NO980918D0 - Substrat fastgjöringsapparat - Google Patents

Substrat fastgjöringsapparat

Info

Publication number: NO980918D0
Authority: NO; Norway
Prior art keywords: substrate fastener; fastener; substrate
Prior art date: 1995-09-06

Application number

NO980918A

Other languages

English (en)

Other versions

NO980918L (no

Inventor

Michael R Harms

Richard J Foss

Jennifer L Trice

Terence D Neavin

Original Assignee

Minnesota Mining & Mfg

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1995-09-06

Filing date

1998-03-03

Publication date

1998-03-03

1998-03-03 Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg

1998-03-03 Publication of NO980918D0 publication Critical patent/NO980918D0/no

1998-05-05 Publication of NO980918L publication Critical patent/NO980918L/no

Links

239000000758 substrate Substances 0.000 title 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)

NO980918A 1995-09-06 1998-03-03 Substrat fastgj÷ringsapparat NO980918L (no)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US08/524,340 US5589000A (en)	1995-09-06	1995-09-06	Fixture for deposition
PCT/US1996/013206 WO1997009462A1 (en)	1995-09-06	1996-08-12	Substrate fixture

Publications (2)

Publication Number	Publication Date
NO980918D0 true NO980918D0 (no)	1998-03-03
NO980918L NO980918L (no)	1998-05-05

Family

ID=24088780

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO980918A NO980918L (no)	1995-09-06	1998-03-03	Substrat fastgj÷ringsapparat

Country Status (9)

Country	Link
US (1)	US5589000A (no)
EP (1)	EP0848762A1 (no)
JP (1)	JPH11512485A (no)
KR (1)	KR19990044416A (no)
CN (1)	CN1195378A (no)
AU (1)	AU6724596A (no)
CA (1)	CA2230710A1 (no)
NO (1)	NO980918L (no)
WO (1)	WO1997009462A1 (no)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6321739B1 (en)	1999-04-16	2001-11-27	Micron Technology, Inc.	Film frame substrate fixture
EP1426977A1 (en) *	2002-10-25	2004-06-09	Agfa-Gevaert	Storage phosphor screen and preparation method
US20040081750A1 (en) *	2002-10-25	2004-04-29	Agfa-Gevaert	Storage phosphor screen and preparation method
JP4765328B2 (ja) *	2004-04-16	2011-09-07	東京エレクトロン株式会社	被処理体の処理装置
US7232694B2 (en) *	2004-09-28	2007-06-19	Advantech Global, Ltd.	System and method for active array temperature sensing and cooling
DE102009039305A1 (de) *	2009-08-31	2011-03-03	Pfm Medical Ag	Vorrichtung zum Kühlen pathologischer/histologischer Präparate
US20140356985A1 (en)	2013-06-03	2014-12-04	Lam Research Corporation	Temperature controlled substrate support assembly
US11133158B2 (en)	2013-06-10	2021-09-28	View, Inc.	Glass pallet for sputtering systems
US11688589B2 (en)	2013-06-10	2023-06-27	View, Inc.	Carrier with vertical grid for supporting substrates in coater
CN104404472B (zh) *	2014-11-29	2017-08-25	洛阳康耀电子有限公司	一种磁控溅射镀膜真空室温控门及应用方法
CN104928649B (zh) *	2015-04-20	2017-12-05	中国科学院上海微系统与信息技术研究所	局域供碳装置及局域供碳制备晶圆级石墨烯单晶的方法
AT519112B1 (de) *	2016-12-07	2018-04-15	Miba Gleitlager Austria Gmbh	Verfahren zum Beschichten eines Bauteils

