NO320887B1 - Elektrolytisk beleggingsfremgangsmate for dannelse av pletteringer av nikkel, kobolt, nikkellegeringer eller koboltlegeringer - Google Patents
Elektrolytisk beleggingsfremgangsmate for dannelse av pletteringer av nikkel, kobolt, nikkellegeringer eller koboltlegeringer Download PDFInfo
- Publication number
- NO320887B1 NO320887B1 NO19975769A NO975769A NO320887B1 NO 320887 B1 NO320887 B1 NO 320887B1 NO 19975769 A NO19975769 A NO 19975769A NO 975769 A NO975769 A NO 975769A NO 320887 B1 NO320887 B1 NO 320887B1
- Authority
- NO
- Norway
- Prior art keywords
- nickel
- current density
- cobalt
- milliseconds
- bath
- Prior art date
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 238000007747 plating Methods 0.000 title claims abstract description 43
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 24
- 229910017052 cobalt Inorganic materials 0.000 title claims abstract description 15
- 239000010941 cobalt Substances 0.000 title claims abstract description 15
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 title claims abstract description 15
- 229910000531 Co alloy Inorganic materials 0.000 title claims abstract description 8
- 229910000990 Ni alloy Inorganic materials 0.000 title claims abstract description 8
- 238000000576 coating method Methods 0.000 title description 4
- 238000000034 method Methods 0.000 claims abstract description 30
- 239000000654 additive Substances 0.000 claims abstract description 23
- 150000002790 naphthalenes Chemical class 0.000 claims abstract description 20
- 230000000996 additive effect Effects 0.000 claims abstract description 18
- 238000009713 electroplating Methods 0.000 claims abstract description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 6
- 230000000737 periodic effect Effects 0.000 claims abstract description 6
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 12
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 9
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 9
- 238000004070 electrodeposition Methods 0.000 claims description 8
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 8
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 5
- 125000001624 naphthyl group Chemical group 0.000 claims description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 4
- 238000006277 sulfonation reaction Methods 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical group OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 claims 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 10
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 239000004327 boric acid Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- XTEGVFVZDVNBPF-UHFFFAOYSA-N naphthalene-1,5-disulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1S(O)(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-N 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- WSGYTJNNHPZFKR-UHFFFAOYSA-N 3-hydroxypropanenitrile Chemical compound OCCC#N WSGYTJNNHPZFKR-UHFFFAOYSA-N 0.000 description 1
- 229910015853 MSO4 Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000010339 dilation Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 description 1
- ZPBSAMLXSQCSOX-UHFFFAOYSA-N naphthalene-1,3,6-trisulfonic acid Chemical compound OS(=O)(=O)C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 ZPBSAMLXSQCSOX-UHFFFAOYSA-N 0.000 description 1
