PL2409317T3 - Urządzenie do obróbki próżniowej - Google Patents
Urządzenie do obróbki próżniowejInfo
- Publication number
- PL2409317T3 PL2409317T3 PL10714592T PL10714592T PL2409317T3 PL 2409317 T3 PL2409317 T3 PL 2409317T3 PL 10714592 T PL10714592 T PL 10714592T PL 10714592 T PL10714592 T PL 10714592T PL 2409317 T3 PL2409317 T3 PL 2409317T3
- Authority
- PL
- Poland
- Prior art keywords
- treatment apparatus
- vacuum treatment
- vacuum
- treatment
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
- H10P72/3222—Loading to or unloading from a conveyor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
- H10P72/0466—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the construction of the load-lock chamber
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
- H10P72/0468—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
- H10P72/3302—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
- H10P72/3306—Horizontal transfer of a single workpiece
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
- H10P72/3308—Vertical transfer of a single workpiece
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16108409P | 2009-03-18 | 2009-03-18 | |
| EP10714592.2A EP2409317B8 (en) | 2009-03-18 | 2010-03-11 | Vacuum treatment apparatus |
| PCT/EP2010/053140 WO2010105967A2 (en) | 2009-03-18 | 2010-03-11 | Vacuum treatment apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL2409317T3 true PL2409317T3 (pl) | 2014-06-30 |
Family
ID=42740047
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL10714592T PL2409317T3 (pl) | 2009-03-18 | 2010-03-11 | Urządzenie do obróbki próżniowej |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8870513B2 (pl) |
| EP (1) | EP2409317B8 (pl) |
| KR (4) | KR102027108B1 (pl) |
| CN (1) | CN102356459B (pl) |
| ES (1) | ES2450118T3 (pl) |
| MY (1) | MY157637A (pl) |
| PL (1) | PL2409317T3 (pl) |
| TW (1) | TWI553765B (pl) |
| WO (1) | WO2010105967A2 (pl) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8210761B2 (en) * | 2008-06-26 | 2012-07-03 | Elc Management Llc | Cosmetic package with integrally molded wiper |
| KR102027108B1 (ko) * | 2009-03-18 | 2019-10-01 | 에바텍 아크티엔게젤샤프트 | 진공처리 장치 |
| GB0912385D0 (en) | 2009-07-16 | 2009-08-26 | Syngenta Ltd | Novel herbicides |
| EP2659506B1 (en) | 2010-12-29 | 2021-08-25 | Evatec AG | Vacuum treatment apparatus and a method for manufacturing |
| TW201327712A (zh) * | 2011-11-01 | 2013-07-01 | 因特瓦克公司 | 以電漿處理太陽能電池晶圓之系統架構 |
| EP3069189A1 (en) | 2013-11-14 | 2016-09-21 | Oerlikon Advanced Technologies AG | Apparatus and process for annealing of anti-fingerprint coatings |
| CN105917019A (zh) * | 2014-02-04 | 2016-08-31 | 应用材料公司 | 用于有机材料的蒸发源、具有用于有机材料的蒸发源的设备、具有带有用于有机材料的蒸发源的蒸发沉积设备的系统以及用于操作用于有机材料的蒸发源的方法 |
| US9502275B1 (en) * | 2015-10-20 | 2016-11-22 | Lam Research Corporation | Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs |
| CN109804309B (zh) * | 2016-07-29 | 2022-09-02 | 分子印记公司 | 微光刻中的基板加载 |
| KR102263614B1 (ko) | 2016-11-03 | 2021-06-09 | 몰레큘러 임프린츠 인코퍼레이티드 | 기판 로딩 시스템 |
| KR20200037824A (ko) | 2017-07-27 | 2020-04-09 | 에바텍 아크티엔게젤샤프트 | 투과 장벽 |
| KR102493257B1 (ko) | 2017-10-19 | 2023-01-30 | 에바텍 아크티엔게젤샤프트 | 기판을 처리하기 위한 방법 및 장치 |
| US10998209B2 (en) | 2019-05-31 | 2021-05-04 | Applied Materials, Inc. | Substrate processing platforms including multiple processing chambers |
| US11249338B2 (en) * | 2019-07-08 | 2022-02-15 | Rockwell Collins, Inc. | Flexible to rigid integrated laminator |
| KR20230028761A (ko) | 2020-06-17 | 2023-03-02 | 에바텍 아크티엔게젤샤프트 | 진공 처리 장치 |
