormittal Buse à vapeur pour dépôt physique en phase vapeur (pvd)

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CN112538604B (zh) * 2019-09-23 2022-09-16 宝山钢铁股份有限公司 一种真空镀膜补液和稳定金属蒸汽供应量的装置及其方法

Also Published As

Publication number Publication date
WO2018020311A1 (fr) 2018-02-01
US20190242006A1 (en) 2019-08-08
CN109496240A (zh) 2019-03-19
HUE066966T2 (hu) 2024-09-28
ZA201808211B (en) 2019-07-31
JP6937364B2 (ja) 2021-09-22
CA3027481C (fr) 2021-07-06
WO2018020296A1 (fr) 2018-02-01
PL3523456T3 (pl) 2024-06-24
JP2019523345A (ja) 2019-08-22
EP3523456A1 (fr) 2019-08-14
RU2706830C1 (ru) 2019-11-21
AU2017303961B2 (en) 2020-04-16
MX2019000961A (es) 2019-08-01
FI3523456T3 (fi) 2024-05-15
KR102686074B1 (ko) 2024-07-17
US20220228252A1 (en) 2022-07-21
KR102535908B1 (ko) 2023-05-26
US11781213B2 (en) 2023-10-10
KR20230075522A (ko) 2023-05-31
KR20210024690A (ko) 2021-03-05
EP3523456B1 (fr) 2024-04-17
AU2017303961A1 (en) 2019-01-03
BR112018076292A2 (pt) 2019-03-26
MA46443A (fr) 2019-08-14
UA122540C2 (uk) 2020-11-25
ES2985071T3 (es) 2024-11-04
KR20190020103A (ko) 2019-02-27
US11319626B2 (en) 2022-05-03
CN121472784A (zh) 2026-02-06
CA3027481A1 (fr) 2018-02-01

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