NL2023213A - A lithographic apparatus and cooling apparatus - Google Patents

A lithographic apparatus and cooling apparatus Download PDF

Info

Publication number: NL2023213A
Authority: NL; Netherlands
Prior art keywords: substrate; membrane; cooling; gas; cooling apparatus
Prior art date: 2018-07-05

Application number

NL2023213A

Other languages

English (en)

Dutch (nl)

Inventor

Taleban Fard Nafiseh

Auke Rinze Westerhuis Evert

Hendrik Koevoets Adrianus

Original Assignee

Asml Netherlands Bv

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2018-07-05

Filing date

2019-05-28

Publication date

2020-01-09

2019-05-28 Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv

2020-01-09 Publication of NL2023213A publication Critical patent/NL2023213A/en

Links

238000001816 cooling Methods 0.000 title abstract description 176
239000000758 substrate Substances 0.000 claims abstract description 120
239000012528 membrane Substances 0.000 abstract description 133
230000005855 radiation Effects 0.000 abstract description 56
239000007789 gas Substances 0.000 description 147
230000004888 barrier function Effects 0.000 description 27
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
230000008901 benefit Effects 0.000 description 13
239000000356 contaminant Substances 0.000 description 13
239000001257 hydrogen Substances 0.000 description 12
229910052739 hydrogen Inorganic materials 0.000 description 12
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 11
238000000034 method Methods 0.000 description 11
229910052757 nitrogen Inorganic materials 0.000 description 10
238000000926 separation method Methods 0.000 description 9
239000000463 material Substances 0.000 description 7
238000004140 cleaning Methods 0.000 description 6
230000006870 function Effects 0.000 description 6
238000000059 patterning Methods 0.000 description 6
238000010438 heat treatment Methods 0.000 description 5
238000005286 illumination Methods 0.000 description 5
230000003287 optical effect Effects 0.000 description 5
239000002245 particle Substances 0.000 description 4
230000009467 reduction Effects 0.000 description 4
230000032258 transport Effects 0.000 description 4
239000002253 acid Substances 0.000 description 3
239000012809 cooling fluid Substances 0.000 description 3
239000000112 cooling gas Substances 0.000 description 3
238000009826 distribution Methods 0.000 description 3
230000000694 effects Effects 0.000 description 3
239000001307 helium Substances 0.000 description 3
229910052734 helium Inorganic materials 0.000 description 3
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
239000011261 inert gas Substances 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
238000005086 pumping Methods 0.000 description 3
210000001747 pupil Anatomy 0.000 description 3
230000004308 accommodation Effects 0.000 description 2
150000007513 acids Chemical class 0.000 description 2
230000009471 action Effects 0.000 description 2
150000001412 amines Chemical class 0.000 description 2
230000008859 change Effects 0.000 description 2
230000003750 conditioning effect Effects 0.000 description 2
238000011109 contamination Methods 0.000 description 2
230000003247 decreasing effect Effects 0.000 description 2
239000012530 fluid Substances 0.000 description 2
230000007246 mechanism Effects 0.000 description 2
230000015654 memory Effects 0.000 description 2
230000003071 parasitic effect Effects 0.000 description 2
238000000206 photolithography Methods 0.000 description 2
238000003860 storage Methods 0.000 description 2
238000010521 absorption reaction Methods 0.000 description 1
230000009286 beneficial effect Effects 0.000 description 1
230000005540 biological transmission Effects 0.000 description 1
230000001143 conditioned effect Effects 0.000 description 1
238000010276 construction Methods 0.000 description 1
238000001514 detection method Methods 0.000 description 1
230000005670 electromagnetic radiation Effects 0.000 description 1
239000003574 free electron Substances 0.000 description 1
150000002431 hydrogen Chemical class 0.000 description 1
238000007689 inspection Methods 0.000 description 1
230000003993 interaction Effects 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
238000002955 isolation Methods 0.000 description 1
239000004973 liquid crystal related substance Substances 0.000 description 1
238000001459 lithography Methods 0.000 description 1
230000005381 magnetic domain Effects 0.000 description 1
230000004048 modification Effects 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000003472 neutralizing effect Effects 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
230000008569 process Effects 0.000 description 1
230000000644 propagated effect Effects 0.000 description 1
238000011084 recovery Methods 0.000 description 1
230000001629 suppression Effects 0.000 description 1
239000010409 thin film Substances 0.000 description 1
238000011144 upstream manufacturing Methods 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

Health & Medical Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Atmospheric Sciences (AREA)
Epidemiology (AREA)
Public Health (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Toxicology (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

NL2023213A 2018-07-05 2019-05-28 A lithographic apparatus and cooling apparatus NL2023213A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
EP18182013		2018-07-05

Publications (1)

Publication Number	Publication Date
NL2023213A true NL2023213A (en)	2020-01-09

Family

ID=62874692

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NL2023213A NL2023213A (en)	2018-07-05	2019-05-28	A lithographic apparatus and cooling apparatus

