MY206287A - Dressing tool - Google Patents

Dressing tool

Info

Publication number
MY206287A
MY206287A MYPI2020001733A MYPI2020001733A MY206287A MY 206287 A MY206287 A MY 206287A MY PI2020001733 A MYPI2020001733 A MY PI2020001733A MY PI2020001733 A MYPI2020001733 A MY PI2020001733A MY 206287 A MY206287 A MY 206287A
Authority
MY
Malaysia
Prior art keywords
dressing
board
reverse side
dressing board
dressing tool
Prior art date
Application number
MYPI2020001733A
Inventor
Hoshikawa Hirotoshi
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of MY206287A publication Critical patent/MY206287A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12—Dressing tools; Holders therefor
    • B24B53/14—Dressing tools equipped with rotary rollers or cutters; Holders therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12—Dressing tools; Holders therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/02—Devices or means for dressing or conditioning abrasive surfaces of plane surfaces on abrasive tools

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)

Abstract

A dressing tool (2) for dressing an annular array of grinding stones (26) disposed on a surface of a grinding wheel (18) includes a dressing board (4) for dressing the grinding stones (26) and a support plate (6) supporting a reverse side (4b) of the dressing board (4). The reverse side (4b) of the dressing board (4) has a recess (8, 8a, 8b, 8c) defined therein that has a depth terminating short of a face side (4a) of the dressing board (4) that is opposite the reverse side (4b) thereof and corresponding to a usage-limit thickness of the dressing board (4). The most suitable drawing: Fig. 1A.
MYPI2020001733A 2019-04-15 2020-04-03 Dressing tool MY206287A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019076780A JP7317440B2 (en) 2019-04-15 2019-04-15 dressing tool

Publications (1)

Publication Number Publication Date
MY206287A true MY206287A (en) 2024-12-06

Family

ID=72613129

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2020001733A MY206287A (en) 2019-04-15 2020-04-03 Dressing tool

Country Status (8)

Country Link
US (1) US20200324387A1 (en)
JP (1) JP7317440B2 (en)
KR (1) KR102918826B1 (en)
CN (1) CN111823140B (en)
DE (1) DE102020204604A1 (en)
MY (1) MY206287A (en)
SG (1) SG10202002974UA (en)
TW (1) TWI834863B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7599780B2 (en) * 2020-12-16 2024-12-16 株式会社ディスコ Dressing Tools

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261568U (en) * 1988-10-27 1990-05-08
US6090475A (en) * 1996-05-24 2000-07-18 Micron Technology Inc. Polishing pad, methods of manufacturing and use
JPH10217109A (en) * 1997-02-04 1998-08-18 Nippon Steel Corp Polishing device holding device
JPH11151662A (en) * 1997-11-18 1999-06-08 Asahi Chem Ind Co Ltd Polishing cloth
JP3049921U (en) * 1997-12-18 1998-06-30 旭ダイヤモンド工業株式会社 Super abrasive wheel
US6106661A (en) * 1998-05-08 2000-08-22 Advanced Micro Devices, Inc. Polishing pad having a wear level indicator and system using the same
US20030199238A1 (en) * 2000-01-18 2003-10-23 Shigeo Moriyama Polishing apparatus and method for producing semiconductors using the apparatus
US6217426B1 (en) * 1999-04-06 2001-04-17 Applied Materials, Inc. CMP polishing pad
JP4154067B2 (en) 1999-04-06 2008-09-24 株式会社ディスコ Grinding equipment
US6616513B1 (en) * 2000-04-07 2003-09-09 Applied Materials, Inc. Grid relief in CMP polishing pad to accurately measure pad wear, pad profile and pad wear profile
JP2002001647A (en) * 2000-06-19 2002-01-08 Rodel Nitta Co Polishing pad
JP2003117816A (en) * 2001-10-03 2003-04-23 Hitachi Ltd Polishing pad repairing method, polishing pad repairing apparatus, and method for polishing workpiece using the same
JP2003205451A (en) * 2002-01-07 2003-07-22 Hitachi Ltd Polishing pad
JP4165118B2 (en) * 2002-05-14 2008-10-15 ソニー株式会社 Polishing apparatus, polishing member thickness detection method, and polishing member thickness detection apparatus
US6887138B2 (en) * 2003-06-20 2005-05-03 Freescale Semiconductor, Inc. Chemical mechanical polish (CMP) conditioning-disk holder
WO2006003697A1 (en) * 2004-06-30 2006-01-12 Toho Engineering Kabushiki Kaisha Grinding pad and method of producing the same
WO2006042010A1 (en) * 2004-10-06 2006-04-20 Rajeev Bajaj Method and apparatus for improved chemical mechanical planarization
KR101011788B1 (en) * 2004-11-01 2011-02-07 가부시키가이샤 에바라 세이사꾸쇼 Top ring, polishing device and polishing method
US20060276111A1 (en) * 2005-06-02 2006-12-07 Applied Materials, Inc. Conditioning element for electrochemical mechanical processing
US8607399B2 (en) * 2006-05-17 2013-12-17 Richard T. Umbrell Quick release connector for a single or dual-sided pad
JP5179158B2 (en) 2007-12-11 2013-04-10 株式会社ディスコ Dresser board
JP5236515B2 (en) * 2009-01-28 2013-07-17 株式会社荏原製作所 Dressing apparatus, chemical mechanical polishing apparatus and method
US20110097977A1 (en) * 2009-08-07 2011-04-28 Abrasive Technology, Inc. Multiple-sided cmp pad conditioning disk
JP5918254B2 (en) * 2010-11-18 2016-05-18 キャボット マイクロエレクトロニクス コーポレイション Polishing pad including permeable region
JP5919157B2 (en) * 2012-10-01 2016-05-18 株式会社荏原製作所 dresser
JP2014217935A (en) * 2013-05-10 2014-11-20 株式会社ディスコ Dressing tool
JP6234250B2 (en) * 2014-01-29 2017-11-22 株式会社ディスコ Dressing tools
CN106853610B (en) * 2015-12-08 2019-11-01 中芯国际集成电路制造(北京)有限公司 Polishing pad and its monitoring method and monitoring system
US11260495B2 (en) * 2018-07-27 2022-03-01 Taiwan Semiconductor Manufacturing Company Ltd. Apparatus and methods for chemical mechanical polishing

Also Published As

Publication number Publication date
SG10202002974UA (en) 2020-11-27
DE102020204604A1 (en) 2020-10-15
KR20200121232A (en) 2020-10-23
CN111823140B (en) 2024-02-20
KR102918826B1 (en) 2026-01-27
US20200324387A1 (en) 2020-10-15
CN111823140A (en) 2020-10-27
JP7317440B2 (en) 2023-07-31
TW202039156A (en) 2020-11-01
TWI834863B (en) 2024-03-11
JP2020172009A (en) 2020-10-22

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