MY153268A - Dresser for abrasive cloth - Google Patents

Dresser for abrasive cloth

Info

Publication number
MY153268A
MY153268A MYPI2010003221A MYPI20103221A MY153268A MY 153268 A MY153268 A MY 153268A MY PI2010003221 A MYPI2010003221 A MY PI2010003221A MY PI20103221 A MYPI20103221 A MY PI20103221A MY 153268 A MY153268 A MY 153268A
Authority
MY
Malaysia
Prior art keywords
dresser
abrasive
abrasive grains
center
grains
Prior art date
Application number
MYPI2010003221A
Inventor
Sakamoto Hiroaki
Kinoshita Toshiya
Original Assignee
Nippon Steel Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Materials Co Ltd filed Critical Nippon Steel Materials Co Ltd
Publication of MY153268A publication Critical patent/MY153268A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/06—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12—Dressing tools; Holders therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

THE INVENTION PROVIDES A DRESSER FOR AN ABRASIVE CLOTH, WHICH HAS A SMALLER ABRASIVE GRAIN DIAMETER THAN THE CONVENTIONAL DRESSER AND HAS AN ABRASIVE GRAIN SPACING REGULATED IN A PREDETERMINED RANGE DEPENDING UPON THE ABRASIVE GRAIN DIAMETER TO SIMULTANEOUSLY MEET A HIGH LEVEL OF PAD GRINDING POWER AND A PAD FLATNESS AND, AT THE SAME TIME, IS LESS LIKELY TO CAUSE DROPOUT OF ABRASIVE GRAINS. THE DRESSER COMPRISES A PLURALITY OF ABRASIVE GRAINS FIXED AS A SINGLE LAYER ON A SURFACE OF A METALLIC SUPPORT MATERIAL. THE DRESSER IS CHARACTERIZED IN THAT THE METALLIC SUPPORT MATERIAL ON ITS SURFACE ON WHICH THE ABRASIVE GRAINS ARE FIXED HAS A CONVEX SHAPE, THE DIFFERENCE IN HEIGHT BETWEEN THE END PART AND THE CENTRAL PORT ON THE SURFACE IS NOT LESS THAN 3µM AND NOT MORE THAN 40µM, AND THE CENTER-TO-CENTER SPACING BETWEEN AT LEAST ONE SET OF ADJACENT GRAINS IS D=L<2D WHEREIN D REPRESENTS THE DIAMETER OF THE ABRASIVE GRAINS; L REPRESENTS THE CENTER-TO-CENTER SPACING BETWEEN ADJACENT ABRASIVE GRAINS. THE DIAMETER (D) OF THE ABRASIVE GRAINS IS PREFERABLY 3µM=D<100µM.
MYPI2010003221A 2008-02-20 2008-10-28 Dresser for abrasive cloth MY153268A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008039218A JP5255860B2 (en) 2008-02-20 2008-02-20 Polishing cloth dresser

Publications (1)

Publication Number Publication Date
MY153268A true MY153268A (en) 2015-01-29

Family

ID=40985120

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2010003221A MY153268A (en) 2008-02-20 2008-10-28 Dresser for abrasive cloth

Country Status (5)

Country Link
US (1) US20100291844A1 (en)
JP (1) JP5255860B2 (en)
MY (1) MY153268A (en)
TW (1) TWI455794B (en)
WO (1) WO2009104224A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201246342A (en) * 2010-12-13 2012-11-16 Saint Gobain Abrasives Inc Chemical mechanical planarization (CMP) pad conditioner and method of making
TWI422466B (en) * 2011-01-28 2014-01-11 Advanced Surface Tech Inc Diamond abrasive tool and manufacturing method thereof
JP5809880B2 (en) * 2011-08-25 2015-11-11 新日鉄住金マテリアルズ株式会社 Polishing cloth dresser
CN105580077B (en) * 2013-09-30 2019-12-27 Hoya株式会社 Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk
JP6900523B2 (en) * 2015-09-07 2021-07-07 日鉄ケミカル＆マテリアル株式会社 Dresser for abrasive cloth
JP2017052019A (en) * 2015-09-07 2017-03-16 新日鉄住金マテリアルズ株式会社 Dresser for abrasive cloth
JP6666749B2 (en) * 2016-02-29 2020-03-18 日鉄ケミカル＆マテリアル株式会社 Dresser for polishing cloth
US11389928B2 (en) * 2017-11-30 2022-07-19 Taiwan Semiconductor Manufacturing Co., Ltd. Method for conditioning polishing pad
JP7309772B2 (en) * 2021-03-25 2023-07-18 株式会社ノリタケカンパニーリミテド rotary dresser

