NO902061L - Novolakkholdig fotoresist og anvendelse derav. - Google Patents

Novolakkholdig fotoresist og anvendelse derav.

Info

Publication number: NO902061L
Authority: NO; Norway
Prior art keywords: photoresists; highly branched; photoresist; negative; acting
Prior art date: 1989-05-12

Application number

NO90902061A

Other languages

English (en)

Norwegian (no)

Other versions

NO902061D0 (no

Inventor

Leonard Edward Bogan

Karen Ann Graziano

Original Assignee

Rohm & Haas

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-05-12

Filing date

1990-05-10

Publication date

1990-11-13

1990-05-10 Application filed by Rohm & Haas filed Critical Rohm & Haas

1990-05-10 Publication of NO902061D0 publication Critical patent/NO902061D0/no

1990-11-13 Publication of NO902061L publication Critical patent/NO902061L/no

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Phenolic Resins Or Amino Resins (AREA)
Materials For Photolithography (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

NO90902061A 1989-05-12 1990-05-10 Novolakkholdig fotoresist og anvendelse derav. NO902061L (no)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US35115389A	1989-05-12	1989-05-12

Publications (2)

Publication Number	Publication Date
NO902061D0 NO902061D0 (no)	1990-05-10
NO902061L true NO902061L (no)	1990-11-13

Family

ID=23379794

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO90902061A NO902061L (no)	1989-05-12	1990-05-10	Novolakkholdig fotoresist og anvendelse derav.

Country Status (11)

Country	Link
EP (1)	EP0397460A3 (de)
JP (1)	JPH0379619A (de)
KR (1)	KR900018186A (de)
CN (1)	CN1047398A (de)
AU (1)	AU635928B2 (de)
BR (1)	BR9002205A (de)
CA (1)	CA2015721A1 (de)
FI (1)	FI902375A7 (de)
IL (1)	IL94353A (de)
NO (1)	NO902061L (de)
ZA (1)	ZA903560B (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4939229A (en) *	1989-05-12	1990-07-03	Rohm And Haas Company	Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate
US5667934A (en) *	1990-10-09	1997-09-16	International Business Machines Corporation	Thermally stable photoimaging composition
TW207009B (de) *	1991-01-31	1993-06-01	Sumitomo Chemical Co
TWI263861B (en) *	1999-03-26	2006-10-11	Shinetsu Chemical Co	Resist material and pattern forming method
JP2002203869A (ja)	2000-10-30	2002-07-19	Seiko Epson Corp	バンプの形成方法、半導体装置及びその製造方法、回路基板並びに電子機器
US6828383B2 (en) *	2002-12-13	2004-12-07	Occidental Petroleum	Phenolic modified resorcinolic resins for rubber compounding
WO2022076984A1 (en) *	2020-10-05	2022-04-14	Advanced Polymer Coatings, Inc.	Process for preparing branched phenolic novolak

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS505084B1 (de) *	1970-09-16	1975-02-28
US4624909A (en) *	1984-04-27	1986-11-25	Nec Corporation	Silicon-containing novolak resin and resist material and pattern forming method using same
CA1307695C (en) *	1986-01-13	1992-09-22	Wayne Edmund Feely	Photosensitive compounds and thermally stable and aqueous developablenegative images
DE3810247A1 (de) *	1987-03-26	1988-10-06	Toshiba Kawasaki Kk	Lichtempfindliche beschichtungsmasse
US4939229A (en) *	1989-05-12	1990-07-03	Rohm And Haas Company	Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate

1990
- 1990-04-30 CA CA002015721A patent/CA2015721A1/en not_active Abandoned
- 1990-05-09 EP EP19900304971 patent/EP0397460A3/de not_active Withdrawn
- 1990-05-10 AU AU54882/90A patent/AU635928B2/en not_active Ceased
- 1990-05-10 IL IL9435390A patent/IL94353A/en not_active IP Right Cessation
- 1990-05-10 NO NO90902061A patent/NO902061L/no unknown
- 1990-05-10 ZA ZA903560A patent/ZA903560B/xx unknown
- 1990-05-11 KR KR1019900006666A patent/KR900018186A/ko not_active Ceased
- 1990-05-11 BR BR909002205A patent/BR9002205A/pt unknown
- 1990-05-11 JP JP2122782A patent/JPH0379619A/ja active Pending
- 1990-05-11 FI FI902375A patent/FI902375A7/fi not_active Application Discontinuation
- 1990-05-12 CN CN90102772A patent/CN1047398A/zh active Pending

Also Published As

Publication number	Publication date
IL94353A (en)	1994-02-27
FI902375A7 (fi)	1990-11-13
KR900018186A (ko)	1990-12-20
CA2015721A1 (en)	1990-11-12
CN1047398A (zh)	1990-11-28
NO902061D0 (no)	1990-05-10
EP0397460A2 (de)	1990-11-14
ZA903560B (en)	1991-01-30
JPH0379619A (ja)	1991-04-04
AU5488290A (en)	1990-11-15
BR9002205A (pt)	1991-08-13
IL94353A0 (en)	1991-03-10
FI902375A0 (fi)	1990-05-11
EP0397460A3 (de)	1992-02-26
AU635928B2 (en)	1993-04-08

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