PL2817433T3 - Sposób osadzania chemicznego z fazy gazowej w celu nakładania powłoki krzemionkowej na podłoże szklane - Google Patents

Sposób osadzania chemicznego z fazy gazowej w celu nakładania powłoki krzemionkowej na podłoże szklane

Info

Publication number
PL2817433T3
PL2817433T3 PL13705247T PL13705247T PL2817433T3 PL 2817433 T3 PL2817433 T3 PL 2817433T3 PL 13705247 T PL13705247 T PL 13705247T PL 13705247 T PL13705247 T PL 13705247T PL 2817433 T3 PL2817433 T3 PL 2817433T3
Authority
PL
Poland
Prior art keywords
depositing
glass substrate
vapor deposition
chemical vapor
deposition process
Prior art date
Application number
PL13705247T
Other languages
English (en)
Inventor
Douglas Martin NELSON
Michael Martin RADTKE
Steven Edward PHILLIPS
Original Assignee
Pilkington Group Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pilkington Group Limited filed Critical Pilkington Group Limited
Publication of PL2817433T3 publication Critical patent/PL2817433T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/42—Silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/241—Doped oxides with halides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/1525—Deposition methods from the vapour phase by cvd by atmospheric CVD

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
PL13705247T 2012-02-23 2013-02-18 Sposób osadzania chemicznego z fazy gazowej w celu nakładania powłoki krzemionkowej na podłoże szklane PL2817433T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261602354P 2012-02-23 2012-02-23
EP13705247.8A EP2817433B1 (en) 2012-02-23 2013-02-18 Chemical vapor deposition process for depositing a silica coating on a glass substrate
PCT/GB2013/050383 WO2013124634A1 (en) 2012-02-23 2013-02-18 Chemical vapor deposition process for depositing a silica coating on a glass substrate

Publications (1)

Publication Number Publication Date
PL2817433T3 true PL2817433T3 (pl) 2021-12-20

Family

ID=47741181

Family Applications (1)

Application Number Title Priority Date Filing Date
PL13705247T PL2817433T3 (pl) 2012-02-23 2013-02-18 Sposób osadzania chemicznego z fazy gazowej w celu nakładania powłoki krzemionkowej na podłoże szklane

Country Status (6)

Country Link
US (2) US9404179B2 (pl)
EP (1) EP2817433B1 (pl)
JP (1) JP6320303B2 (pl)
CN (1) CN104136656B (pl)
PL (1) PL2817433T3 (pl)
WO (1) WO2013124634A1 (pl)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160016847A1 (en) * 2012-07-30 2016-01-21 Pilkington Group Limited Method of depositing a coating utilizing a coating apparatus
US10093571B2 (en) * 2013-04-09 2018-10-09 Nippon Sheet Glass Company, Limited Method for producing glass sheet and glass sheet
JP6368942B2 (ja) * 2013-09-25 2018-08-08 Ａｇｃ株式会社 ガラス板の製造方法
GB201406177D0 (en) * 2014-04-04 2014-05-21 Pilkington Group Ltd A glazing
GB201505313D0 (en) * 2014-10-21 2015-05-13 Pilkington Group Ltd Glass treatment
WO2017137773A1 (en) * 2016-02-12 2017-08-17 Pilkington Group Limited Chemical vapor deposition process for depositing a mixed metal oxide coating and the coated article formed thereby
CN111051567A (zh) * 2017-08-31 2020-04-21 皮尔金顿集团有限公司 形成氧化硅涂层的化学气相沉积方法
WO2023057756A1 (en) * 2021-10-06 2023-04-13 Pilkington Group Limited Method of forming a silicon oxide coating
CN114447144A (zh) * 2021-12-27 2022-05-06 张家港博佑光电科技有限公司 一种perc+se电池碱抛前后保护工艺
US12668556B2 (en) * 2022-11-22 2026-06-30 Chevron U.S.A. Inc. Catalysts and methods for methane dehydrogenation
GB202304625D0 (en) * 2023-03-29 2023-05-10 Pilkington Group Ltd Coated glass article
CN117845189A (zh) * 2023-12-12 2024-04-09 杭州中欣晶圆半导体股份有限公司 膜色均匀和膜厚均一性良好的薄片apcvd成膜加工方法
WO2025202635A1 (en) 2024-03-26 2025-10-02 Pilkington Group Limited Coated glass articles
WO2026068942A1 (en) 2024-09-24 2026-04-02 Pilkington Group Limited Coated glass articles