- FEWNRIKJXAQRJJ-UHFFFAOYSA-N naphthalene-1,3,7-trisulfonic acid Chemical compound C1=C(S(O)(=O)=O)C=C(S(O)(=O)=O)C2=CC(S(=O)(=O)O)=CC=C21 FEWNRIKJXAQRJJ-UHFFFAOYSA-N 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DK199500706A DK172937B1 (da) | 1995-06-21 | 1995-06-21 | Galvanisk fremgangsmåde til dannelse af belægninger af nikkel, kobalt, nikkellegeringer eller kobaltlegeringer |
| PCT/DK1996/000270 WO1997000980A1 (en) | 1995-06-21 | 1996-06-20 | An electroplating method of forming platings of nickel, cobalt, nickel alloys or cobalt alloys |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| NO975769L NO975769L (no) | 1997-12-08 |
| NO975769D0 NO975769D0 (no) | 1997-12-08 |
| NO320887B1 true NO320887B1 (no) | 2006-02-06 |
Family
ID=8096605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO19975769A NO320887B1 (no) | 1995-06-21 | 1997-12-08 | Elektrolytisk beleggingsfremgangsmate for dannelse av pletteringer av nikkel, kobolt, nikkellegeringer eller koboltlegeringer |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6036833A (da) |
| EP (1) | EP0835335B1 (da) |
| JP (1) | JPH11507991A (da) |
| AT (1) | ATE184332T1 (da) |
| AU (1) | AU6188496A (da) |
| CA (1) | CA2224382C (da) |
| DE (1) | DE69604180T2 (da) |
| DK (1) | DK172937B1 (da) |
| ES (1) | ES2136421T3 (da) |
| GR (1) | GR3031549T3 (da) |
| NO (1) | NO320887B1 (da) |
| WO (1) | WO1997000980A1 (da) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1044776B1 (en) * | 1999-03-17 | 2002-07-24 | Sony DADC Austria AG | Nickel plating of a mould using pulsating current |
| JP3423702B2 (ja) | 2000-08-29 | 2003-07-07 | 創輝株式会社 | 金属めっき方法 |
| DE10061186C1 (de) * | 2000-12-07 | 2002-01-17 | Astrium Gmbh | Verfahren und Anordnung zur galvanischen Abscheidung von Nickel, Kobalt, Nickellegierungen oder Kobaltlegierungen mit periodischen Strompulsen und Verwendung des Verfahrens |
| JP4538959B2 (ja) * | 2001-01-22 | 2010-09-08 | 日立金属株式会社 | 希土類系永久磁石の電気Ｎｉめっき方法 |
| US6892002B2 (en) | 2001-03-29 | 2005-05-10 | Ibsen Photonics A/S | Stacked planar integrated optics and tool for fabricating same |
| US6724067B2 (en) | 2001-04-13 | 2004-04-20 | Anadigics, Inc. | Low stress thermal and electrical interconnects for heterojunction bipolar transistors |
| SE523309E (sv) * | 2001-06-15 | 2010-03-02 | Replisaurus Technologies Ab | Metod, elektrod och apparat för att skapa mikro- och nanostrukturer i ledande material genom mönstring med masterelektrod och elektrolyt |
| DE10259362A1 (de) * | 2002-12-18 | 2004-07-08 | Siemens Ag | Verfahren zum Abscheiden einer Legierung auf ein Substrat |
| GB0302222D0 (en) * | 2003-01-31 | 2003-03-05 | Univ Heriot Watt | Stencil manufacture |
| US7445697B2 (en) * | 2003-10-22 | 2008-11-04 | Nexx Systems, Inc. | Method and apparatus for fluid processing a workpiece |
| US7727366B2 (en) | 2003-10-22 | 2010-06-01 | Nexx Systems, Inc. | Balancing pressure to improve a fluid seal |
| US20050283993A1 (en) * | 2004-06-18 | 2005-12-29 | Qunwei Wu | Method and apparatus for fluid processing and drying a workpiece |
| US7329334B2 (en) * | 2004-09-16 | 2008-02-12 | Herdman Roderick D | Controlling the hardness of electrodeposited copper coatings by variation of current profile |
| CN100441748C (zh) * | 2004-10-26 | 2008-12-10 | 中国科学院兰州化学物理研究所 | 低应力、抗磨减摩梯度Ni-Co纳米合金镀层的制备方法 |
| JP4678194B2 (ja) * | 2005-02-02 | 2011-04-27 | 株式会社村田製作所 | 電子部品の製造方法、及び電子部品 |
| US7425255B2 (en) * | 2005-06-07 | 2008-09-16 | Massachusetts Institute Of Technology | Method for producing alloy deposits and controlling the nanostructure thereof using negative current pulsing electro-deposition |
