MY175409A - Sputtering target for magnetic recording film, and raw carbon material for use in producing same - Google Patents

Sputtering target for magnetic recording film, and raw carbon material for use in producing same

Info

Publication number
MY175409A
MY175409A MYPI2015703482A MYPI2015703482A MY175409A MY 175409 A MY175409 A MY 175409A MY PI2015703482 A MYPI2015703482 A MY PI2015703482A MY PI2015703482 A MYPI2015703482 A MY PI2015703482A MY 175409 A MY175409 A MY 175409A
Authority
MY
Malaysia
Prior art keywords
sputtering target
magnetic recording
carbon material
recording film
producing same
Prior art date
Application number
MYPI2015703482A
Inventor
Shin-Ichi Ogino
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY175409A publication Critical patent/MY175409A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

A sintered compact sputtering target configured from an alloy having a composition containing 5 to 60 mol% of Pt and remainder being Fe, and nonmagnetic materials dispersed in the alloy, wherein the nonmagnetic materials include at least C in an amount of 5 to 60 mol%, and an average grain area of C grains in a vertical cross section relative to a sputtering surface of the target is 50 I?m2 or more. The present invention aims to provide a sputtering target which enables the production of a magnetic thin film of a thermally assisted magnetic recording media without having to use an expensive cosputtering device, and the reduction in the amount of particles that are generated during sputtering.
MYPI2015703482A 2013-04-26 2014-04-24 Sputtering target for magnetic recording film, and raw carbon material for use in producing same MY175409A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013094300 2013-04-26

Publications (1)

Publication Number Publication Date
MY175409A true MY175409A (en) 2020-06-24

Family

ID=51791958

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015703482A MY175409A (en) 2013-04-26 2014-04-24 Sputtering target for magnetic recording film, and raw carbon material for use in producing same

Country Status (6)

Country Link
JP (1) JP5876155B2 (en)
CN (1) CN104955981B (en)
MY (1) MY175409A (en)
SG (1) SG11201506097YA (en)
TW (1) TWI595103B (en)
WO (1) WO2014175392A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201806891QA (en) * 2016-03-07 2018-09-27 Tanaka Precious Metal Ind Fept-c-based sputtering target
MY209580A (en) * 2019-11-01 2025-07-23 Univ Tohoku Sputtering target for heat-assisted magnetic recording medium
JP2025167928A (en) * 2024-04-26 2025-11-07 Ｊｘ金属株式会社 Sputtering targets and sputtering target assemblies
JP2025167926A (en) * 2024-04-26 2025-11-07 Ｊｘ金属株式会社 Sputtering targets and sputtering target assemblies
JP2025167932A (en) * 2024-04-26 2025-11-07 Ｊｘ金属株式会社 Sputtering targets and sputtering target assemblies
JP7483999B1 (en) 2023-09-22 2024-05-15 Ｊｘ金属株式会社 Sputtering targets and sputtering target assemblies
JP2025167930A (en) * 2024-04-26 2025-11-07 Ｊｘ金属株式会社 Sputtering targets and sputtering target assemblies

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000012020A (en) * 1998-06-23 2000-01-14 Nippon Steel Corp Carbon material for negative electrode of lithium secondary battery
US20070189916A1 (en) * 2002-07-23 2007-08-16 Heraeus Incorporated Sputtering targets and methods for fabricating sputtering targets having multiple materials
KR100470151B1 (en) * 2002-10-29 2005-02-05 한국과학기술원 HIGH-DENSITY MAGNETIC RECORDING MEDIA USING FePtC FILM AND MANUFACTURING METHOD THEREOF
JP5428561B2 (en) * 2009-06-16 2014-02-26 株式会社Ｇｓユアサ Direct fuel cell system and its operation stop method
JP5678414B2 (en) * 2009-06-17 2015-03-04 三菱化学株式会社 Graphite negative electrode material, method for producing the same, and negative electrode for lithium secondary battery and lithium secondary battery using the same
WO2012086335A1 (en) * 2010-12-20 2012-06-28 Jx日鉱日石金属株式会社 Fe-pt-based sputtering target with dispersed c particles
JP5912559B2 (en) * 2011-03-30 2016-04-27 田中貴金属工業株式会社 Method for producing FePt-C sputtering target
SG191134A1 (en) * 2011-03-30 2013-07-31 Jx Nippon Mining & Metals Corp Sputtering target for magnetic recording film
JP6037197B2 (en) * 2011-05-09 2016-12-07 三菱マテリアル株式会社 Sputtering target for forming a magnetic recording medium film and method for producing the same

Also Published As

Publication number Publication date
TWI595103B (en) 2017-08-11
CN104955981A (en) 2015-09-30
CN104955981B (en) 2018-01-23
JPWO2014175392A1 (en) 2017-02-23
SG11201506097YA (en) 2015-09-29
WO2014175392A1 (en) 2014-10-30
TW201508074A (en) 2015-03-01
JP5876155B2 (en) 2016-03-02

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