PL2585622T3 - Źródło odparowania łukowego o określonym polu elektrycznym - Google Patents
Źródło odparowania łukowego o określonym polu elektrycznymInfo
- Publication number
- PL2585622T3 PL2585622T3 PL11727116T PL11727116T PL2585622T3 PL 2585622 T3 PL2585622 T3 PL 2585622T3 PL 11727116 T PL11727116 T PL 11727116T PL 11727116 T PL11727116 T PL 11727116T PL 2585622 T3 PL2585622 T3 PL 2585622T3
- Authority
- PL
- Poland
- Prior art keywords
- electric field
- deposition source
- arc deposition
- defined electric
- arc
- Prior art date
Links
- 230000008021 deposition Effects 0.000 title 1
- 230000005684 electric field Effects 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0089—Reactive sputtering in metallic mode
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US35727210P | 2010-06-22 | 2010-06-22 | |
| EP11727116.3A EP2585622B1 (de) | 2010-06-22 | 2011-06-03 | Arc-verdampfungsquelle mit definiertem elektrischem feld |
| PCT/EP2011/002734 WO2011160766A1 (de) | 2010-06-22 | 2011-06-03 | Arc-verdampfungsquelle mit definiertem elektrischem feld |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL2585622T3 true PL2585622T3 (pl) | 2018-07-31 |
Family
ID=44487011
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL11727116T PL2585622T3 (pl) | 2010-06-22 | 2011-06-03 | Źródło odparowania łukowego o określonym polu elektrycznym |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US10253407B2 (pl) |
| EP (1) | EP2585622B1 (pl) |
| JP (1) | JP6095568B2 (pl) |
| KR (1) | KR101854936B1 (pl) |
| CN (1) | CN102947478B (pl) |
| BR (1) | BR112012033065B1 (pl) |
| CA (1) | CA2803087C (pl) |
| ES (1) | ES2666234T3 (pl) |
| HU (1) | HUE038729T2 (pl) |
| MX (1) | MX361608B (pl) |
| MY (1) | MY170012A (pl) |
| PL (1) | PL2585622T3 (pl) |
| PT (1) | PT2585622T (pl) |
| SG (1) | SG186722A1 (pl) |
| SI (1) | SI2585622T1 (pl) |
| TW (1) | TWI553132B (pl) |
| WO (1) | WO2011160766A1 (pl) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2726648B1 (en) | 2011-06-30 | 2019-09-11 | Oerlikon Surface Solutions AG, Pfäffikon | Nano-layer coating for high performance tools |
| CN103958738B (zh) | 2011-09-30 | 2017-09-01 | 欧瑞康表面解决方案股份公司，普费菲孔 | 用于在加工操作中增强耐磨性的适应形态的铝钛氮化物涂层和其方法 |
| EP2607517A1 (en) * | 2011-12-22 | 2013-06-26 | Oerlikon Trading AG, Trübbach | Low temperature arc ion plating coating |
| HK1214356A1 (zh) * | 2012-10-26 | 2016-07-22 | Pixie Scientific, Inc | 健康診斷系統和方法 |
| JP6842233B2 (ja) | 2014-07-29 | 2021-03-17 | サンドビック インテレクチュアル プロパティー アクティエボラーグ | コーティングされた切削工具、及びコーティングされた切削工具の製造方法 |
| WO2016191372A1 (en) | 2015-05-22 | 2016-12-01 | Pixie Scientific, Llc | Indicator panels for incontinence products |
| CN108368601B (zh) * | 2015-12-22 | 2020-10-30 | 山特维克知识产权股份有限公司 | 涂覆的切削工具和方法 |
| WO2019136261A1 (en) * | 2018-01-04 | 2019-07-11 | Ih Ip Holdings Limited | Gas phase co-deposition of hydrogen/deuterium loaded metallic structures |
| EP3556901B1 (en) * | 2018-04-20 | 2021-03-31 | Plansee Composite Materials Gmbh | Vacuum arc source |
| CN120738607A (zh) | 2019-07-03 | 2025-10-03 | 欧瑞康表面解决方案股份公司，普费菲孔 | 阴极电弧源 |
| KR102667048B1 (ko) * | 2021-07-20 | 2024-05-22 | 한국생산기술연구원 | 중앙부 함몰형 자기장을 가지는 아크 증발원 및 이를 포함하는 아크 이온 플레이팅 장치, 그리고 이를 이용한 금속 및 금속화합물의 증착방법 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3625848A (en) | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
| SU1040631A1 (ru) * | 1980-06-25 | 1983-09-07 | Предприятие П/Я В-8851 | Вакуумно-дуговое устройство |
| US4620913A (en) | 1985-11-15 | 1986-11-04 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition method and apparatus |
| DE59004614D1 (de) | 1989-06-27 | 1994-03-24 | Hauzer Holding | Verfahren und vorrichtung zur beschichtung von substraten. |
| US5380421A (en) * | 1992-11-04 | 1995-01-10 | Gorokhovsky; Vladimir I. | Vacuum-arc plasma source |
| JP2002525431A (ja) * | 1998-09-14 | 2002-08-13 | ユナキス・トレーディング・アクチェンゲゼルシャフト | アーク蒸化室用ターゲット配置 |
| JP3917348B2 (ja) * | 1999-05-26 | 2007-05-23 | 株式会社神戸製鋼所 | アーク蒸発源、真空蒸着装置及び真空蒸着方法 |
| JP4409015B2 (ja) * | 1999-11-30 | 2010-02-03 | 株式会社神戸製鋼所 | アークイオンプレーティング装置 |
| CA2305938C (en) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