| US12080571B2 (en) | 2020-07-08 | 2024-09-03 | Applied Materials, Inc. | Substrate processing module and method of moving a workpiece |
| US11749542B2 (en) | 2020-07-27 | 2023-09-05 | Applied Materials, Inc. | Apparatus, system, and method for non-contact temperature monitoring of substrate supports |
| US11817331B2 (en) | 2020-07-27 | 2023-11-14 | Applied Materials, Inc. | Substrate holder replacement with protective disk during pasting process |
| US11600507B2 (en) | 2020-09-09 | 2023-03-07 | Applied Materials, Inc. | Pedestal assembly for a substrate processing chamber |
| US11610799B2 (en) | 2020-09-18 | 2023-03-21 | Applied Materials, Inc. | Electrostatic chuck having a heating and chucking capabilities |
| US12195314B2 (en) | 2021-02-02 | 2025-01-14 | Applied Materials, Inc. | Cathode exchange mechanism to improve preventative maintenance time for cluster system |
| US11674227B2 (en) | 2021-02-03 | 2023-06-13 | Applied Materials, Inc. | Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure |
| US12002668B2 (en) | 2021-06-25 | 2024-06-04 | Applied Materials, Inc. | Thermal management hardware for uniform temperature control for enhanced bake-out for cluster tool |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1281579A (en) * | 1917-01-18 | 1918-10-15 | William H Johnson | Tributary-feeder control. |
| US1846009A (en) * | 1928-02-17 | 1932-02-16 | White Cap Co | Apparatus for handling receptacles |
| US2888131A (en) * | 1954-07-27 | 1959-05-26 | Owens Illinois Glass Co | Article transfer mechanism |
| US3563170A (en) * | 1968-04-16 | 1971-02-16 | Reynolds Metals Co | Machine for marking the exterior cylindrical surfaces of cans in a continous nonidexing manner |
| US3712450A (en) * | 1970-12-18 | 1973-01-23 | Ball Corp | Method for handling articles |
| CH573985A5 (pl) * | 1973-11-22 | 1976-03-31 | Balzers Patent Beteilig Ag | |
| DE3827343A1 (de) * | 1988-08-12 | 1990-02-15 | Leybold Ag | Vorrichtung nach dem karussel-prinzip zum beschichten von substraten |
| FR2644567A1 (fr) * | 1989-03-17 | 1990-09-21 | Etudes Const Mecaniques | Dispositif pour l'execution de traitements thermiques enchaines en continu sous vide |
| FR2648119B1 (fr) * | 1989-06-09 | 1991-09-27 | Girondine Sa | Dispositif de transport de recipients, tels que des bouteilles |
| JP2884753B2 (ja) * | 1990-09-25 | 1999-04-19 | 日新電機株式会社 | イオン処理装置 |
| JPH04298060A (ja) * | 1991-03-26 | 1992-10-21 | Tokyo Electron Ltd | ウエハの位置合わせ装置 |
| DE4127341C2 (de) * | 1991-08-19 | 2000-03-09 | Leybold Ag | Vorrichtung zum selbsttätigen Gießen, Beschichten, Lackieren, Prüfen und Sortieren von Werkstücken |
| CH691377A5 (de) * | 1992-10-06 | 2001-07-13 | Unaxis Balzers Ag | Kammeranordnung für den Transport von Werkstücken und deren Verwendung. |
| DE4340522A1 (de) * | 1993-11-29 | 1995-06-01 | Leybold Ag | Vorrichtung und Verfahren zum schrittweisen und automatischen Be- und Entladen einer Beschichtungsanlage |
| DE19514037C2 (de) | 1995-04-13 | 1997-09-04 | Leybold Ag | Transportvorrichtung |
| JP3354761B2 (ja) * | 1995-08-30 | 2002-12-09 | オリジン電気株式会社 | ディスク用被膜形成装置 |
| US6702540B2 (en) | 1995-11-27 | 2004-03-09 | M2 Engineering Ab | Machine and method for manufacturing compact discs |
| US5863170A (en) * | 1996-04-16 | 1999-01-26 | Gasonics International | Modular process system |
| US6082950A (en) * | 1996-11-18 | 2000-07-04 | Applied Materials, Inc. | Front end wafer staging with wafer cassette turntables and on-the-fly wafer center finding |