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59190209A (ja) * 1983-04-11 1984-10-29 Semiconductor Energy Lab Co Ltd シリコン被膜作製方法
CN1015008B (zh) 1985-10-23 1991-12-04 佳能株式会社 形成沉积膜的方法
US4837048A (en) * 1985-10-24 1989-06-06 Canon Kabushiki Kaisha Method for forming a deposited film
JPH0645883B2 (ja) * 1985-10-24 1994-06-15 キヤノン株式会社 堆積膜形成法
US4721632A (en) * 1986-08-25 1988-01-26 Ford Motor Company Method of improving the conductivity and lowering the emissivity of a doped tin oxide film
US4810673A (en) * 1986-09-18 1989-03-07 Texas Instruments Incorporated Oxide deposition method
US4922853A (en) 1989-05-16 1990-05-08 Libbey-Owens-Ford Co. Stripe coating on glass by chemical vapor deposition
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
CA2159296C (en) * 1994-10-14 2007-01-30 Michel J. Soubeyrand Glass coating method and glass coated thereby
JPH098030A (ja) * 1995-06-23 1997-01-10 Sony Corp シリコン系酸化膜の製造方法
JPH0964176A (ja) * 1995-08-21 1997-03-07 Oki Electric Ind Co Ltd 半導体素子の製造方法
JP4467707B2 (ja) * 1999-05-18 2010-05-26 日本板硝子株式会社 導電膜付きガラス板とその製造方法、およびこれを用いた光電変換装置
US6858306B1 (en) * 1999-08-10 2005-02-22 Pilkington North America Inc. Glass article having a solar control coating
US6583069B1 (en) * 1999-12-13 2003-06-24 Chartered Semiconductor Manufacturing Co., Ltd. Method of silicon oxide and silicon glass films deposition
JP4362273B2 (ja) * 2001-12-03 2009-11-11 日本板硝子株式会社 基板の製造方法
JP4233455B2 (ja) 2001-12-03 2009-03-04 日本板硝子株式会社 薄膜形成方法
WO2003065386A1 (en) * 2002-01-28 2003-08-07 Nippon Sheet Glass Company, Limited Method of forming transparent conductive film, transparent conductive film, glass substrate having the same and photoelectric transduction unit including the glass substrate
US6844612B1 (en) * 2002-03-12 2005-01-18 Novellus Systems, Inc. Low dielectric constant fluorine-doped silica glass film for use in integrated circuit chips and method of forming the same
JP2007190844A (ja) * 2006-01-20 2007-08-02 Konica Minolta Holdings Inc ガスバリア性樹脂基材および有機エレクトロルミネッセンスデバイス
EP2688851B1 (en) 2011-03-23 2019-01-23 Pilkington Group Limited Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus

Also Published As

Publication number Publication date
JP6320303B2 (ja) 2018-05-16
EP2817433B1 (en) 2021-09-29
US20150140216A1 (en) 2015-05-21
JP2015514656A (ja) 2015-05-21
US9404179B2 (en) 2016-08-02
US20160305021A1 (en) 2016-10-20
CN104136656B (zh) 2016-11-09
EP2817433A1 (en) 2014-12-31
US10837108B2 (en) 2020-11-17
WO2013124634A1 (en) 2013-08-29
CN104136656A (zh) 2014-11-05

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