NL193512C - Elektronenkanonsysteem met veldemissie. - Google Patents

Elektronenkanonsysteem met veldemissie. Download PDF

Info

Publication number
NL193512C
NL193512C NL8901517A NL8901517A NL193512C NL 193512 C NL193512 C NL 193512C NL 8901517 A NL8901517 A NL 8901517A NL 8901517 A NL8901517 A NL 8901517A NL 193512 C NL193512 C NL 193512C
Authority
NL
Netherlands
Prior art keywords
field emission
source
lens
voltage
electron
Prior art date
Application number
NL8901517A
Other languages
English (en)
Dutch (nl)
Other versions
NL193512B (nl
NL8901517A (nl
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of NL8901517A publication Critical patent/NL8901517A/nl
Publication of NL193512B publication Critical patent/NL193512B/xx
Application granted granted Critical
Publication of NL193512C publication Critical patent/NL193512C/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
NL8901517A 1988-06-17 1989-06-15 Elektronenkanonsysteem met veldemissie. NL193512C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP14810588 1988-06-17
JP63148105A JP2796305B2 (ja) 1988-06-17 1988-06-17 電界放射電子銃

Publications (3)

Publication Number Publication Date
NL8901517A NL8901517A (nl) 1990-01-16
NL193512B NL193512B (nl) 1999-08-02
NL193512C true NL193512C (nl) 1999-12-03

Family

ID=15445357

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8901517A NL193512C (nl) 1988-06-17 1989-06-15 Elektronenkanonsysteem met veldemissie.

Country Status (4)

Country Link
US (1) US4945247A (de)
JP (1) JP2796305B2 (de)
DE (1) DE3919829C2 (de)
NL (1) NL193512C (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5059859A (en) * 1989-04-14 1991-10-22 Hitachi, Ltd. Charged particle beam generating apparatus of multi-stage acceleration type
DE69125229T2 (de) * 1990-08-10 1997-08-28 Koninkl Philips Electronics Nv Ladungspartikelstrahlanordnung
JP3325982B2 (ja) * 1993-12-27 2002-09-17 株式会社東芝 磁界界浸型電子銃
SG74599A1 (en) * 1997-09-27 2000-08-22 Inst Of Material Res & Enginee Portable high resolution scanning electron microscope column using permanent magnet electron lenses
US6392333B1 (en) * 1999-03-05 2002-05-21 Applied Materials, Inc. Electron gun having magnetic collimator
US6797953B2 (en) * 2001-02-23 2004-09-28 Fei Company Electron beam system using multiple electron beams
US6828996B2 (en) 2001-06-22 2004-12-07 Applied Materials, Inc. Electron beam patterning with a heated electron source
JP5364462B2 (ja) * 2009-06-19 2013-12-11 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US8664622B2 (en) 2012-04-11 2014-03-04 Taiwan Semiconductor Manufacturing Co., Ltd. System and method of ion beam source for semiconductor ion implantation
JP5959326B2 (ja) * 2012-06-11 2016-08-02 株式会社日立ハイテクノロジーズ 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置
JP6647961B2 (ja) * 2016-05-11 2020-02-14 日本電子株式会社 電子顕微鏡および電子顕微鏡の制御方法
JP7008598B2 (ja) * 2017-09-07 2022-01-25 日本電子株式会社 電子銃および電子線装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1291221A (en) * 1968-07-07 1972-10-04 Smith Kenneth C A Electron probe forming system
GB1594465A (en) * 1977-03-23 1981-07-30 Nat Res Dev Electron beam apparatus
JPS5429075A (en) * 1977-08-09 1979-03-03 Fujitsu Ltd Reed switch
FR2527383A1 (fr) * 1982-05-24 1983-11-25 Univ Reims Champagne Ardenne Canon a electrons avec cathode a emission de champ et lentille magnetique
FR2550681B1 (fr) * 1983-08-12 1985-12-06 Centre Nat Rech Scient Source d'ions a au moins deux chambres d'ionisation, en particulier pour la formation de faisceaux d'ions chimiquement reactifs
DE3345573A1 (de) * 1983-12-16 1985-06-27 Wollnik, Hermann, Prof. Dr., 6301 Fernwald Einrichtung zur reduzierung des divergenzwinkels einer ionen- oder elektronenquelle
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
JPS6381743A (ja) * 1986-09-26 1988-04-12 Jeol Ltd 電界放射型電子銃

Also Published As

Publication number Publication date
DE3919829A1 (de) 1989-12-21
JP2796305B2 (ja) 1998-09-10
US4945247A (en) 1990-07-31
DE3919829C2 (de) 1994-11-03
JPH01319236A (ja) 1989-12-25
NL193512B (nl) 1999-08-02
NL8901517A (nl) 1990-01-16

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee

Effective date: 20080101