NL2000577A1 - Inrichting en werkwijze voor deeltjes bewaking in immersielithografie. - Google Patents

Inrichting en werkwijze voor deeltjes bewaking in immersielithografie.

Info

Publication number
NL2000577A1
NL2000577A1 NL2000577A NL2000577A NL2000577A1 NL 2000577 A1 NL2000577 A1 NL 2000577A1 NL 2000577 A NL2000577 A NL 2000577A NL 2000577 A NL2000577 A NL 2000577A NL 2000577 A1 NL2000577 A1 NL 2000577A1
Authority
NL
Netherlands
Prior art keywords
immersion lithography
particle monitoring
particle
monitoring
lithography
Prior art date
Application number
NL2000577A
Other languages
English (en)
Other versions
NL2000577C2 (nl
Inventor
Tzung-Chi Fu
Shu-Ping Hsu
Hsiu-Yu Chang
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Publication of NL2000577A1 publication Critical patent/NL2000577A1/nl
Application granted granted Critical
Publication of NL2000577C2 publication Critical patent/NL2000577C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2000577A 2006-05-17 2007-04-05 Inrichting en werkwijze voor deeltjes bewaking in immersielithografie. NL2000577C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US38391206 2006-05-17
US11/383,912 US7602471B2 (en) 2006-05-17 2006-05-17 Apparatus and method for particle monitoring in immersion lithography

Publications (2)

Publication Number Publication Date
NL2000577A1 true NL2000577A1 (nl) 2007-11-20
NL2000577C2 NL2000577C2 (nl) 2007-12-19

Family

ID=38711666

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2000577A NL2000577C2 (nl) 2006-05-17 2007-04-05 Inrichting en werkwijze voor deeltjes bewaking in immersielithografie.

Country Status (5)

Country Link
US (1) US7602471B2 (nl)
JP (2) JP2007311751A (nl)
CN (1) CN101075095B (nl)
NL (1) NL2000577C2 (nl)
TW (1) TWI344583B (nl)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
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US8068208B2 (en) 2006-12-01 2011-11-29 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for improving immersion scanner overlay performance
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JP4366407B2 (ja) * 2007-02-16 2009-11-18 キヤノン株式会社 露光装置及びデバイス製造方法
NL1035908A1 (nl) * 2007-09-25 2009-03-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
SG151198A1 (en) * 2007-09-27 2009-04-30 Asml Netherlands Bv Methods relating to immersion lithography and an immersion lithographic apparatus
NL1036766A1 (nl) * 2008-04-25 2009-10-27 Asml Netherlands Bv Methods relating to immersion lithography and an immersion lithographic apparatus.
NL2003392A (en) 2008-09-17 2010-03-18 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
JP5208807B2 (ja) * 2009-02-27 2013-06-12 株式会社日立国際電気 基板処理システム
JP2015529858A (ja) 2012-09-13 2015-10-08 ブランディーズ・ユニバーシティＢｒａｎｄｅｉｓ Ｕｎｉｖｅｒｓｉｔｙ 低温超分解能蛍光顕微鏡法および他の用途のための冷却システムおよび方法
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US11949203B2 (en) 2018-02-15 2024-04-02 Cymer, Llc Gas management system
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TW202439039A (zh) * 2023-03-21 2024-10-01 聯華電子股份有限公司 微影機台系統及其液體儲存槽的漏液檢測方法

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Also Published As

Publication number Publication date
US20070268469A1 (en) 2007-11-22
US7602471B2 (en) 2009-10-13
TWI344583B (en) 2011-07-01
JP2011035425A (ja) 2011-02-17
JP2007311751A (ja) 2007-11-29
TW200743913A (en) 2007-12-01
JP5202606B2 (ja) 2013-06-05
CN101075095B (zh) 2010-07-21
NL2000577C2 (nl) 2007-12-19
CN101075095A (zh) 2007-11-21

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