PL3256907T3 - Sposób teksturowania na odrębnych podłożach - Google Patents

Sposób teksturowania na odrębnych podłożach

Info

Publication number
PL3256907T3
PL3256907T3 PL16704586T PL16704586T PL3256907T3 PL 3256907 T3 PL3256907 T3 PL 3256907T3 PL 16704586 T PL16704586 T PL 16704586T PL 16704586 T PL16704586 T PL 16704586T PL 3256907 T3 PL3256907 T3 PL 3256907T3
Authority
PL
Poland
Prior art keywords
texture
separate substrates
substrates
separate
Prior art date
Application number
PL16704586T
Other languages
English (en)
Inventor
Jan Matthijs Ter Meulen
Bram Johannes TITULAER
Adrianus Johannes VAN ERVEN
Original Assignee
Morphotonics Holding B.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morphotonics Holding B.V. filed Critical Morphotonics Holding B.V.
Publication of PL3256907T3 publication Critical patent/PL3256907T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F7/00—Rotary lithographic machines
    • B41F7/02—Rotary lithographic machines for offset printing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Photovoltaic Devices (AREA)
PL16704586T 2015-02-13 2016-02-11 Sposób teksturowania na odrębnych podłożach PL3256907T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15155038 2015-02-13
PCT/EP2016/052873 WO2016128494A1 (en) 2015-02-13 2016-02-11 Method for texturing discrete substrates
EP16704586.3A EP3256907B1 (en) 2015-02-13 2016-02-11 Method for texturing discrete substrates

Publications (1)

Publication Number Publication Date
PL3256907T3 true PL3256907T3 (pl) 2020-07-27

Family

ID=52469687

Family Applications (1)

Application Number Title Priority Date Filing Date
PL16704586T PL3256907T3 (pl) 2015-02-13 2016-02-11 Sposób teksturowania na odrębnych podłożach

Country Status (9)

Country Link
US (2) US11402748B2 (pl)
EP (1) EP3256907B1 (pl)
JP (1) JP6720198B2 (pl)
KR (1) KR102534892B1 (pl)
CN (1) CN107466380B (pl)
DK (1) DK3256907T3 (pl)
HU (1) HUE049258T2 (pl)
PL (1) PL3256907T3 (pl)
WO (1) WO2016128494A1 (pl)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118456729A (zh) 2017-05-25 2024-08-09 奇跃公司 双面压印
KR102448904B1 (ko) * 2017-07-31 2022-09-29 삼성디스플레이 주식회사 임프린트 장치 및 임프린트 방법
EP3691851B1 (en) 2017-10-03 2025-03-19 Cornell University A method for micropatterning objects
WO2019089411A1 (en) * 2017-10-30 2019-05-09 Corning Incorporated Systems and methods for roll-to-roll sol-gel processing
US11204550B2 (en) * 2018-01-26 2021-12-21 Morphotonics Holding B.V. Process and equipment for texturing discrete substrates
US11194247B2 (en) 2018-01-31 2021-12-07 Canon Kabushiki Kaisha Extrusion control by capillary force reduction
JP7417600B2 (ja) 2018-10-12 2024-01-18 モーフォトニクス ホールディング ベスローテン フェノーツハップ 調整可能な高い寸法安定性を有するフレキシブルスタンプ
EP3693714A1 (en) 2019-02-11 2020-08-12 Fresh Strips B.V. Optical sensor based on shape memory between scattering and transparent modes
JP7760499B2 (ja) 2019-10-09 2025-10-27 モーフォトニクス ホールディング ベスローテン フェノーツハップ タイル状の可撓性スタンプ
US20230280649A1 (en) 2020-07-31 2023-09-07 Morphotonics Holding B.V. Welding method for creating an upscaled master
EP4189481A1 (en) 2020-07-31 2023-06-07 Morphotonics Holding B.V. High dimensional flexible stamp with tiled strengthened area
CN118251630A (zh) 2021-11-15 2024-06-25 莫福托尼克斯控股有限公司 压印方法
TW202423663A (zh) * 2022-08-11 2024-06-16 荷蘭商摩富塔尼克斯控股公司 用於壓印的方法和打印機以及壓印的產品

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1362682A1 (en) * 2002-05-13 2003-11-19 ZBD Displays Ltd, Method and apparatus for liquid crystal alignment
US7195733B2 (en) * 2004-04-27 2007-03-27 The Board Of Trustees Of The University Of Illinois Composite patterning devices for soft lithography
US7309225B2 (en) * 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US20070001333A1 (en) * 2005-06-30 2007-01-04 Ashwit Dias System and method for forming textured polymeric films
JP5274128B2 (ja) * 2007-08-03 2013-08-28 キヤノン株式会社 インプリント方法および基板の加工方法
JP5164589B2 (ja) * 2008-01-30 2013-03-21 株式会社日立ハイテクノロジーズ インプリント装置
NL2004932A (en) * 2009-07-27 2011-01-31 Asml Netherlands Bv Imprint lithography template.
US8551386B2 (en) * 2009-08-03 2013-10-08 S.D. Warren Company Imparting texture to cured powder coatings
KR101220513B1 (ko) * 2010-11-05 2013-01-10 주식회사 디엠에스 임프린트 장치
TWI400160B (zh) * 2010-11-18 2013-07-01 Univ Nat Taiwan Science Tech 應用於微奈米壓印製程之模具
TW201228807A (en) * 2011-01-13 2012-07-16 Moser Baer India Ltd Method of imprinting a texture on a rigid substrate using flexible stamp
JP5759195B2 (ja) * 2011-02-07 2015-08-05 キヤノン株式会社 型、インプリント方法及び物品製造方法

Also Published As

Publication number Publication date
US11402748B2 (en) 2022-08-02
CN107466380A (zh) 2017-12-12
KR20170121173A (ko) 2017-11-01
JP6720198B2 (ja) 2020-07-08
US12613464B2 (en) 2026-04-28
EP3256907B1 (en) 2020-04-15
HUE049258T2 (hu) 2020-09-28
WO2016128494A1 (en) 2016-08-18
JP2018507122A (ja) 2018-03-15
CN107466380B (zh) 2021-10-01
EP3256907A1 (en) 2017-12-20
KR102534892B1 (ko) 2023-05-23
US20180031966A1 (en) 2018-02-01
DK3256907T3 (da) 2020-06-15
US20220317567A1 (en) 2022-10-06

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