PL2417279T3 - Target na bazie molibdenu i sposób wytwarzania targetu metodą napylania termicznego - Google Patents

Target na bazie molibdenu i sposób wytwarzania targetu metodą napylania termicznego

Info

Publication number
PL2417279T3
PL2417279T3 PL10723659T PL10723659T PL2417279T3 PL 2417279 T3 PL2417279 T3 PL 2417279T3 PL 10723659 T PL10723659 T PL 10723659T PL 10723659 T PL10723659 T PL 10723659T PL 2417279 T3 PL2417279 T3 PL 2417279T3
Authority
PL
Poland
Prior art keywords
target
molybdenum
production method
thermal projection
target based
Prior art date
Application number
PL10723659T
Other languages
English (en)
Inventor
Dominique Billieres
Original Assignee
Saint-Gobain Coating Solutions
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40984826&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL2417279(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Saint-Gobain Coating Solutions filed Critical Saint-Gobain Coating Solutions
Publication of PL2417279T3 publication Critical patent/PL2417279T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0682—Silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/067—Metallic material containing free particles of non-metal elements, e.g. carbon, silicon, boron, phosphorus or arsenic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/08—Metallic material containing only metal elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/137—Spraying in vacuum or in an inert atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Powder Metallurgy (AREA)
  • Furnace Housings, Linings, Walls, And Ceilings (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
PL10723659T 2009-04-10 2010-04-12 Target na bazie molibdenu i sposób wytwarzania targetu metodą napylania termicznego PL2417279T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0952392A FR2944295B1 (fr) 2009-04-10 2009-04-10 Cible a base de molybdene et procede d'elaboration par projection thermique d'une cible
EP10723659.8A EP2417279B1 (fr) 2009-04-10 2010-04-12 Cible à base de molybdène et procédé d'élaboration par projection thermique d'une cible
PCT/FR2010/050703 WO2010116111A1 (fr) 2009-04-10 2010-04-12 Cible à base de molybdène et procédé d'élaboration par projection thermique d'une cible

Publications (1)

Publication Number Publication Date
PL2417279T3 true PL2417279T3 (pl) 2021-03-08

Family

ID=40984826

Family Applications (1)

Application Number Title Priority Date Filing Date
PL10723659T PL2417279T3 (pl) 2009-04-10 2010-04-12 Target na bazie molibdenu i sposób wytwarzania targetu metodą napylania termicznego

Country Status (17)