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3636919A (en) *	1969-12-02	1972-01-25	Univ Ohio State	Apparatus for growing films
JPS4926908A (no) *	1972-07-12	1974-03-09
JPS5492241A (en) *	1977-12-28	1979-07-21	Canon Inc	Electrophotographic photoreceptor
DE2845131A1 (de) *	1978-10-17	1980-04-30	Leybold Heraeus Gmbh & Co Kg	Verfahren zum beschichten von waermeempfindlichen folien als substrate und substrathalter fuer die durchfuehrung des verfahrens
SU807201A1 (ru) *	1979-01-04	1981-02-23	Предприятие П/Я Г-4671	Способ получени электрографи-чЕСКиХ СлОЕВ
SU1095126A1 (ru) *	1982-06-23	1984-05-30	Специальное конструкторское бюро Всесоюзного института научной и технической информации	Способ получени электрофотографического носител
JPH0329959A (ja) *	1989-06-27	1991-02-07	Fuji Electric Co Ltd	電子写真用感光体の製造方法
DE59101826D1 (de) *	1990-04-20	1994-07-14	Balzers Hochvakuum	Vorrichtung zur Halterung und Kühlung nebeneinander angeordneter Werkstücke and Träger für mehrere Vorrichtungen.
JPH0456765A (ja) *	1990-06-27	1992-02-24	Hitachi Ltd	ウェハ温度制御方法
EP0484179B1 (en) *	1990-11-01	1996-03-27	Canon Kabushiki Kaisha	Wafer holding device in an exposure apparatus
JPH06283493A (ja) *	1993-03-29	1994-10-07	Dainippon Screen Mfg Co Ltd	基板冷却装置
JPH06330320A (ja) *	1993-05-21	1994-11-29	Matsushita Electric Ind Co Ltd	真空蒸着装置

1995
- 1995-09-06 US US08/524,340 patent/US5589000A/en not_active Expired - Fee Related
1996
- 1996-08-12 KR KR1019980701660A patent/KR19990044416A/ko not_active Withdrawn
- 1996-08-12 EP EP96927418A patent/EP0848762A1/en not_active Withdrawn
- 1996-08-12 CN CN96196699A patent/CN1195378A/zh active Pending
- 1996-08-12 WO PCT/US1996/013206 patent/WO1997009462A1/en not_active Ceased
- 1996-08-12 JP JP9511205A patent/JPH11512485A/ja active Pending
- 1996-08-12 CA CA002230710A patent/CA2230710A1/en not_active Abandoned
- 1996-08-12 AU AU67245/96A patent/AU6724596A/en not_active Abandoned
1998
- 1998-03-03 NO NO980918A patent/NO980918L/no unknown

Also Published As

Publication number	Publication date
KR19990044416A (ko)	1999-06-25
US5589000A (en)	1996-12-31
JPH11512485A (ja)	1999-10-26
CA2230710A1 (en)	1997-03-13
EP0848762A1 (en)	1998-06-24
CN1195378A (zh)	1998-10-07
NO980918L (no)	1998-05-05
AU6724596A (en)	1997-03-27
WO1997009462A1 (en)	1997-03-13

Publication	Publication Date	Title
DE69604132D1 (de)	1999-10-14	Beschichtetes Substrat
DE69625164D1 (de)	2003-01-16	Flächenhaftverschluss
DE69602931D1 (de)	1999-07-22	Befestiger
DE69533127D1 (de)	2004-07-15	Kühlkörper
DE59403364D1 (de)	1997-08-21	Metallbeschichtetes Substrat
DE69631098D1 (de)	2004-01-29	Halbleiterstrukturen
DE69625265D1 (de)	2003-01-23	Halbleiterstrukturen
DE59607688D1 (de)	2001-10-18	Befestigungselement
DE69620177D1 (de)	2002-05-02	Reflektierende halbleitersubstrate
DE69609779D1 (de)	2000-09-21	Flächenhaftverschluss
DE59609022D1 (de)	2002-05-08	Verbindungssubstrat
NL1002945C2 (nl)	1996-12-31	Gecoat substraat.
DE69619106D1 (de)	2002-03-21	Homogenes kühlsubstrat
DE69611885D1 (de)	2001-04-05	Verbindungselement
DE69606100D1 (de)	2000-02-17	Dotieren von kristallinen Substraten
NO954922D0 (no)	1995-12-05	AHUK - Isolerende laget
FR2767744B1 (fr)	2000-05-05	Substrat de formation d'image
ATA145596A (de)	2001-07-15	Befestigungselement
EP0725438A3 (en)	1997-02-12	Built-in capacity substrate
DE69805366D1 (de)	2002-06-20	Flächenhaftverschluss
KR970042259U (ko)	1997-07-29	체결구
KR970025846U (ko)	1997-06-20	웨이퍼 운반구
LT2325B (lt)	1993-12-15	Sarmines fosfatazes substratas
BR9704514A (pt)	1999-08-10	Substrato agrícola
DE59706536D1 (de)	2002-04-11	Pflanzsubstrat