MY179890A - Sputtering target for magnetic recording film formation and production method therefor - Google Patents

Sputtering target for magnetic recording film formation and production method therefor

Info

Publication number
MY179890A
MY179890A MYPI2017701004A MYPI2017701004A MY179890A MY 179890 A MY179890 A MY 179890A MY PI2017701004 A MYPI2017701004 A MY PI2017701004A MY PI2017701004 A MYPI2017701004 A MY PI2017701004A MY 179890 A MY179890 A MY 179890A
Authority
MY
Malaysia
Prior art keywords
sputtering target
magnetic recording
production method
film formation
recording film
Prior art date
Application number
MYPI2017701004A
Inventor
Shin-Ichi Ogino
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY179890A publication Critical patent/MY179890A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/04—Alloys based on a platinum group metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B22F3/15—Hot isostatic pressing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

An FePt-based sintered sputtering target containing C and/or BN, wherein an area ratio of AuCu alloy grains on a polished surface of a cross section that is perpendicular to a sputtered surface of the sputtering target is 0.5% or higher and 15% or less. An object of this invention is to provide a sputtering target capable of reducing the particles that are generated during sputtering and efficiently depositing a magnetic thin film of a magnetic recording medium.
MYPI2017701004A 2014-09-26 2015-09-18 Sputtering target for magnetic recording film formation and production method therefor MY179890A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014197407 2014-09-26

Publications (1)

Publication Number Publication Date
MY179890A true MY179890A (en) 2020-11-18

Family

ID=55581105

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2017701004A MY179890A (en) 2014-09-26 2015-09-18 Sputtering target for magnetic recording film formation and production method therefor

Country Status (5)

Country Link
JP (1) JP6084711B2 (en)
CN (2) CN107075665A (en)
MY (1) MY179890A (en)
SG (1) SG11201701838XA (en)
WO (1) WO2016047578A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11060180B2 (en) 2016-09-12 2021-07-13 Jx Nippon Mining & Metals Corporation Ferromagnetic material sputtering target
JP7057692B2 (en) * 2018-03-20 2022-04-20 田中貴金属工業株式会社 Fe-Pt-Oxide-BN-based sintered body for sputtering target
JP6878349B2 (en) * 2018-04-27 2021-05-26 田中貴金属工業株式会社 C-containing sputtering target and its manufacturing method
TWI702294B (en) * 2018-07-31 2020-08-21 日商田中貴金屬工業股份有限公司 Sputtering target for magnetic recording media
JP7104001B2 (en) * 2019-06-28 2022-07-20 田中貴金属工業株式会社 Fe-Pt-BN-based sputtering target and its manufacturing method
JP7267425B2 (en) * 2019-07-12 2023-05-01 田中貴金属工業株式会社 Fe-Pt-BN-based sputtering target and manufacturing method thereof

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012029331A1 (en) * 2010-09-03 2012-03-08 Jx日鉱日石金属株式会社 Ferromagnetic material sputtering target
MY164370A (en) * 2010-12-20 2017-12-15 Jx Nippon Mining & Metals Corp Fe-pt-based sputtering target with dispersed c grains
JP5041262B2 (en) * 2011-01-31 2012-10-03 三菱マテリアル株式会社 Sputtering target for forming a magnetic recording medium film and method for producing the same
JP5041261B2 (en) * 2011-01-31 2012-10-03 三菱マテリアル株式会社 Sputtering target for forming a magnetic recording medium film and method for producing the same
MY154754A (en) * 2011-03-30 2015-07-15 Jx Nippon Mining & Metals Corp Sputtering target for magnetic recording film
MY167394A (en) * 2011-12-22 2018-08-16 Jx Nippon Mining & Metals Corp C grain dispersed fe-pt-based sputtering target
JP5592022B2 (en) * 2012-06-18 2014-09-17 Ｊｘ日鉱日石金属株式会社 Sputtering target for magnetic recording film
SG11201404072YA (en) * 2012-07-20 2014-10-30 Jx Nippon Mining & Metals Corp Sputtering target for forming magnetic recording film and process for producing same
CN104246882B (en) * 2012-08-31 2018-01-12 吉坤日矿日石金属株式会社 Fe base magnetic material sintered bodies
JP5567227B1 (en) * 2012-09-21 2014-08-06 Ｊｘ日鉱日石金属株式会社 Sintered Fe-Pt magnetic material
JP6366095B2 (en) * 2014-07-29 2018-08-01 株式会社フルヤ金属 Sputtering target for magnetic recording media

Also Published As

Publication number Publication date
WO2016047578A1 (en) 2016-03-31
SG11201701838XA (en) 2017-04-27
JP6084711B2 (en) 2017-02-22
CN114959599A (en) 2022-08-30
JPWO2016047578A1 (en) 2017-04-27
CN107075665A (en) 2017-08-18

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