Country Link
US (1) US9951413B2 (pl)
EP (1) EP2417279B1 (pl)
JP (1) JP5667163B2 (pl)
KR (1) KR101754430B1 (pl)
CN (2) CN102388159A (pl)
AU (1) AU2010233525B2 (pl)
BR (1) BRPI1010508B1 (pl)
CA (1) CA2757900C (pl)
EA (1) EA027665B1 (pl)
ES (1) ES2823762T3 (pl)
FR (1) FR2944295B1 (pl)
MX (1) MX2011010585A (pl)
MY (1) MY156266A (pl)
PL (1) PL2417279T3 (pl)
SG (1) SG175159A1 (pl)
UA (1) UA108472C2 (pl)
WO (1) WO2010116111A1 (pl)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT12292U3 (de) * 2011-10-18 2013-03-15 Plansee Se Rohrtarget
KR101309648B1 (ko) 2011-12-27 2013-09-17 재단법인 포항산업과학연구원 Ｒｆ 플라즈마를 이용한 몰리브덴 금속타겟 제조방법
CA2861581C (en) 2011-12-30 2021-05-04 Scoperta, Inc. Coating compositions
KR101600169B1 (ko) * 2013-03-12 2016-03-04 히타치 긴조쿠 가부시키가이샤 전자 부품용 금속 박막 및 금속 박막 형성용 Mo 합금 스퍼터링 타깃재
CN103774101A (zh) * 2014-02-14 2014-05-07 山东昊轩电子陶瓷材料有限公司 超低氧含量热喷涂管靶及其制备方法
CN104946950A (zh) * 2015-06-10 2015-09-30 深圳市威勒达科技开发有限公司 一种钒钨合金靶材及其制备方法
CN104894449A (zh) * 2015-06-10 2015-09-09 深圳市威勒达科技开发有限公司 一种钒钼合金靶材及其制备方法
MX2018002635A (es) 2015-09-04 2019-02-07 Scoperta Inc Aleaciones resistentes al desgaste sin cromo y bajas en cromo.
CN106567048B (zh) * 2016-11-10 2018-11-27 洛阳科威钨钼有限公司 一种大型高纯钼合金旋转靶材的制造方法
CN106555094A (zh) * 2016-11-24 2017-04-05 苏州华意铭铄激光科技有限公司 一种航空航天用高温复合结构件
US11286172B2 (en) 2017-02-24 2022-03-29 BWXT Isotope Technology Group, Inc. Metal-molybdate and method for making the same
WO2018173517A1 (ja) * 2017-03-23 2018-09-27 三井金属鉱業株式会社 スパッタリングターゲット及びその製造方法
CA3095046A1 (en) 2018-03-29 2019-10-03 Oerlikon Metco (Us) Inc. Reduced carbides ferrous alloys
EP3870727A1 (en) 2018-10-26 2021-09-01 Oerlikon Metco (US) Inc. Corrosion and wear resistant nickel based alloys
CN113631750A (zh) 2019-03-28 2021-11-09 欧瑞康美科（美国）公司 用于涂布发动机气缸孔的热喷涂铁基合金
CA3136967A1 (en) 2019-05-03 2020-11-12 Oerlikon Metco (Us) Inc. Powder feedstock for wear resistant bulk welding configured to optimize manufacturability
KR102870036B1 (ko) 2019-07-09 2025-10-13 오를리콘 메트코 (유에스) 아이엔씨. 내마모성 및 내부식성을 위해 설계된 철 기반 합금
CN110453127B (zh) * 2019-09-09 2020-07-10 安泰天龙钨钼科技有限公司 一种多元复合强化钼合金及其制备方法
JP2021048239A (ja) * 2019-09-18 2021-03-25 キオクシア株式会社 半導体装置およびその製造方法
TWI704236B (zh) * 2019-10-24 2020-09-11 光洋應用材料科技股份有限公司 鉬合金靶材及其製法及鉬合金層
CN111304610A (zh) * 2020-03-19 2020-06-19 河北宏靶科技有限公司 一种钛硅钼合金靶材及其制备方法
CN113174573A (zh) * 2021-04-29 2021-07-27 宁波江丰电子材料股份有限公司 一种钼钛合金靶坯的制备方法
JP2024043784A (ja) * 2022-09-20 2024-04-02 日本製鉄株式会社 摺動部品及び摺動部品の製造方法
PL445255A1 (pl) 2023-06-17 2024-12-23 Sieć Badawcza Łukasiewicz - Poznański Instytut Technologiczny Sposób wytwarzania wieloskładnikowej tarczy do rozpylania magnetronowego i zestaw narzędziowy do wytwarzania wieloskładnikowej tarczy oraz wieloskładnikowa tarcza magnetronowa i jej zastosowanie do wytwarzania powłoki ochronnej