| CA2619509C (en) | 2005-08-12 | 2015-01-06 | Modumetal, Llc. | Compositionally modulated composite materials and methods for making the same |
| US20070052105A1 (en) * | 2005-09-07 | 2007-03-08 | Rohm And Haas Electronic Materials Llc | Metal duplex method |
| US20100096850A1 (en) * | 2006-10-31 | 2010-04-22 | Massachusetts Institute Of Technology | Nanostructured alloy coated threaded metal surfaces and methods of producing same |
| US20090286103A1 (en) * | 2008-05-14 | 2009-11-19 | Xtalic Corporation | Coated articles and related methods |
| US20090283410A1 (en) * | 2008-05-14 | 2009-11-19 | Xtalic Corporation | Coated articles and related methods |
| CA2730229C (en) | 2008-07-07 | 2017-02-14 | John D. Whitaker | Property modulated materials and methods of making the same |
| US7951600B2 (en) | 2008-11-07 | 2011-05-31 | Xtalic Corporation | Electrodeposition baths, systems and methods |
| KR100917610B1 (ko) * | 2008-11-14 | 2009-09-17 | 한국에너지기술연구원 | 고체산화물 연료전지용 금속연결재의 코팅방법 |
| US8545994B2 (en) * | 2009-06-02 | 2013-10-01 | Integran Technologies Inc. | Electrodeposited metallic materials comprising cobalt |
| US8309233B2 (en) * | 2009-06-02 | 2012-11-13 | Integran Technologies, Inc. | Electrodeposited metallic-materials comprising cobalt on ferrous-alloy substrates |
| US8367217B2 (en) | 2009-06-02 | 2013-02-05 | Integran Technologies, Inc. | Electrodeposited metallic-materials comprising cobalt on iron-alloy substrates with enhanced fatigue performance |
| BRPI1010877B1 (pt) | 2009-06-08 | 2020-09-15 | Modumetal, Inc | Revestimento de multicamadas resistente à corrosão e método de eletrodeposição |
| US10030312B2 (en) * | 2009-10-14 | 2018-07-24 | Massachusetts Institute Of Technology | Electrodeposited alloys and methods of making same using power pulses |
| CA2806328C (en) | 2010-07-22 | 2019-01-22 | Modumetal Llc | Material and process for electrochemical deposition of nanolaminated brass alloys |
| US8425751B1 (en) | 2011-02-03 | 2013-04-23 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Systems and methods for the electrodeposition of a nickel-cobalt alloy |
| CA2905548C (en) | 2013-03-15 | 2022-04-26 | Modumetal, Inc. | Nanolaminate coatings |
| WO2014146117A2 (en) | 2013-03-15 | 2014-09-18 | Modumetal, Inc. | A method and apparatus for continuously applying nanolaminate metal coatings |
| BR112015022020A8 (pt) | 2013-03-15 | 2019-12-10 | Modumetal Inc | objeto ou revestimento e seu processo de fabricação |
| EA201500948A1 (ru) | 2013-03-15 | 2016-03-31 | Модьюметл, Инк. | Способ изготовления изделия и изделие, изготовленное вышеуказанным способом |
| BR112017005534A2 (pt) | 2014-09-18 | 2017-12-05 | Modumetal Inc | métodos de preparação de artigos por processos de eletrodeposição e fabricação aditiva |
| EP3194642A4 (en) | 2014-09-18 | 2018-07-04 | Modumetal, Inc. | A method and apparatus for continuously applying nanolaminate metal coatings |
| CN107109652B (zh) * | 2014-12-31 | 2021-01-26 | 依视路国际公司 | 用于对光学物品进行反射镜涂覆的方法 |
| US9777386B2 (en) * | 2015-03-19 | 2017-10-03 | Lam Research Corporation | Chemistry additives and process for cobalt film electrodeposition |
| CN105332029B (zh) * | 2015-10-28 | 2017-08-25 | 西安科技大学 | 一种导电耐蚀钴锰尖晶石涂层的制备方法 |
| RU2617470C1 (ru) * | 2015-12-28 | 2017-04-25 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университе имени Д. И. Менделеева (РХТУ им. Д. И. Менделеева) | Способ электроосаждения покрытий никель-фосфор |
