NO20055165L - Amorft karbonlag for varmeveksler - Google Patents

Amorft karbonlag for varmeveksler

Info

Publication number
NO20055165L
NO20055165L NO20055165A NO20055165A NO20055165L NO 20055165 L NO20055165 L NO 20055165L NO 20055165 A NO20055165 A NO 20055165A NO 20055165 A NO20055165 A NO 20055165A NO 20055165 L NO20055165 L NO 20055165L
Authority
NO
Norway
Prior art keywords
heat exchanger
amorphous carbon
carbon layer
layer
heat
Prior art date
Application number
NO20055165A
Other languages
English (en)
Norwegian (no)
Inventor
Michael William Bradley
Original Assignee
Praxair Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Praxair Technology Inc filed Critical Praxair Technology Inc
Publication of NO20055165L publication Critical patent/NO20055165L/no

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F13/00—Arrangements for modifying heat-transfer, e.g. increasing, decreasing
    • F28F13/18—Arrangements for modifying heat-transfer, e.g. increasing, decreasing by applying coatings, e.g. radiation-absorbing, radiation-reflecting; by surface treatment, e.g. polishing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Carbon And Carbon Compounds (AREA)
NO20055165A 2003-04-10 2005-11-03 Amorft karbonlag for varmeveksler NO20055165L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/410,211 US20040200599A1 (en) 2003-04-10 2003-04-10 Amorphous carbon layer for heat exchangers and processes thereof
PCT/US2004/010619 WO2004092672A2 (en) 2003-04-10 2004-04-08 Amorphous carbon layer for heat exchangers

Publications (1)

Publication Number Publication Date
NO20055165L true NO20055165L (no) 2005-11-03

Family

ID=33130753

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20055165A NO20055165L (no) 2003-04-10 2005-11-03 Amorft karbonlag for varmeveksler

Country Status (7)

Country Link
US (1) US20040200599A1 (pt)
EP (1) EP1611405A2 (pt)
JP (1) JP2006526075A (pt)
CN (1) CN1802881A (pt)
BR (1) BRPI0409103A (pt)
NO (1) NO20055165L (pt)
WO (1) WO2004092672A2 (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4423989B2 (ja) * 2004-02-05 2010-03-03 トヨタ自動車株式会社 内燃機関の熱電発電装置
TWI268755B (en) * 2005-03-21 2006-12-11 Mitac Tech Corporation Chip heat dissipation system and manufacturing method and structure of heat exchange device thereof
US7352584B1 (en) 2005-05-10 2008-04-01 Chien-Min Sung Diamond-like carbon coated devices
CN1870863B (zh) * 2005-05-28 2011-06-08 鸿富锦精密工业（深圳）有限公司 便携式电子装置外壳及其制作方法
JP4735309B2 (ja) * 2006-02-10 2011-07-27 トヨタ自動車株式会社 耐キャビテーションエロージョン用部材及びその製造方法
CN100412228C (zh) * 2006-06-08 2008-08-20 哈尔滨工业大学 铝或铝合金基体表面离子注入与沉积复合强化处理方法
US7968473B2 (en) * 2006-11-03 2011-06-28 Applied Materials, Inc. Low temperature process for depositing a high extinction coefficient non-peeling optical absorber for a scanning laser surface anneal of implanted dopants
TW201020336A (en) * 2008-11-20 2010-06-01 Yu-Hsueh Lin Method for plating film on surface of heat dissipation module and film-plated heat dissipation module
CN101736312B (zh) * 2008-11-26 2012-11-21 林玉雪 散热模块的表面镀膜方法
WO2013058754A1 (en) * 2011-10-20 2013-04-25 Crucible Intellectual Property Llc Bulk amorphous alloy heat sink
DE102018101453A1 (de) * 2018-01-23 2019-07-25 Borgwarner Ludwigsburg Gmbh Heizvorrichtung und Verfahren zum Herstellung eines Heizstabes
WO2019145795A2 (en) 2018-01-26 2019-08-01 Cellink Ab Systems and methods for optical assessments of bioink printability
US11186736B2 (en) 2018-10-10 2021-11-30 Cellink Ab Double network bioinks
WO2020157077A2 (en) * 2019-01-28 2020-08-06 Cellink Ab A compact fluorescence microscope and a cell monitoring system
US11826951B2 (en) 2019-09-06 2023-11-28 Cellink Ab Temperature-controlled multi-material overprinting

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0344485A (ja) * 1989-07-12 1991-02-26 Matsushita Refrig Co Ltd 熱交換器用フィン材
US5031029A (en) * 1990-04-04 1991-07-09 International Business Machines Corporation Copper device and use thereof with semiconductor devices
DE59208893D1 (de) * 1992-01-23 1997-10-16 Siemens Ag Halbleitermodul mit hoher Isolations- und Wärmefähigkeit
US5840427A (en) * 1996-05-21 1998-11-24 Teledyne Industries Incorporated Method for making corrosion resistant electrical components
US6131533A (en) * 1996-08-15 2000-10-17 Citizen Watch Co., Ltd. Jig for forming hard carbon film over inner surface of guide bush using the jig
US5981000A (en) * 1997-10-14 1999-11-09 International Business Machines Corporation Method for fabricating a thermally stable diamond-like carbon film
US6301333B1 (en) * 1999-12-30 2001-10-09 Genvac Aerospace Corp. Process for coating amorphous carbon coating on to an x-ray target
US6713179B2 (en) * 2000-05-24 2004-03-30 Guardian Industries Corp. Hydrophilic DLC on substrate with UV exposure
JP2002228391A (ja) * 2001-01-30 2002-08-14 Daikin Ind Ltd フィン付き空気熱交換器
US6788841B2 (en) * 2002-01-16 2004-09-07 Genvac Corporation Diamond-like carbon heat sink for reflective optical switches and devices
US6891324B2 (en) * 2002-06-26 2005-05-10 Nanodynamics, Inc. Carbon-metal nano-composite materials for field emission cathodes and devices

Also Published As

Publication number Publication date
CN1802881A (zh) 2006-07-12
JP2006526075A (ja) 2006-11-16
BRPI0409103A (pt) 2006-04-04
EP1611405A2 (en) 2006-01-04
WO2004092672A2 (en) 2004-10-28
US20040200599A1 (en) 2004-10-14
WO2004092672A3 (en) 2004-12-23

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Legal Events

Date Code Title Description
FC2A Withdrawal, rejection or dismissal of laid open patent application