NO932221L - Plasmareaktorhode og elektrodeenhet - Google Patents

Plasmareaktorhode og elektrodeenhet

Info

Publication number
NO932221L
NO932221L NO932221A NO932221A NO932221L NO 932221 L NO932221 L NO 932221L NO 932221 A NO932221 A NO 932221A NO 932221 A NO932221 A NO 932221A NO 932221 L NO932221 L NO 932221L
Authority
NO
Norway
Prior art keywords
passage
electrode
plasma reactor
reactor head
extending
Prior art date
Application number
NO932221A
Other languages
English (en)
Other versions
NO932221D0 (no
Inventor
Eric Hansell
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of NO932221D0 publication Critical patent/NO932221D0/no
Publication of NO932221L publication Critical patent/NO932221L/no

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

Elektrode for plasmareaktorhodeenhet, fremgangsmåte for å konstruere en elektrode fra et plasmareaktorhode, samt en plasmareaktorhodeenhet. Det anvendes en sylindrisk elektrode (12) 1 reaktorenheten. Den sylindriske elektroden (12) har en øvre overflate (14) som strekker seg forbi vertikale vegger (15) for således å danne en flensopplagringsflate (16). En prosessgasspassasje (18) strekker seg fra den evre overflaten (14) ved innløpet (17) til et sentralt gjenger hulrom (19) som rager innover mot den øvre overflaten (14) fra en bunnflate (20). En rf-ledende gassdiffusor er skutt inn i hulrommet (19). En passasje (18) er dannet fra forbindelsen mellom den første vertikale passasjen (22) og en første horisontal passasje (24). En plugg (26) er sveiset fast over et hull som strekker seg fra den horisontale passasjen (24) for således å tilveiebringe kontinuerlig prosess-gass-strømpassasje som går fra innløpet (17) gjennom den første vertikale passasjen (22) til den horisontale passasjen (24) og til slutt til hulrommet (19). Elektroden (12) har en andre og tredje vertikal passasje (28) og (30) som er forbundet med en horisontal passasje (32) for således å danne en kjølepassasje (33) i elektroden som har et innløp (34) og et utløp. (36) som strekker seg fra toppflaten (14). Kjøle-passasjen tillater større spredning av varme og således en høyere rf-energi enn tidligere kjente V-sporformede kjølekanaler.
NO932221A 1992-06-17 1993-06-16 Plasmareaktorhode og elektrodeenhet NO932221L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US89980092A 1992-06-17 1992-06-17

Publications (2)

Publication Number Publication Date
NO932221D0 NO932221D0 (no) 1993-06-16
NO932221L true NO932221L (no) 1993-12-20

Family

ID=25411582

Family Applications (1)

Application Number Title Priority Date Filing Date
NO932221A NO932221L (no) 1992-06-17 1993-06-16 Plasmareaktorhode og elektrodeenhet

Country Status (4)

Country Link
EP (1) EP0575126A1 (no)
JP (1) JPH0730469B2 (no)
IL (1) IL106017A0 (no)
NO (1) NO932221L (no)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2001273536A1 (en) * 2000-07-20 2002-02-05 Tokyo Electron Limited Automated electrode replacement apparatus for a plasma processing system
US6753498B2 (en) 2000-07-20 2004-06-22 Tokyo Electron Limited Automated electrode replacement apparatus for a plasma processing system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4534816A (en) * 1984-06-22 1985-08-13 International Business Machines Corporation Single wafer plasma etch reactor
US5074456A (en) * 1990-09-18 1991-12-24 Lam Research Corporation Composite electrode for plasma processes

Also Published As

Publication number Publication date
EP0575126A1 (en) 1993-12-22
JPH0657456A (ja) 1994-03-01
NO932221D0 (no) 1993-06-16
JPH0730469B2 (ja) 1995-04-05
IL106017A0 (en) 1993-10-20

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