| US11365488B2 (en) | 2016-09-08 | 2022-06-21 | Modumetal, Inc. | Processes for providing laminated coatings on workpieces, and articles made therefrom |
| TW201821649A (zh) | 2016-09-09 | 2018-06-16 | 美商馬杜合金股份有限公司 | 層合物與奈米層合物材料於工具及模製方法之應用 |
| WO2018053158A1 (en) | 2016-09-14 | 2018-03-22 | Modumetal, Inc. | System for reliable, high throughput, complex electric field generation, and method for producing coatings therefrom |
| EP3535118A1 (en) | 2016-11-02 | 2019-09-11 | Modumetal, Inc. | Topology optimized high interface packing structures |
| CA3057836A1 (en) | 2017-03-24 | 2018-09-27 | Modumetal, Inc. | Lift plungers with electrodeposited coatings, and systems and methods for producing the same |
| CA3060619A1 (en) | 2017-04-21 | 2018-10-25 | Modumetal, Inc. | Tubular articles with electrodeposited coatings, and systems and methods for producing the same |
| EP3784823A1 (en) | 2018-04-27 | 2021-03-03 | Modumetal, Inc. | Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL72938C (da) * | 1947-07-09 | |||
| US3437568A (en) * | 1966-07-18 | 1969-04-08 | Electro Optical Systems Inc | Apparatus and method for determining and controlling stress in an electroformed part |
| FR16632E (fr) * | 1969-05-07 | 1913-03-18 | Pestourie & Quentin Soc | Soupape d'échappement libre |
| US3726768A (en) * | 1971-04-23 | 1973-04-10 | Atomic Energy Commission | Nickel plating baths containing aromatic sulfonic acids |
| US3741234A (en) * | 1971-04-26 | 1973-06-26 | Liquid Controls Corp | Valve |
| NL8105150A (nl) * | 1981-11-13 | 1983-06-01 | Veco Beheer Bv | Werkwijze voor het vervaardigen van zeefmateriaal, verkregen zeefmateriaal, alsmede inrichting voor het uitvoeren van de werkwijze. |
| US5352266A (en) * | 1992-11-30 | 1994-10-04 | Queen'university At Kingston | Nanocrystalline metals and process of producing the same |
-
1995
- 1995-06-21 DK DK199500706A patent/DK172937B1/da not_active IP Right Cessation
-
1996
- 1996-06-20 US US08/973,556 patent/US6036833A/en not_active Expired - Lifetime
- 1996-06-20 CA CA002224382A patent/CA2224382C/en not_active Expired - Lifetime
- 1996-06-20 ES ES96920744T patent/ES2136421T3/es not_active Expired - Lifetime
- 1996-06-20 JP JP9503524A patent/JPH11507991A/ja active Pending
- 1996-06-20 EP EP96920744A patent/EP0835335B1/en not_active Expired - Lifetime
- 1996-06-20 AT AT96920744T patent/ATE184332T1/de active
- 1996-06-20 WO PCT/DK1996/000270 patent/WO1997000980A1/en not_active Ceased
- 1996-06-20 AU AU61884/96A patent/AU6188496A/en not_active Abandoned
- 1996-06-20 DE DE69604180T patent/DE69604180T2/de not_active Expired - Lifetime
-
1997
- 1997-12-08 NO NO19975769A patent/NO320887B1/no not_active IP Right Cessation
-
1999
- 1999-10-15 GR GR990402642T patent/GR3031549T3/el unknown
Also Published As
| Publication number | Publication date |
|---|---|
| ATE184332T1 (de) | 1999-09-15 |
| CA2224382A1 (en) | 1997-01-09 |
| AU6188496A (en) | 1997-01-22 |
| WO1997000980A1 (en) | 1997-01-09 |
| US6036833A (en) | 2000-03-14 |
| DE69604180T2 (de) | 2000-03-09 |
| EP0835335B1 (en) | 1999-09-08 |
| NO975769L (no) | 1997-12-08 |
| DE69604180D1 (de) | 1999-10-14 |
| DK172937B1 (da) | 1999-10-11 |
| DK70695A (da) | 1996-12-22 |
| EP0835335A1 (en) | 1998-04-15 |
| NO975769D0 (no) | 1997-12-08 |
| ES2136421T3 (es) | 1999-11-16 |
| JPH11507991A (ja) | 1999-07-13 |
| GR3031549T3 (en) | 2000-01-31 |
| CA2224382C (en) | 2005-07-19 |
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