MY130423A - Regeneration method for a plating solution - Google Patents

Regeneration method for a plating solution

Info

Publication number
MY130423A
MY130423A MYPI20022395A MYPI20022395A MY130423A MY 130423 A MY130423 A MY 130423A MY PI20022395 A MYPI20022395 A MY PI20022395A MY PI20022395 A MYPI20022395 A MY PI20022395A MY 130423 A MY130423 A MY 130423A
Authority
MY
Malaysia
Prior art keywords
tin
ions
solution
regeneration
plating solution
Prior art date
Application number
MYPI20022395A
Other languages
English (en)
Inventor
Thomas Beck
Hans-Jurgen Dr Schreier
Sven Lamprecht
Rolf Schroder
Kai-Jens Matejat
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of MY130423A publication Critical patent/MY130423A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1617—Purification and regeneration of coating baths

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemically Coating (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electrolytic Production Of Metals (AREA)
MYPI20022395A 2001-07-03 2002-06-26 Regeneration method for a plating solution MY130423A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10132478A DE10132478C1 (de) 2001-07-03 2001-07-03 Verfahren zum Abscheiden einer Metallschicht sowie Verfahren zum Regenerieren einer Metallionen in einer hohen Oxidationsstufe enthaltenden Lösung

Publications (1)

Publication Number Publication Date
MY130423A true MY130423A (en) 2007-06-29

Family

ID=7690626

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20022395A MY130423A (en) 2001-07-03 2002-06-26 Regeneration method for a plating solution

Country Status (15)

Country Link
US (1) US20040245108A1 (fr)
EP (1) EP1427869B1 (fr)
JP (1) JP4157838B2 (fr)
KR (1) KR100827259B1 (fr)
CN (1) CN1232677C (fr)
AT (1) ATE289633T1 (fr)
AU (1) AU2002321069A1 (fr)
BR (1) BR0210829B1 (fr)
CA (1) CA2450258A1 (fr)
DE (2) DE10132478C1 (fr)
ES (1) ES2236552T3 (fr)
MX (1) MXPA03011772A (fr)
MY (1) MY130423A (fr)
TW (1) TWI279456B (fr)
WO (1) WO2003004725A2 (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2004301610C1 (en) 2003-07-16 2008-05-15 Interdigital Technology Corporation Method and system for transferring information between network management entities of a wireless communication system
EP1630252A1 (fr) * 2004-08-27 2006-03-01 ATOTECH Deutschland GmbH Procédé de dépot d'etain ou d'alliages d'etain sur des substrats contenant de l'antimoine
JP4998704B2 (ja) 2007-01-22 2012-08-15 上村工業株式会社 置換錫合金めっき皮膜の形成方法、置換錫合金めっき浴及びめっき性能の維持方法
EP2298960A1 (fr) 2009-08-24 2011-03-23 ATOTECH Deutschland GmbH Procédé de placage anélectrolytique pour l'étain et les alliages d'étain
DE102009060676B4 (de) 2009-12-28 2015-07-23 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum nasschemischen Behandeln von Behandlungsgut
CN102586851B (zh) * 2011-01-06 2015-03-04 宝山钢铁股份有限公司 一种缓解并减少镀锡溶液产生锡泥的电解方法
EP2671968B1 (fr) * 2012-06-05 2014-11-26 ATOTECH Deutschland GmbH Procédé et appareil de régénération pour régénérer un composition de placage
CN106801235B (zh) * 2015-05-12 2018-06-08 江苏理工学院 降低加工成本的超临界复合电铸体系回收利用装置
CN106011810B (zh) * 2016-06-02 2019-01-11 东莞市智源电子科技有限公司 铜基材的化学锡镀液中四价锡的去除工艺
JP6990240B2 (ja) * 2016-10-24 2022-01-12 アトテック・ドイチュラント・ゲーエムベーハー 金属基板へのスズ層の被覆方法、および、ニッケル／リン合金下層と、前記方法による前記スズ層と、を備えた構造の使用
CN110387540A (zh) * 2019-08-30 2019-10-29 江苏上达电子有限公司 一种化锡槽内二价锡的补充系统及方法
CN111676470A (zh) * 2020-05-29 2020-09-18 广东天承科技有限公司 一种简易可溶性的高价锡的还原方法
CN114232030B (zh) * 2021-12-23 2023-04-18 广东鑫菱环境科技有限公司 一种pcb甲基磺酸退锡废液循环再生方法
WO2024116456A1 (fr) * 2022-11-28 2024-06-06 株式会社村田製作所 Procédé et dispositif de régénération de composition de placage
CN116288292A (zh) * 2023-03-20 2023-06-23 聂柱根 一种化学锡药水锡还原再生除铜装置
WO2025164402A1 (fr) * 2024-01-30 2025-08-07 株式会社村田製作所 Composition de placage et son procédé de production
WO2025169771A1 (fr) * 2024-02-06 2025-08-14 株式会社村田製作所 Procédé et appareil de production d'une composition de placage
WO2025249197A1 (fr) * 2024-05-30 2025-12-04 株式会社村田製作所 Procédé de production d'une composition de placage