| DE10018143C5 (de) * | 2000-04-12 | 2012-09-06 | Oerlikon Trading Ag, Trübbach | DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems |
| JP4000764B2 (ja) * | 2000-09-18 | 2007-10-31 | 日新電機株式会社 | 真空アーク蒸発装置 |
| JP4034563B2 (ja) * | 2001-12-27 | 2008-01-16 | 株式会社神戸製鋼所 | 真空アーク蒸発源 |
| JP4109503B2 (ja) * | 2002-07-22 | 2008-07-02 | 日新電機株式会社 | 真空アーク蒸着装置 |
| WO2007068768A1 (es) * | 2005-12-16 | 2007-06-21 | Fundacion Tekniker | Máquina de evaporación catódica |
| AU2007306494B2 (en) * | 2006-10-10 | 2012-05-31 | Oerlikon Trading Ag, Truebbach | Layer system having at least one mixed crystal layer of a polyoxide |
-
2011
- 2011-06-03 PL PL11727116T patent/PL2585622T3/pl unknown
- 2011-06-03 JP JP2013515751A patent/JP6095568B2/ja active Active
- 2011-06-03 CN CN201180030805.5A patent/CN102947478B/zh active Active
- 2011-06-03 WO PCT/EP2011/002734 patent/WO2011160766A1/de not_active Ceased
- 2011-06-03 SI SI201131460T patent/SI2585622T1/en unknown
- 2011-06-03 EP EP11727116.3A patent/EP2585622B1/de active Active
- 2011-06-03 PT PT117271163T patent/PT2585622T/pt unknown
- 2011-06-03 KR KR1020137001390A patent/KR101854936B1/ko active Active
- 2011-06-03 BR BR112012033065-9A patent/BR112012033065B1/pt active IP Right Grant
- 2011-06-03 US US13/805,730 patent/US10253407B2/en active Active
- 2011-06-03 SG SG2012092110A patent/SG186722A1/en unknown
- 2011-06-03 ES ES11727116.3T patent/ES2666234T3/es active Active
- 2011-06-03 CA CA2803087A patent/CA2803087C/en active Active
- 2011-06-03 HU HUE11727116A patent/HUE038729T2/hu unknown
- 2011-06-03 MX MX2012015089A patent/MX361608B/es active IP Right Grant
- 2011-06-20 TW TW100121344A patent/TWI553132B/zh active
- 2011-06-30 MY MYPI2012005447A patent/MY170012A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| MX361608B (es) | 2018-12-07 |
| WO2011160766A1 (de) | 2011-12-29 |
| MY170012A (en) | 2019-06-20 |
| CA2803087A1 (en) | 2011-12-29 |
| HUE038729T2 (hu) | 2018-11-28 |
| SI2585622T1 (en) | 2018-06-29 |
| KR101854936B1 (ko) | 2018-06-14 |
| EP2585622A1 (de) | 2013-05-01 |
| PT2585622T (pt) | 2018-04-20 |
| JP2013533382A (ja) | 2013-08-22 |
| BR112012033065B1 (pt) | 2022-04-05 |
| US20130126347A1 (en) | 2013-05-23 |
| MX2012015089A (es) | 2013-05-28 |
| RU2013102585A (ru) | 2014-08-10 |
| EP2585622B1 (de) | 2018-01-17 |
| CN102947478B (zh) | 2016-02-17 |
| BR112012033065A2 (pt) | 2020-08-11 |
| CA2803087C (en) | 2019-11-12 |
| ES2666234T3 (es) | 2018-05-03 |
| US10253407B2 (en) | 2019-04-09 |
| CN102947478A (zh) | 2013-02-27 |
| JP6095568B2 (ja) | 2017-03-15 |
| TWI553132B (zh) | 2016-10-11 |
| KR20130121078A (ko) | 2013-11-05 |
| TW201219582A (en) | 2012-05-16 |
| SG186722A1 (en) | 2013-02-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| PL2585622T3 (pl) | Źródło odparowania łukowego o określonym polu elektrycznym | |
| ZA201307129B (en) | A planetary push-pull electric motor | |
| EP2668830A4 (en) | ELECTROSTATIC REMOTE PLASMA SOURCE | |
| EP2671430A1 (en) | High performance induction plasma torch | |
| GB201006567D0 (en) | High density plasma source | |
| GB201013881D0 (en) | Electric machine - construction | |
| EP2679734A4 (en) | Electric construction machine | |
| TWI561292B (en) | Plasma torch | |
| EP2778475A4 (en) | ELECTRIC LINEAR DRIVE | |
| EP2507402A4 (en) | LINEAR DEPOSIT SOURCE | |
| EP2673792A1 (de) | Elektrischer schalter | |
| PL2593961T3 (pl) | Plazmowe źródło światła | |
| EP2668718A2 (en) | A switch arrangement | |
| IL249382A0 (en) | arc evaporation source | |
| PL2540858T3 (pl) | Osadzania za pomocą łuku katodowego | |
| EP2571041A4 (en) | SOURCE OF ELECTRON | |
| SG2014008205A (en) | Electric cable | |
| GB0900411D0 (en) | Plasma source electrode | |
| HUP1100568A2 (en) | Electric machine | |
| PL2529601T3 (pl) | Dające się zminiaturyzować źródło plazmy | |
| PL2593962T3 (pl) | Lampa zasilana magnetronem | |
| EP2608644B8 (fr) | Portier électrique | |
| SG2014013429A (en) | Plasma source | |
| IL228457A0 (en) | Electric planetary traction-push motor | |
| GB201121569D0 (en) | Electrical energy source |