NO932221D0 - Plasmareaktorhode og elektrodeenhet - Google Patents
Plasmareaktorhode og elektrodeenhetInfo
- Publication number
- NO932221D0 NO932221D0 NO932221A NO932221A NO932221D0 NO 932221 D0 NO932221 D0 NO 932221D0 NO 932221 A NO932221 A NO 932221A NO 932221 A NO932221 A NO 932221A NO 932221 D0 NO932221 D0 NO 932221D0
- Authority
- NO
- Norway
- Prior art keywords
- plasma
- electrode unit
- actor head
- actor
- head
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
- H01J37/32724—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US89980092A | 1992-06-17 | 1992-06-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NO932221D0 true NO932221D0 (no) | 1993-06-16 |
| NO932221L NO932221L (no) | 1993-12-20 |
Family
ID=25411582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO932221A NO932221L (no) | 1992-06-17 | 1993-06-16 | Plasmareaktorhode og elektrodeenhet |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0575126A1 (no) |
| JP (1) | JPH0730469B2 (no) |
| IL (1) | IL106017A0 (no) |
| NO (1) | NO932221L (no) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2001273536A1 (en) * | 2000-07-20 | 2002-02-05 | Tokyo Electron Limited | Automated electrode replacement apparatus for a plasma processing system |
| US6753498B2 (en) | 2000-07-20 | 2004-06-22 | Tokyo Electron Limited | Automated electrode replacement apparatus for a plasma processing system |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4534816A (en) * | 1984-06-22 | 1985-08-13 | International Business Machines Corporation | Single wafer plasma etch reactor |
| US5074456A (en) * | 1990-09-18 | 1991-12-24 | Lam Research Corporation | Composite electrode for plasma processes |
-
1993
- 1993-06-14 IL IL106017A patent/IL106017A0/xx unknown
- 1993-06-14 EP EP93304590A patent/EP0575126A1/en not_active Ceased
- 1993-06-16 NO NO932221A patent/NO932221L/no unknown
- 1993-06-17 JP JP5146521A patent/JPH0730469B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0575126A1 (en) | 1993-12-22 |
| JPH0657456A (ja) | 1994-03-01 |
| JPH0730469B2 (ja) | 1995-04-05 |
| NO932221L (no) | 1993-12-20 |
| IL106017A0 (en) | 1993-10-20 |
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