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AU4472997A (en) * 1996-10-15 1998-05-11 Nippon Steel Corporation Semiconductor substrate polishing pad dresser, method of manufacturing the same, and chemicomechanical polishing method using the same dresser
US7124753B2 (en) * 1997-04-04 2006-10-24 Chien-Min Sung Brazed diamond tools and methods for making the same
US20040112359A1 (en) * 1997-04-04 2004-06-17 Chien-Min Sung Brazed diamond tools and methods for making the same
US6368198B1 (en) * 1999-11-22 2002-04-09 Kinik Company Diamond grid CMP pad dresser
US9463552B2 (en) * 1997-04-04 2016-10-11 Chien-Min Sung Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods
US6884155B2 (en) * 1999-11-22 2005-04-26 Kinik Diamond grid CMP pad dresser
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JP3484686B2 (en) * 1998-10-13 2004-01-06 オムロン株式会社 Axle load measurement method and axle load measurement device
JP2000218512A (en) * 1999-01-28 2000-08-08 Osaka Diamond Ind Co Ltd Pad conditioner for CMP and method of manufacturing the same
JP2001018172A (en) * 1999-07-08 2001-01-23 Osaka Diamond Ind Co Ltd Tool for correcting polishing tools
JP2001025973A (en) * 1999-07-15 2001-01-30 Noritake Co Ltd Vitrified bond tool and its manufacturing method
TW412461B (en) * 1999-09-29 2000-11-21 Kinik Co Diamond disk for trimming wafer polishing pad and method for making the same
US7201645B2 (en) * 1999-11-22 2007-04-10 Chien-Min Sung Contoured CMP pad dresser and associated methods
JP3072991U (en) * 2000-02-24 2000-11-07 株式会社藤森技術研究所 Polishing dresser for polishing machine of chemical machine polisher
US7011134B2 (en) * 2000-10-13 2006-03-14 Chien-Min Sung Casting method for producing surface acoustic wave devices
US6814130B2 (en) * 2000-10-13 2004-11-09 Chien-Min Sung Methods of making diamond tools using reverse casting of chemical vapor deposition
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WO2002049807A1 (en) * 2000-12-21 2002-06-27 Nippon Steel Corporation Cmp conditioner, method for arranging rigid grains used for cmp conditioner, and method for manufacturing cmp conditioner
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US20060213128A1 (en) * 2002-09-24 2006-09-28 Chien-Min Sung Methods of maximizing retention of superabrasive particles in a metal matrix
JP3801551B2 (en) * 2002-10-11 2006-07-26 株式会社ノリタケスーパーアブレーシブ CMP pad conditioner
JP2006055944A (en) * 2004-08-20 2006-03-02 Allied Material Corp CMP pad conditioner
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US7258708B2 (en) * 2004-12-30 2007-08-21 Chien-Min Sung Chemical mechanical polishing pad dresser
JP2006305659A (en) * 2005-04-27 2006-11-09 Nippon Steel Corp Polishing cloth dresser
US20110275288A1 (en) * 2010-05-10 2011-11-10 Chien-Min Sung Cmp pad dressers with hybridized conditioning and related methods
US8622787B2 (en) * 2006-11-16 2014-01-07 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US8398466B2 (en) * 2006-11-16 2013-03-19 Chien-Min Sung CMP pad conditioners with mosaic abrasive segments and associated methods
US8393934B2 (en) * 2006-11-16 2013-03-12 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
JP4791121B2 (en) * 2005-09-22 2011-10-12 新日鉄マテリアルズ株式会社 Polishing cloth dresser
US20070128994A1 (en) * 2005-12-02 2007-06-07 Chien-Min Sung Electroplated abrasive tools, methods, and molds
JP5008969B2 (en) * 2006-01-31 2012-08-22 新日本製鐵株式会社 Alloy for liquid phase diffusion bonding
US20080014845A1 (en) * 2006-07-11 2008-01-17 Alpay Yilmaz Conditioning disk having uniform structures
CN102341215B (en) * 2009-03-24 2014-06-18 圣戈班磨料磨具有限公司 Abrasive tool for use as a chemical mechanical planarization pad conditioner

Also Published As

Publication number Publication date
TWI455794B (en) 2014-10-11
JP2009196025A (en) 2009-09-03
TW200936317A (en) 2009-09-01
JP5255860B2 (en) 2013-08-07
US20100291844A1 (en) 2010-11-18
WO2009104224A1 (en) 2009-08-27

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