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1527576A (en) * 1923-02-19 1925-02-24 Wheeling Steel & Iron Company Process of coating conducting materials with tin
US3784455A (en) * 1971-12-28 1974-01-08 Western Electric Co Methods of electrolytic regenerative etching and metal recovery
DE2401719B2 (de) * 1974-01-15 1978-01-19 Vereinigte Aluminium Werke Ag, 5300 Bonn Verfahren zur regenerierung und standzeiterhoehung von zinnhaltigen metallsalzloesungen, die zur elektrolytischen faerbung von anodisiertem aluminium unter einwirkung von wechselstrom eingesetzt werden
JPS5226315A (en) * 1975-08-25 1977-02-26 Fuji Photo Film Co Ltd Process for the recovery of silver from fixer
DE2742718C2 (de) * 1977-09-22 1984-04-19 ESTEL HOOGOVENS B.V., 1970 Ijmuiden Verfahren und Vorrichtung zur Regenerierung eines Verzinnungselektrolyten
US4432844A (en) * 1982-01-28 1984-02-21 Fujisash Company Process for regeneration of electrolyte containing tin salts by reducing the same
US4715894A (en) * 1985-08-29 1987-12-29 Techno Instruments Investments 1983 Ltd. Use of immersion tin and tin alloys as a bonding medium for multilayer circuits
DE3634710A1 (de) * 1986-10-11 1988-04-21 Ver Glaswerke Gmbh Vorrichtung zum vakuumbeschichten einer glasscheibe durch reaktive kathodenzerstaeubung
CA2083196C (fr) * 1991-11-27 1998-02-17 Randal D. King Procede pour prolonger la duree de vie d'un bain de galvanoplastie par jet mobile
JPH06256999A (ja) * 1993-03-05 1994-09-13 Kawasaki Steel Corp 錫めっき液を回収再生する方法
US6280596B1 (en) * 1995-05-23 2001-08-28 Weirton Steel Corporation Electrolytic tinplating of steel substrate and apparatus
US5705048A (en) * 1996-03-27 1998-01-06 Oxley Research, Inc. Apparatus and a process for regenerating a CUCl2 etchant
DE19719020A1 (de) * 1997-05-07 1998-11-12 Km Europa Metal Ag Verfahren und Vorrichtung zum Regenerieren von Verzinnungslösungen
US6251255B1 (en) * 1998-12-22 2001-06-26 Precision Process Equipment, Inc. Apparatus and method for electroplating tin with insoluble anodes
JP3455709B2 (ja) * 1999-04-06 2003-10-14 株式会社大和化成研究所 めっき方法とそれに用いるめっき液前駆体

Also Published As

Publication number Publication date
CN1232677C (zh) 2005-12-21
JP4157838B2 (ja) 2008-10-01
BR0210829B1 (pt) 2011-07-26
CA2450258A1 (fr) 2003-01-16
KR20040030725A (ko) 2004-04-09
AU2002321069A1 (en) 2003-01-21
DE60203050D1 (de) 2005-03-31
ES2236552T3 (es) 2005-07-16
HK1062926A1 (en) 2004-12-03
TWI279456B (en) 2007-04-21
US20040245108A1 (en) 2004-12-09
KR100827259B1 (ko) 2008-05-07
WO2003004725A2 (fr) 2003-01-16
EP1427869B1 (fr) 2005-02-23
DE10132478C1 (de) 2003-04-30
CN1524132A (zh) 2004-08-25
MXPA03011772A (es) 2004-04-02
DE60203050T2 (de) 2006-02-23
BR0210829A (pt) 2005-05-03
EP1427869A2 (fr) 2004-06-16
ATE289633T1 (de) 2005-03-15
WO2003004725A3 (fr) 2004-04-15
JP2004534151A (ja) 2004-11-11

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