NL7811683A - Werkwijze voor het vervaardigen van een halfgeleiderin- richting en halfgeleiderinrichting vervaardigd volgens deze werkwijze. - Google Patents

Werkwijze voor het vervaardigen van een halfgeleiderin- richting en halfgeleiderinrichting vervaardigd volgens deze werkwijze. Download PDF

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Publication number
NL7811683A
NL7811683A NL7811683A NL7811683A NL7811683A NL 7811683 A NL7811683 A NL 7811683A NL 7811683 A NL7811683 A NL 7811683A NL 7811683 A NL7811683 A NL 7811683A NL 7811683 A NL7811683 A NL 7811683A
Authority
NL
Netherlands
Prior art keywords
substrate
region
zinc
cadmium
diffusion
Prior art date
Application number
NL7811683A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL7811683A priority Critical patent/NL7811683A/nl
Priority to US06/091,428 priority patent/US4280858A/en
Priority to EP79200684A priority patent/EP0011898B1/fr
Priority to DE7979200684T priority patent/DE2961365D1/de
Priority to CA340,410A priority patent/CA1134062A/fr
Priority to JP54152154A priority patent/JPS6043655B2/ja
Publication of NL7811683A publication Critical patent/NL7811683A/nl

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01—Manufacture or treatment
    • H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/60—Impurity distributions or concentrations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/12—Diffusion of dopants within, into or out of semiconductor bodies or layers between a solid phase and a gaseous phase
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
    • H10P32/174—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being Group III-V material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/965—Shaped junction formation

Landscapes

  • Led Devices (AREA)
  • Light Receiving Elements (AREA)
  • Semiconductor Lasers (AREA)
  • Recrystallisation Techniques (AREA)
NL7811683A 1978-11-29 1978-11-29 Werkwijze voor het vervaardigen van een halfgeleiderin- richting en halfgeleiderinrichting vervaardigd volgens deze werkwijze. NL7811683A (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL7811683A NL7811683A (nl) 1978-11-29 1978-11-29 Werkwijze voor het vervaardigen van een halfgeleiderin- richting en halfgeleiderinrichting vervaardigd volgens deze werkwijze.
US06/091,428 US4280858A (en) 1978-11-29 1979-11-05 Method of manufacturing a semiconductor device by retarding the diffusion of zinc or cadmium into a device region
EP79200684A EP0011898B1 (fr) 1978-11-29 1979-11-21 Procédé de réalisation d'un dispositif semiconducteur
DE7979200684T DE2961365D1 (en) 1978-11-29 1979-11-21 Method of manufacturing a semiconductor device
CA340,410A CA1134062A (fr) 1978-11-29 1979-11-22 Semiconducteur fait par diffusion de zinc ou de cadmium
JP54152154A JPS6043655B2 (ja) 1978-11-29 1979-11-26 半導体装置の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL7811683A NL7811683A (nl) 1978-11-29 1978-11-29 Werkwijze voor het vervaardigen van een halfgeleiderin- richting en halfgeleiderinrichting vervaardigd volgens deze werkwijze.
NL7811683 1978-11-29

Publications (1)

Publication Number Publication Date
NL7811683A true NL7811683A (nl) 1980-06-02

Family

ID=19831962

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7811683A NL7811683A (nl) 1978-11-29 1978-11-29 Werkwijze voor het vervaardigen van een halfgeleiderin- richting en halfgeleiderinrichting vervaardigd volgens deze werkwijze.

Country Status (6)

Country Link
US (1) US4280858A (fr)
EP (1) EP0011898B1 (fr)
JP (1) JPS6043655B2 (fr)
CA (1) CA1134062A (fr)
DE (1) DE2961365D1 (fr)
NL (1) NL7811683A (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4377865A (en) * 1979-12-20 1983-03-22 Matsushita Electric Industrial Co., Ltd. Semiconductor laser
US4719497A (en) * 1984-06-15 1988-01-12 Hewlett-Packard Company High efficiency light-emitting diode
JPS61224387A (ja) * 1985-03-28 1986-10-06 Rikagaku Kenkyusho 半導体装置
US4755485A (en) * 1986-05-27 1988-07-05 Hewlett-Packard Company Method of making light-emitting diodes
NL8801631A (nl) * 1988-06-27 1990-01-16 Philips Nv Werkwijze voor het vervaardigen van een optoelektronische inrichting.
JPH02174272A (ja) * 1988-12-17 1990-07-05 Samsung Electron Co Ltd 発光ダイオードアレイの製造方法
JPH0582463A (ja) * 1991-03-25 1993-04-02 Mitsubishi Electric Corp Ｐ形不純物の拡散方法及び半導体レーザ
US5422872A (en) * 1993-03-08 1995-06-06 Maxoptix Corporation Telecentric rotary actuator in an optical recording system
JPH11220161A (ja) * 1998-01-30 1999-08-10 Oki Electric Ind Co Ltd 発光ダイオード及び発光ダイオードの製造方法
JP4022997B2 (ja) 1998-07-29 2007-12-19 住友電気工業株式会社 ３−５族化合物半導体結晶へのＺｎ拡散方法及び拡散装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1112411A (en) * 1965-01-21 1968-05-08 Mullard Ltd Improvements in and relating to semiconductor devices
GB1145121A (en) * 1965-07-30 1969-03-12 Associated Semiconductor Mft Improvements in and relating to transistors
US3920491A (en) * 1973-11-08 1975-11-18 Nippon Electric Co Method of fabricating a double heterostructure injection laser utilizing a stripe-shaped region
JPS5751276B2 (fr) * 1973-10-23 1982-11-01
FR2270753B1 (fr) 1974-05-09 1977-10-21 Radiotechnique Compelec
US3959808A (en) * 1974-09-19 1976-05-25 Northern Electric Company Limited Variable stripe width semiconductor laser
US4154630A (en) * 1975-01-07 1979-05-15 U.S. Philips Corporation Method of manufacturing semiconductor devices having isoelectronically built-in nitrogen and having the p-n junction formed subsequent to the deposition process
GB1531238A (en) * 1975-01-09 1978-11-08 Standard Telephones Cables Ltd Injection lasers
US4055443A (en) * 1975-06-19 1977-10-25 Jury Stepanovich Akimov Method for producing semiconductor matrix of light-emitting elements utilizing ion implantation and diffusion heating
US4132960A (en) * 1977-03-28 1979-01-02 Xerox Corporation Single longitudinal mode gaas/gaalas double heterostructure laser
GB1558642A (en) * 1977-04-01 1980-01-09 Standard Telephones Cables Ltd Injection lasers
US4183038A (en) * 1978-03-29 1980-01-08 Mitsubishi Denki Kabushiki Kaisha Semiconductor laser device

Also Published As

Publication number Publication date
DE2961365D1 (en) 1982-01-21
CA1134062A (fr) 1982-10-19
JPS5575218A (en) 1980-06-06
US4280858A (en) 1981-07-28
JPS6043655B2 (ja) 1985-09-30
EP0011898B1 (fr) 1981-11-18
EP0011898A1 (fr) 1980-06-11

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