| WO1999028951A2 (en) * | 1997-11-28 | 1999-06-10 | Mattson Technology, Inc. | Systems and methods for low contamination, high throughput handling of workpieces for vacuum processing |
| TW444275B (en) * | 1998-01-13 | 2001-07-01 | Toshiba Corp | Processing device, laser annealing device, laser annealing method, manufacturing device and substrate manufacturing device for panel display |
| DE19835154A1 (de) * | 1998-08-04 | 2000-02-10 | Leybold Systems Gmbh | Vorrichtung zur Beschichtung von Substraten in einer Vakuumkammer |
| US6244811B1 (en) * | 1999-06-29 | 2001-06-12 | Lam Research Corporation | Atmospheric wafer transfer module with nest for wafer transport robot |
| US7066703B2 (en) * | 1999-09-29 | 2006-06-27 | Tokyo Electron Limited | Chuck transport method and system |
| JP2008013851A (ja) * | 2000-04-27 | 2008-01-24 | Ebara Corp | 回転保持装置及び半導体基板処理装置 |
| EP1319243A2 (en) * | 2000-09-15 | 2003-06-18 | Applied Materials, Inc. | Double dual slot load lock for process equipment |
| US7010388B2 (en) | 2003-05-22 | 2006-03-07 | Axcelis Technologies, Inc. | Work-piece treatment system having load lock and buffer |
| US7207766B2 (en) * | 2003-10-20 | 2007-04-24 | Applied Materials, Inc. | Load lock chamber for large area substrate processing system |
| DE602005006160T2 (de) * | 2004-12-23 | 2009-07-02 | CROWN Packaging Technology, Inc, Alsip | Handhabungseinrichtung für mehrstufigen prozess |
| TWI476855B (zh) | 2006-05-03 | 2015-03-11 | 吉恩股份有限公司 | 基板傳輸設備、和使用該設備的高速基板處理系統 |
| KR100818044B1 (ko) * | 2006-05-04 | 2008-03-31 | 위순임 | 기판 지지대와 기판 반송 장치 및 이를 이용한 기판 처리시스템 |
| US20080075563A1 (en) * | 2006-09-27 | 2008-03-27 | Mclane James R | Substrate handling system and method |
| JP2008153353A (ja) * | 2006-12-15 | 2008-07-03 | Olympus Corp | 基板搬送装置及び基板検査装置 |
| KR102027108B1 (ko) * | 2009-03-18 | 2019-10-01 | 에바텍 아크티엔게젤샤프트 | 진공처리 장치 |
-
2010
- 2010-03-11 KR KR1020167032429A patent/KR102027108B1/ko active Active
- 2010-03-11 ES ES10714592.2T patent/ES2450118T3/es active Active
- 2010-03-11 PL PL10714592T patent/PL2409317T3/pl unknown
- 2010-03-11 MY MYPI2011004398A patent/MY157637A/en unknown
- 2010-03-11 US US13/257,001 patent/US8870513B2/en active Active
- 2010-03-11 CN CN201080012308.8A patent/CN102356459B/zh active Active
- 2010-03-11 KR KR1020197027996A patent/KR102103477B1/ko active Active
- 2010-03-11 KR KR1020207011015A patent/KR102298893B1/ko active Active
- 2010-03-11 WO PCT/EP2010/053140 patent/WO2010105967A2/en not_active Ceased
- 2010-03-11 EP EP10714592.2A patent/EP2409317B8/en active Active
- 2010-03-11 KR KR1020117024531A patent/KR101680295B1/ko active Active
- 2010-03-16 TW TW099107570A patent/TWI553765B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010105967A2 (en) | 2010-09-23 |
| ES2450118T3 (es) | 2014-03-24 |
| EP2409317B8 (en) | 2014-02-19 |
| EP2409317B1 (en) | 2013-12-11 |
| EP2409317A2 (en) | 2012-01-25 |
| KR102103477B1 (ko) | 2020-06-01 |
| CN102356459B (zh) | 2014-05-14 |
| TWI553765B (zh) | 2016-10-11 |
| TW201113972A (en) | 2011-04-16 |
| US8870513B2 (en) | 2014-10-28 |
| KR20110128943A (ko) | 2011-11-30 |
| MY157637A (en) | 2016-07-15 |
| KR101680295B1 (ko) | 2016-11-29 |
| KR20200044131A (ko) | 2020-04-28 |
| KR102027108B1 (ko) | 2019-10-01 |
| KR20190111164A (ko) | 2019-10-01 |
| WO2010105967A3 (en) | 2011-05-26 |
| KR20160137660A (ko) | 2016-11-30 |
| US20120003064A1 (en) | 2012-01-05 |
| KR102298893B1 (ko) | 2021-09-08 |
| CN102356459A (zh) | 2012-02-15 |
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