Country Status (3)

Country	Link
CN (1)	CN112384863B (fr)
NL (1)	NL2023213A (fr)
WO (1)	WO2020007533A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN117008423A (zh) *	2022-04-29	2023-11-07	上海微电子装备（集团）股份有限公司	光学镜片散热装置
WO2025056249A1 (fr) *	2023-09-15	2025-03-20	Asml Netherlands B.V.	Appareil lithographique et entonnoir de bouchon de gaz

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3127511B2 (ja) *	1991-09-19	2001-01-29	株式会社日立製作所	露光装置および半導体装置の製造方法
WO2002084406A1 (fr) *	2001-04-17	2002-10-24	Koninklijke Philips Electronics N.V.	Structure d'interface transparente euv
US20070024982A1 (en) *	2005-06-14	2007-02-01	Carl Zeiss Smt Ag	Imaging system for a microlithographic projection exposure system
NL2008250A (en) *	2011-03-08	2012-09-11	Asml Netherlands Bv	Lithographic apparatus and device manufacturing method.
JP6116128B2 (ja) *	2011-04-11	2017-04-19	エーエスエムエルネザーランズビー．ブイ．	リソグラフィ装置および方法
NL2011237A (en) *	2012-08-03	2014-02-04	Asml Netherlands Bv	Lithographic apparatus and method.
NL2013700A (en) *	2013-11-25	2015-05-27	Asml Netherlands Bv	An apparatus, a device and a device manufacturing method.
WO2016001351A1 (fr) *	2014-07-04	2016-01-07	Asml Netherlands B.V.	Membranes à utiliser dans un appareil lithographique et appareil lithographique comprenant une telle membrane
NL2019411A (en)	2016-09-02	2018-03-06	Asml Netherlands Bv	Lithographic Apparatus

2019
- 2019-05-28 WO PCT/EP2019/063706 patent/WO2020007533A1/fr not_active Ceased
- 2019-05-28 CN CN201980045146.9A patent/CN112384863B/zh active Active
- 2019-05-28 NL NL2023213A patent/NL2023213A/en unknown

Also Published As

Publication number	Publication date
CN112384863B (zh)	2024-12-24
WO2020007533A1 (fr)	2020-01-09
CN112384863A (zh)	2021-02-19

Publication	Publication Date	Title
CN100501572C (zh)	2009-06-17	光刻装置、照明系统以及碎屑捕集系统
JP5248664B2 (ja)	2013-07-31	流体ハンドリング構造体、液浸リソグラフィ装置用モジュールおよびデバイス製造方法
KR102141138B1 (ko)	2020-08-05	리소그래피 장치
US8917380B2 (en)	2014-12-23	Lithographic apparatus and method
TWI598697B (zh)	2017-09-11	用於微影裝置的基板支撐件及微影裝置
US9632437B2 (en)	2017-04-25	Lithography apparatus, method for lithography and stage system
NL2023213A (en)	2020-01-09	A lithographic apparatus and cooling apparatus
NL2014792A (en)	2016-03-31	Lithographic apparatus, method of transferring a substrate and device manufacturing method.
NL2015914A (en)	2016-09-29	Lithographic apparatus with a patterning device environment
JP2013098552A (ja)	2013-05-20	リソグラフィ装置およびデバイス製造方法
JP7667741B2 (ja)	2025-04-23	リソグラフィ装置に関する方法
US11226568B2 (en)	2022-01-18	Lithographic apparatus and method
NL2006615A (en)	2011-11-14	Fluid handling structure, lithographic apparatus and device manufacturing method.
JP6387421B2 (ja)	2018-09-05	リソグラフィ装置及びデバイス製造方法
US10095130B2 (en)	2018-10-09	Lithographic apparatus and method in a lithographic process
US11086239B2 (en)	2021-08-10	Cleaning device and method of cleaning
US20170160653A1 (en)	2017-06-08	Lithographic apparatus and device manufacturing method
JP2023550246A (ja)	2023-12-01	流体ハンドリングシステム、方法およびリソグラフィ装置
EP4163721A1 (fr)	2023-04-12	Chambre pour un système de projection d'un appareil lithographique, système de projection et appareil lithographique
US20240019790A1 (en)	2024-01-18	Gripper and lithographic apparatus comprising the gripper
EP4439177A1 (fr)	2024-10-02	Module et procédé de stockage de substrat
WO2023285041A1 (fr)	2023-01-19	Procédé et appareil de blindage
NL2014915A (en)	2016-03-31	A Lithographic Apparatus and a Method of Manufacturing a Lithographic Apparatus.
JP2024500207A (ja)	2024-01-05	流体ハンドリングシステム、方法およびリソグラフィ装置
NL2007628A (en)	2011-11-23	Lithographic apparatus and method.