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4356073A (en) 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4619697A (en) * 1984-08-30 1986-10-28 Mitsubishi Kinzoku Kabushiki Kaisha Sputtering target material and process for producing the same
JPS6167768A (ja) * 1984-09-12 1986-04-07 Hitachi Ltd スパツタタ−ゲツト
US4750932A (en) * 1985-04-15 1988-06-14 Gte Products Corporation Refractory metal silicide sputtering target
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
DE4031489A1 (de) * 1990-10-05 1992-04-09 Ver Glaswerke Gmbh Verfahren zum beschichten von glasscheiben mit hilfe eines thermischen spritzverfahrens
JPH06122956A (ja) * 1992-10-13 1994-05-06 Matsushita Electric Ind Co Ltd プラズマ溶射方法及び溶射製膜装置
DE4339345C2 (de) * 1993-11-18 1995-08-24 Difk Deutsches Inst Fuer Feuer Verfahren zum Auftragen einer Hartstoffschicht mittels Plasmaspritzen
JPH0820863A (ja) * 1995-06-12 1996-01-23 Toshiba Corp シリサイド膜およびその膜を使用した半導体装置
EP0960955A1 (en) 1998-05-26 1999-12-01 Universiteit Gent Method and apparatus for flame spraying to form a tough coating
JP2000064033A (ja) * 1998-08-19 2000-02-29 Tokyo Tungsten Co Ltd スパッタリングターゲット
JP2003342720A (ja) * 2002-05-20 2003-12-03 Nippon Steel Corp スパッタリング用モリブデンターゲットの製造方法及びモリブデンターゲット
JP4637819B2 (ja) * 2003-02-24 2011-02-23 テクナ・プラズマ・システムズ・インコーポレーテッド スパッタリングターゲットを製造するための方法および装置
US20050230244A1 (en) * 2004-03-31 2005-10-20 Hitachi Metals, Ltd Sputter target material and method of producing the same
US20050279630A1 (en) * 2004-06-16 2005-12-22 Dynamic Machine Works, Inc. Tubular sputtering targets and methods of flowforming the same
US8088232B2 (en) 2004-08-31 2012-01-03 H.C. Starck Inc. Molybdenum tubular sputtering targets with uniform grain size and texture
US20060042728A1 (en) 2004-08-31 2006-03-02 Brad Lemon Molybdenum sputtering targets
JP4851700B2 (ja) * 2004-09-30 2012-01-11 株式会社東芝 真空成膜装置用部品及び真空成膜装置
WO2006041730A2 (en) 2004-10-07 2006-04-20 Atmel Corporation Method and system for a programming approach for a nonvolatile electronic device
FR2881757B1 (fr) * 2005-02-08 2007-03-30 Saint Gobain Procede d'elaboration par projection thermique d'une cible a base de silicium et de zirconium
AU2006243448B2 (en) 2005-05-05 2011-09-01 H.C. Starck Inc. Coating process for manufacture or reprocessing of sputter targets and X-ray anodes
JP4479006B2 (ja) * 2005-07-28 2010-06-09 セイコーエプソン株式会社 半導体装置の製造方法
JP2009538986A (ja) * 2006-06-02 2009-11-12 ベーカート・アドヴァンスト・コーティングス 回転可能なスパッタターゲット
US20080078268A1 (en) * 2006-10-03 2008-04-03 H.C. Starck Inc. Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof
US8293035B2 (en) * 2006-10-12 2012-10-23 Air Products And Chemicals, Inc. Treatment method, system and product
US8197894B2 (en) * 2007-05-04 2012-06-12 H.C. Starck Gmbh Methods of forming sputtering targets
JP4894008B2 (ja) * 2007-05-09 2012-03-07 日立金属株式会社 ＭｏＮｂ系焼結スパッタリングターゲット材の製造方法
FR2944293B1 (fr) * 2009-04-10 2012-05-18 Saint Gobain Coating Solutions Procede d'elaboration par projection thermique d'une cible

Also Published As

Publication number Publication date
EA027665B1 (ru) 2017-08-31
EP2417279B1 (fr) 2020-07-22
AU2010233525B2 (en) 2016-05-19
CN102388159A (zh) 2012-03-21
JP2012523497A (ja) 2012-10-04
KR101754430B1 (ko) 2017-07-05
EA201171235A1 (ru) 2012-05-30
JP5667163B2 (ja) 2015-02-12
AU2010233525A1 (en) 2011-11-17
CN107083528A (zh) 2017-08-22
MX2011010585A (es) 2012-01-25
CA2757900C (fr) 2014-09-30
EP2417279A1 (fr) 2012-02-15
US20120063947A1 (en) 2012-03-15
FR2944295A1 (fr) 2010-10-15
MY156266A (en) 2016-01-29
ES2823762T3 (es) 2021-05-10
KR20120023604A (ko) 2012-03-13
WO2010116111A1 (fr) 2010-10-14
US9951413B2 (en) 2018-04-24
SG175159A1 (en) 2011-11-28
BRPI1010508A2 (pt) 2016-03-15
CA2757900A1 (fr) 2010-10-14
BRPI1010508B1 (pt) 2020-04-07
UA108472C2 (en) 2015-05-12
FR2944295B1 (fr) 2014-08-15

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