PL3140047T3 - Sposób tworzenia cienkich warstw zwykłych polimerów przy użyciu osadzania za pomocą plazmy atmosferycznej - Google Patents

Sposób tworzenia cienkich warstw zwykłych polimerów przy użyciu osadzania za pomocą plazmy atmosferycznej

Info

Publication number
PL3140047T3
PL3140047T3 PL15719495T PL15719495T PL3140047T3 PL 3140047 T3 PL3140047 T3 PL 3140047T3 PL 15719495 T PL15719495 T PL 15719495T PL 15719495 T PL15719495 T PL 15719495T PL 3140047 T3 PL3140047 T3 PL 3140047T3
Authority
PL
Poland
Prior art keywords
thin films
plasma deposition
polymer thin
atmospheric plasma
forming regular
Prior art date
Application number
PL15719495T
Other languages
English (en)
Other versions
PL3140047T4 (pl
Inventor
Nicolas Boscher
Patrick Choquet
David Duday
Florian HILT
Original Assignee
Luxembourg Institute Of Science And Technology (List)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Luxembourg Institute Of Science And Technology (List) filed Critical Luxembourg Institute Of Science And Technology (List)
Publication of PL3140047T3 publication Critical patent/PL3140047T3/pl
Publication of PL3140047T4 publication Critical patent/PL3140047T4/pl

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0486—Operating the coating or treatment in a controlled atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Formation Of Insulating Films (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
PL15719495T 2014-05-07 2015-05-06 Sposób tworzenia cienkich warstw zwykłych polimerów przy użyciu osadzania za pomocą plazmy atmosferycznej PL3140047T4 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
LU92445A LU92445B1 (en) 2014-05-07 2014-05-07 Method for forming regular polymer thin films using atmospheric plasma deposition
PCT/EP2015/059979 WO2015169864A1 (en) 2014-05-07 2015-05-06 Method for forming regual polymer thin films using atmospheric plasma deposition
EP15719495.2A EP3140047B1 (en) 2014-05-07 2015-05-06 Method for forming regular polymer thin films using atmospheric plasma deposition

Publications (2)

Publication Number Publication Date
PL3140047T3 true PL3140047T3 (pl) 2020-03-31
PL3140047T4 PL3140047T4 (pl) 2020-03-31

Family

ID=50792493

Family Applications (1)

Application Number Title Priority Date Filing Date
PL15719495T PL3140047T4 (pl) 2014-05-07 2015-05-06 Sposób tworzenia cienkich warstw zwykłych polimerów przy użyciu osadzania za pomocą plazmy atmosferycznej

Country Status (8)

Country Link
US (1) US10471465B2 (pl)
EP (1) EP3140047B1 (pl)
JP (1) JP6527885B2 (pl)
KR (1) KR102496134B1 (pl)
ES (1) ES2738584T3 (pl)
LU (1) LU92445B1 (pl)
PL (1) PL3140047T4 (pl)
WO (1) WO2015169864A1 (pl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6540613B2 (ja) * 2016-06-22 2019-07-10 住友金属鉱山株式会社 熱伝導性グリース組成物およびその製造方法
KR102106358B1 (ko) * 2017-01-05 2020-05-04 가부시키가이샤 아루박 막 형성방법 및 권취식 막 형성장치
EP3446793B1 (en) 2017-08-23 2023-10-04 Molecular Plasma Group SA Soft plasma polymerization process for a mechanically durable superhydrophobic nanostructured coating
WO2019108680A1 (en) * 2017-11-29 2019-06-06 Sirrus, Inc. Initiated chemical vapor deposition of 1,1 disubstituted alkene compounds
US11610765B1 (en) * 2018-08-09 2023-03-21 Apjet, Inc. Atmospheric-pressure plasma processing apparatus and method using argon plasma gas
US11103892B1 (en) * 2018-09-25 2021-08-31 Facebook Technologies, Llc Initiated chemical vapor deposition method for forming nanovoided polymers
WO2020256995A1 (en) * 2019-06-19 2020-12-24 Board Of Regents, The University Of Texas System A semiliquid surface with liquid and solid repellence
EP3848426A1 (en) * 2020-01-07 2021-07-14 Molecular Plasma Group SA Method for altering adhesion properties of a surface by plasma coating
TWI766488B (zh) * 2020-12-19 2022-06-01 逢甲大學 有機高分子薄膜及其製作方法
LU500020B1 (en) 2021-04-09 2022-10-10 Luxembourg Inst Science & Tech List Interpenetrated polymer network produced by plasma

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69636460T2 (de) * 1995-12-08 2007-03-29 Novartis Ag Plasmainduzierte polymere beschichtungen
GB9816077D0 (en) * 1998-07-24 1998-09-23 Secr Defence Surface coatings
US6629763B2 (en) * 2000-06-17 2003-10-07 Schott Glas Object which has optical layers
GB0208203D0 (en) * 2002-04-10 2002-05-22 Dow Corning Protective coating compositions
GB0406049D0 (en) * 2004-03-18 2004-04-21 Secr Defence Surface coatings
GB0423685D0 (en) * 2004-10-26 2004-11-24 Dow Corning Ireland Ltd Improved method for coating a substrate
GB0506051D0 (en) * 2005-03-24 2005-04-27 Univ Durham A method for producing an aldehyde functionalised surface
US7615931B2 (en) * 2005-05-02 2009-11-10 International Technology Center Pulsed dielectric barrier discharge
DE102006058771B4 (de) * 2006-12-12 2018-03-01 Schott Ag Behälter mit verbesserter Restentleerbarkeit und Verfahren zu dessen Herstellung
WO2011007653A1 (ja) * 2009-07-13 2011-01-20 日本碍子株式会社 ダイアモンドライクカーボン膜形成体の製造方法
DE102010018981B3 (de) * 2010-05-03 2011-07-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 Verfahren zur plasmagestützten Behandlung von Innenflächen eines Hohlkörpers, Fluid-Separator sowie dessen Verwendung
GB201112404D0 (en) * 2011-07-19 2011-08-31 Surface Innovations Ltd Method
LU91841B1 (en) * 2011-07-15 2013-01-16 Ct De Rech Public Gabriel Lippmann Method for forming gas sensing layers
US9884341B2 (en) * 2011-08-12 2018-02-06 Massachusetts Institute Of Technology Methods of coating surfaces using initiated plasma-enhanced chemical vapor deposition
LU91934B1 (en) * 2012-01-25 2013-07-26 Ct De Rech Public Gabriel Lippmann Controlled radical assisted polymerization

Also Published As

Publication number Publication date
JP2017526518A (ja) 2017-09-14
LU92445B1 (en) 2015-11-09
US10471465B2 (en) 2019-11-12
US20170050214A1 (en) 2017-02-23
WO2015169864A1 (en) 2015-11-12
PL3140047T4 (pl) 2020-03-31
KR102496134B1 (ko) 2023-02-03
EP3140047B1 (en) 2019-04-24
JP6527885B2 (ja) 2019-06-05
ES2738584T3 (es) 2020-01-23
EP3140047A1 (en) 2017-03-15
KR20170017890A (ko) 2017-02-15

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