PL2054539T3 - Sposób osadzania warstw chromowych jako twardych powłok chromowych, kąpiel galwanizacyjna oraz twarde powierzchnie chromowe - Google Patents

Sposób osadzania warstw chromowych jako twardych powłok chromowych, kąpiel galwanizacyjna oraz twarde powierzchnie chromowe

Info

Publication number
PL2054539T3
PL2054539T3 PL07786477T PL07786477T PL2054539T3 PL 2054539 T3 PL2054539 T3 PL 2054539T3 PL 07786477 T PL07786477 T PL 07786477T PL 07786477 T PL07786477 T PL 07786477T PL 2054539 T3 PL2054539 T3 PL 2054539T3
Authority
PL
Poland
Prior art keywords
hard
chrome
deposition
electroplating bath
chromium layers
Prior art date
Application number
PL07786477T
Other languages
English (en)
Inventor
Jens Bohnet
Martin Metzner
Herwig Krassnitzer
Karl Schermanz
Original Assignee
Fraunhofer Ges Forschung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Ges Forschung filed Critical Fraunhofer Ges Forschung
Publication of PL2054539T3 publication Critical patent/PL2054539T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826—Group VIB metal-base component
    • Y10T428/12847—Cr-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
PL07786477T 2006-08-01 2007-07-31 Sposób osadzania warstw chromowych jako twardych powłok chromowych, kąpiel galwanizacyjna oraz twarde powierzchnie chromowe PL2054539T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006035871A DE102006035871B3 (de) 2006-08-01 2006-08-01 Verfahren zur Abscheidung von Chromschichten als Hartverchromung, Galvanisierungsbad sowie hartverchromte Oberflächen und deren Verwendung
PCT/EP2007/006783 WO2008014987A2 (en) 2006-08-01 2007-07-31 Method for deposition of chromium layers as hard- chrome plating, electroplating bath and hard- chrome surfaces
EP07786477A EP2054539B1 (en) 2006-08-01 2007-07-31 Method for deposition of chromium layers as hard- chrome plating, electroplating bath and hard- chrome surfaces

Publications (1)

Publication Number Publication Date
PL2054539T3 true PL2054539T3 (pl) 2012-11-30

Family

ID=38800725

Family Applications (1)

Application Number Title Priority Date Filing Date
PL07786477T PL2054539T3 (pl) 2006-08-01 2007-07-31 Sposób osadzania warstw chromowych jako twardych powłok chromowych, kąpiel galwanizacyjna oraz twarde powierzchnie chromowe

Country Status (7)

Country Link
US (1) US20100075174A1 (pl)
EP (1) EP2054539B1 (pl)
JP (1) JP2009545669A (pl)
CN (1) CN101512047A (pl)
DE (1) DE102006035871B3 (pl)
PL (1) PL2054539T3 (pl)
WO (1) WO2008014987A2 (pl)

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DE102008050034B4 (de) * 2008-10-01 2013-02-21 Voestalpine Stahl Gmbh Verfahren zum elektrolytischen Abscheiden von Chrom und Chromlegierungen
IT1393140B1 (it) * 2009-03-17 2012-04-11 Nuovo Pignone Spa Metodo di produzione di un rivestimento protettivo per un componente di una turbomacchina, il componente stesso e la relativa macchina
KR101102471B1 (ko) * 2010-01-13 2012-01-05 한밭대학교 산학협력단 구리금속판에 저방사율 및 고흡수율의 친환경 블랙 황산크롬 도금액
KR101141723B1 (ko) 2010-01-13 2012-05-04 신양에너지 주식회사 구리금속판에 저방사율 및 고흡수율의 친환경 블랙황산크롬 도금 연속 자동 전착방법
KR101198353B1 (ko) * 2010-07-29 2012-11-09 한국기계연구원 3가크롬도금액 및 이를 이용한 도금방법
CA2809092A1 (en) * 2010-08-23 2012-03-01 Ohio University Selective catalytic reduction via electrolysis of urea
CN101967661A (zh) * 2010-10-26 2011-02-09 广东多正化工科技有限公司 一种三价铬电镀液
CA2853865C (en) 2011-10-30 2020-05-26 William Messner Multiple port distribution manifold
CN102443825B (zh) * 2011-12-07 2014-03-26 湖北振华化学股份有限公司 一种高浓度硫酸铬——氟化铵三价铬电镀液及其制备方法
CN105917030B (zh) 2014-01-15 2018-04-13 萨夫罗克有限公司 用于生成含有铬的多层涂层的方法和涂覆的物体
CN105917029B (zh) * 2014-01-15 2019-05-28 萨夫罗克有限公司 用于生产铬涂层的方法和涂覆的物体
EP2899299A1 (en) 2014-01-24 2015-07-29 COVENTYA S.p.A. Electroplating bath containing trivalent chromium and process for depositing chromium
WO2016005651A1 (en) 2014-07-11 2016-01-14 Savroc Ltd A chromium-containing coating, a method for its production and a coated object
DE102014116717A1 (de) 2014-11-14 2016-05-19 Maschinenfabrik Kaspar Walter Gmbh & Co Kg Elektrolyt und Verfahren zur Herstellung von Chromschichten
DE102015202910A1 (de) 2015-02-18 2016-08-18 Dr.-Ing. Max Schlötter GmbH & Co KG Zinn-Nickel-Schicht mit hoher Härte
CN107313078A (zh) * 2016-04-27 2017-11-03 中国科学院金属研究所 一种三价铬电镀溶液及其制备方法
US11686005B1 (en) 2022-01-28 2023-06-27 Applied Materials, Inc. Electroplating systems and methods with increased metal ion concentrations
DE102022121557A1 (de) 2022-08-25 2024-03-07 Maschinenfabrik Kaspar Walter Gmbh & Co Kg Verfahren zur steuerung der chromzufuhr in einem elektrolyseverfahren zur herstellung von chromschichten sowie eine elektrolysezelle hierfür
EP4570965A1 (de) 2023-12-15 2025-06-18 topocrom systems AG Vorrichtung und verfahren zur galvanischen chrom-abscheidung
DE102024131083A1 (de) 2024-10-24 2026-04-30 Hartchrom Beck GmbH Galvanikvorrichtung und Verfahren zur Abscheidung einer Galvanikschicht sowie Werkstück mit einer Galvanikschicht

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Also Published As

Publication number Publication date
DE102006035871B3 (de) 2008-03-27
WO2008014987A2 (en) 2008-02-07
WO2008014987A3 (en) 2008-07-10
CN101512047A (zh) 2009-08-19
JP2009545669A (ja) 2009-12-24
US20100075174A1 (en) 2010-03-25
EP2054539A2 (en) 2009-05-06
EP2054539B1 (en) 2012-05-30

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